Search

Jason J Xu

from Weatogue, CT
Age ~63

Jason Xu Phones & Addresses

  • 6 Red Oak Ct, Weatogue, CT 06089 (860) 651-9625
  • Wallingford, CT
  • 470 Prospect St, New Haven, CT 06511 (203) 624-7983
  • Pittsburgh, PA
  • Vernon Rockville, CT

Work

Position: Treasurer of tau sigma honor society

Education

School / High School: DeAnza Community College Jun 2008 Specialities: A.A. in Accounting

Resumes

Resumes

Jason Xu Photo 1

Jason Xu

View page
Work:
Treasurer of Tau Sigma Honor Society
Apr 2011 to Mar 2012

President of Campus Apartments Resident Association (CARA)
Oct 2010 to Jan 2012

Regnart Elementary School

Aug 2007 to Mar 2010
Special Education Volunteer Aide

Education:
DeAnza Community College
Jun 2008 to Jun 2010
A.A. in Accounting

Publications

Us Patents

Wafer Scale Method Of Manufacturing Optical Waveguide Devices And The Waveguide Devices Made Thereby

View page
US Patent:
7512303, Mar 31, 2009
Filed:
Jun 27, 2007
Appl. No.:
11/769070
Inventors:
Benjamin F. Catching - Santa Rosa CA, US
Donald M. Friedrich - Windsor CA, US
Charles A. Hulse - Sebastopol CA, US
Marc K. Von Gunten - Los Altos CA, US
Jason Reed - West Hartford CT, US
Karl Kissa - West Simsbury CT, US
Glen Drake - Windsor CT, US
Julia Duncan - North Granby CT, US
William J. Minford - Windsor CT, US
Hiren V. Shah - Santa Rosa CA, US
Jerry Zieba - Santa Rosa CA, US
Jason Jiazhan Xu - Weatogue CT, US
Assignee:
JDS Uniphase Corporation - Milpitas CA
International Classification:
G02B 6/10
US Classification:
385131
Abstract:
The invention relates to a wafer scale process for the manufacture of optical waveguide devices, and particularly for the manufacture of ridge waveguide devices, and the improved waveguides made thereby. The present invention has found a process for achieving sub-micron control of an optical waveguiding layer thickness by providing a dimensionally stable wafer assembly into which adhesive can be introduced without altering the planar relationship between a carrier wafer and an optically transmissive wafer in wafer scale manufacture. This process permits wafer scale manufacture of optical waveguide devices including thin optically transmissive layers. A pattern of spacer pedestals is created by a deposition and etch back, or by a surface etch process to precisely reference surface information from a master surface to a carrier wafer to a thin optically transmissive wafer. The tolerance achievable in accordance with this process provides consistent yield across the wafer.

Humidity Tolerant Electro-Optic Device

View page
US Patent:
7529433, May 5, 2009
Filed:
Jan 9, 2008
Appl. No.:
11/971726
Inventors:
Karl Kissa - West Simsbury CT, US
William J. Minford - Windsor CT, US
Jason Jiazhan Xu - Weatogue CT, US
Glen Drake - Windsor CT, US
Assignee:
JDS Uniphase Corporation - Milpitas CA
International Classification:
G02F 1/295
G02B 6/12
US Classification:
385 8, 385 14
Abstract:
The invention relates to an electro-optic modulator structure containing an additional set of bias electrodes buried within the device for applying bias to set the operating point. Thus the RF electrodes used to modulate incoming optical signals can be operated with zero DC bias, reducing electrode corrosion by electro-migration and other effects that can be present in non-hermetic packages. The bias electrodes include an upper split portion and an optically transparent lower portion. The optically transparent lower layer improves modulation frequency and reduces optical loss.

Adherent All-Gold Electrode Structure For Lithium Niobate Based Devices And The Method Of Fabrication

View page
US Patent:
20040002205, Jan 1, 2004
Filed:
Mar 20, 2003
Appl. No.:
10/393508
Inventors:
Xingfu Chen - Eden Prairie MN, US
Daniel Lynch - Southwick MA, US
Nelson Mark - Manchester CT, US
Walter Bosenberg - Simsbury CT, US
Jason Xu - New Haven CT, US
Lawrence Brodsky - Tolland CT, US
John Clark - Somers CT, US
Assignee:
JDS UNIPHASE CORPORATION - San Jose CA
International Classification:
H01L021/44
US Classification:
438/597000
Abstract:
An electrode structure wherein galvanic corrosion at adhesion layers formed between electrodes and electronic or electro-optic substrates is eliminated. The electrode structure includes an electro-optic crystalline substrate, an amorphous layer disposed on the crystalline substrate, the amorphous layer having a composition substantially similar to a composition of the crystalline substrate, and a gold layer disposed directly on the amorphous layer. The amorphous layer is created using ion sputtering etching techniques that clean and activate the surface of the crystalline substrate such that the gold layer is able to adhere to it.

Y-Branch Dual Optical Phase Modulator

View page
US Patent:
20130170781, Jul 4, 2013
Filed:
Dec 28, 2011
Appl. No.:
13/338929
Inventors:
Karl KISSA - West Simsbury CT, US
Jason Jiazhan XU - Weatogue CT, US
International Classification:
G02F 1/035
US Classification:
385 3
Abstract:
The invention relates to Y-branch waveguide dual optical phase modulators with improved electro-optic (EO) frequency and step responses at frequencies below 1 Hz for use in low-frequency applications such fiber-optic gyroscopes. A Y-branch waveguide structure is formed in an EO substrate, with three or more electrodes used to form a waveguide phase modulator in each of two output waveguide arms. In one embodiment an insulating buffer layer is provided between at least a portion of the electrodes and the substrate for flattening the low-frequency EO response by reducing the modulation efficiency below 1 Hz. In one embodiment each of the waveguide phase modulators includes two ground electrodes extending along both sides of a signal electrode. A top portion of the substrate may be doped to reduce lateral variations of the substrate conductivity in the waveguide and non-waveguide portions thereof between corresponding signal and ground electrodes.
Jason J Xu from Weatogue, CT, age ~63 Get Report