Mark J Wihl

6363166, Mar 26, 2002

Mar 30, 2000

09/539672

Mark Joseph Wihl - Tracy CA
Tao-Yi Fu - Fremont CA
Marek Zywno - San Jose CA
Damon Floyd Kvamme - San Jose CA
Michael E. Fein - Mountain View CA

KLA-Tencor Corporation - San Jose CA

G06K 900

382144, 382145, 356398

An automated photomask inspection apparatus including an XY state ( ) for transporting a substrate ( ) under test in a serpentine path in an XY plane, an optical system ( ) comprising a laser ( ), a transmission light detector ( ), a reflected light detector ( ), optical elements defining reference beam paths and illuminating beam paths between the laser, the substrate and the detectors and an acousto-optical beam scanner ( ) for reciprocatingly scanning the illuminating and reference beams relative to the substrate surface, and an electronic control, analysis and display system for controlling the operation of the stage and optical system and for interpreting and storing the signals output by the detectors. The apparatus can operate in a die-to-die comparison mode or a die-to-database mode.

6584218, Jun 24, 2003

Nov 14, 2001

10/003166

Mark Joseph Wihl - Tracy CA
Tao-Yi Fu - Fremont CA
Marek Zywno - San Jose CA
Damon Floyd Kvamme - San Jose CA
Michael E. Fein - Mountain View CA

KLA-Tencor Corporation - San Jose CA

G06K 900

382144, 382145

An automated photomask inspection apparatus including an XY state ( ) for transporting a substrate ( ) under test in a serpentine path in an XY plane, an optical system ( ) comprising a laser ( ), a transmission light detector ( ), a reflected light detector ( ), optical elements defining reference beam paths and illuminating beam paths between the laser, the substrate and the detectors and an acousto-optical beam scanner ( ) for reciprocatingly scanning the illuminating and reference beams relative to the substrate surface, and an electronic control, analysis and display system for controlling the operation of the stage and optical system and for interpreting and storing the signals output by the detectors. The apparatus can operate in a die-to-die comparison mode or a die-to-database mode.

6674522, Jan 6, 2004

May 4, 2001

09/849614

Matthias C. Krantz - Aptos CA
Mark Joseph Wihl - Tracy CA
Stanley E. Stokowski - Danville CA

KLA-Tencor Technologies Corporation - Milpitas CA

G01N 2188

3562371, 3562375, 3562393

The ability to inspect photomasks for errors or defects in phase-shifters is greatly enhanced using optical techniques based on multiple modified radiation collection techniques. In particular, the apparatus and methods of the invention allows for errors in phase-shifters to be more accurately detected, even in the presence of regular amplitude objects such as grid lines. In one embodiment, the intensities of two slightly defocused images of phase objects corresponding to the same photomask location are compared. In a second embodiment, radiation having two Zernike point spread functions is used to obtain two slightly different phase sensitive images. Data collected and analyzed using this method provides much greater sensitivity to phase objects and errors in phase objects than prior art inspection systems. Embodiments include both scanning-type and projector-type optical architectures and may utilize radiation transmitted or reflected by a sample.

7027635, Apr 11, 2006

Jul 10, 2002

10/193965

Mark J. Wihl - Tracy CA, US
George Q. Chen - Fremont CA, US
Jun Ye - Palo Alto CA, US
Pei-Chun Chiang - Cupertino CA, US

KLA-Tencor Technologies Corporation - San Jose CA

G06K 9/00

382144, 382145

Techniques that use the design databases used in each of the expose/etch steps during construction of phase shift masks are described. A model or reference image is rendered, accounting for systematic variations, from the design databases to represent what a layer of the PSM should look like after processing. The reference image is compared to an optically acquired image of a specimen phase shift mask to find defects. The technique of the present invention can be used to inspect EAPSM, APSM and tritone masks. The technique inspects all layers in one pass and is therefore more efficient.

7738093, Jun 15, 2010

May 6, 2008

12/115833

David Alles - Los Altos CA, US
Mark Wihl - Tracy CA, US
Stan Stokowski - Danville CA, US
Yalin Xiong - Union City CA, US
Damon Kvamme - Los Gatos CA, US

KLA-Tencor Corp. - San Jose CA

G01N 21/00

3562375, 382145, 382148

Methods for detecting and classifying defects on a reticle are provided. One method includes acquiring images of the reticle at first and second conditions during inspection of the reticle. The first condition is different than the second condition. The method also includes detecting the defects on the reticle using one or more of the images acquired at the first condition. In addition, the method includes classifying an importance of the defects detected on the reticle using one or more of the images acquired at the second condition. The detecting and classifying steps are performed substantially simultaneously during the inspection.

7873204, Jan 18, 2011

Jan 11, 2007

11/622432

Mark J. Wihl - Tracy CA, US
Yalin Xiong - Union City CA, US

KLA-Tencor Corporation - Milpitas CA

G06K 9/00

382144

A method for identifying lithographically significant defects. A photomask is illuminated to produce images that experience different parameters of the reticle as imaged by an inspection tool. Example parameters include a transmission intensity image and a reflection intensity image. The images are processed together to recover a band limited mask pattern associated with the photomask. A model of an exposure lithography system for chip fabrication is adapted to accommodate the band limited mask pattern as an input which is input into the model to obtain an aerial image of the mask pattern that is processed with a photoresist model yielding a resist-modeled image. The resist-modeled image is used to determine if the photomask has lithographically significant defects.

46335048, Dec 30, 1986

Jun 28, 1984

6/625903

Mark J. Wihl - Tracy CA

KLA Instruments Corporation - Santa Clara CA

G06K 940

382 54

Optical inspection apparatus for detecting defects in a visually perceptible pattern including image acquistion means for inspecting the pattern on a pixel-by-pixel basis, developing digital data signals corresponding to each pixel and feeding the signals so developed to an imaging enhancement means. The imaging enhancement means compensates for equipment related degradations in the images and converts the digital data signal value corresponding to each pixel into a corrected signal value by operating on the digital data signal with a two dimensional finite impulse response filter. The corrected signal values of the image enhancement means are received by a defect detection means which evaluates the signal values for defects in the pattern. Any defects so determined are recorded and/or displayed on data recording means.

60524782, Apr 18, 2000

Oct 9, 1996

8/727985

Mark Joseph Wihl - Tracy CA
Tao-Yi Fu - Fremont CA
Marek Zywno - San Jose CA
Damon Floyd Kvamme - Ann Arbor MI
Michael E. Fein - Mountain View CA

KLA-Tencor Corporation - San Jose CA

G06K 900

382144

An automated photomask inspection apparatus including an XY state (12) for transporting a substrate (14) under test in a serpentine path in an XY plane, an optical system (16) comprising a laser (30), a transmission light detector (34), a reflected light detector (36), optical elements defining reference beam paths and illuminating beam paths between the laser, the substrate and the detectors and an acousto-optical beam scanner (40, 42) for reciprocatingly scanning the illuminating and reference beams relative to the substrate surface, and an electronic control, analysis and display system for controlling the operation of the stage and optical system and for interpreting and storing the signals output by the detectors. The apparatus can operate in a die-to-die comparison mode or a die-to-database mode.