Resumes
Resumes
Gang He Phones & Addresses
-
Alhambra, CA
-
Glendora, CA
-
Monterey Park, CA
-
10640 Bogue St, Temple City, CA 91780
-
Los Angeles, CA
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San Gabriel, CA
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236 E Camden St, Glendora, CA 91740 (626) 579-6398
Work
Position:
Executive, Administrative, and Managerial Occupations
Education
Degree:
High school graduate or higher
Business Records
Name / Title
Company / Classification
Phones & Addresses
President
Diligent Trucking Inc
12828 Ramona Blvd, Duarte, CA 91706
President
Shla Group Inc
1429 Via Cataluna, Palos Verdes Estates, CA 90274
Principal
ADVANCED E-FINANCIAL TECHNOLOGIES, INC
Investment Advisory Service · Management Consulting Services
Investment Advisory Service · Management Consulting Services
25198 Lemongrass St, Corona, CA 92883
420 Mckinley St, Corona, CA 92879
2549 Eastbluff Dr, Newport Beach, CA 92660
420 Mckinley St, Corona, CA 92879
2549 Eastbluff Dr, Newport Beach, CA 92660
HEALING GARDEN RELAXATION STATION LLC
President
SNOW HAWK GROUP, INC
319 El Dorado St, Arcadia, CA 91006
President
HYROCKS, INC
Business Services at Non-Commercial Site
Business Services at Non-Commercial Site
20804 Regency Ct, Walnut, CA 91789
President
EAGLEMAN GENERAL CORPORATION
Nonclassifiable Establishments
Nonclassifiable Establishments
15346 Least Bells Ct, Riverside, CA 92503
420 Mckinley St, Corona, CA 92879
420 Mckinley St, Corona, CA 92879
President
AMERICAN XUMING INTERNATIONAL ENTERPRISE INC
*1026 North Huntington Dr, Arcadia, CA 91007
1026 N Huntington Dr, Arcadia, CA 91007
1026 N Huntington Dr, Arcadia, CA 91007
Publications
Wikipedia References
Gang He
Us Patents
Encoder Signal Analysis System For High-Resolution Position Measurement
View pageUS Patent:
59331062, Aug 3, 1999
Filed:
Jul 11, 1997
Appl. No.:
8/890741
Inventors:
Gang He - Pasadena CA
Harry A. Atwater - Pasadena CA
Harry A. Atwater - Pasadena CA
Assignee:
California Institute of Technology - Pasadena CA
International Classification:
H03M 522
US Classification:
341116
Abstract:
A signal analysis system for processing quadrature analog waveforms from an encoder. High-resolution position measurements for external measurement devices are obtained. A hardware component receives the quadrature analog signals from the encoder and processes these signals to generate low and high-resolution waveforms. These waveforms are then further processed and sent as first and second data streams to a computational component of the signal analysis system. The absolute phase angle (. THETA. ) of the encoder's analog signal is determined by processing the data streams with the computational component. . THETA. is compared to a series of calibration factors to determine the position of the translating component of the external measurement device.
Epitaxial Lift Off Stack Having A Pre-Curved Handle And Methods Thereof
View pageUS Patent:
20150279741, Oct 1, 2015
Filed:
May 27, 2015
Appl. No.:
14/723223
Inventors:
- Santa Clara CA, US
Harry ATWATER - South Pasadena CA, US
Thomas GMITTER - Sunnyvale CA, US
Gang HE - Cupertino CA, US
Andreas HEGEDUS - Burlingame CA, US
Gregg HIGASHI - San Jose CA, US
Stewart SONNENFELDT - Burlingame CA, US
Harry ATWATER - South Pasadena CA, US
Thomas GMITTER - Sunnyvale CA, US
Gang HE - Cupertino CA, US
Andreas HEGEDUS - Burlingame CA, US
Gregg HIGASHI - San Jose CA, US
Stewart SONNENFELDT - Burlingame CA, US
International Classification:
H01L 21/78
H01L 21/306
H01L 21/02
H01L 21/683
H01L 21/306
H01L 21/02
H01L 21/683
Abstract:
Embodiments of the invention generally relate to epitaxial lift off (ELO) thin films and devices and methods used to form such films and devices. In one embodiment, a method for forming an ELO thin film is provided which includes depositing an epitaxial material over a sacrificial layer on a substrate, adhering a flattened, pre-curved support handle onto the epitaxial material, and removing the sacrificial layer during an etching process. The etching process includes bending the pre-curved support handle to have substantial curvature while peeling the epitaxial material from the substrate and forming an etch crevice therebetween. Compression is maintained within the epitaxial material during the etching process. The flattened, pre-curved support handle may be formed by flattening a pre-curved support material.