Chantha Lom Phones & Addresses
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21001 NW Old Pass Rd, Hillsboro, OR 97124
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4188 171St Ave, Beaverton, OR 97006 (503) 439-9176
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Elk Grove, CA
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Clackamas, OR
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996 Chapel Hill Way, San Jose, CA 95122
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Sacramento, CA
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Carmichael, CA
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4188 NW 171St Ave, Beaverton, OR 97006
Work
Position:
Professional/Technical
Education
Degree:
High school graduate or higher
Publications
Us Patents
Dual-Wavelength Exposure For Reduction Of Implant Shadowing
View pageUS Patent:
6913872, Jul 5, 2005
Filed:
Sep 30, 2002
Appl. No.:
10/262301
Inventors:
John L. Sturtevant - Beaverton OR, US
Yiming Gu - Hillsboro OR, US
Dyiann Chou - Portland OR, US
Chantha Lom - Beaverton OR, US
Yiming Gu - Hillsboro OR, US
Dyiann Chou - Portland OR, US
Chantha Lom - Beaverton OR, US
Assignee:
Integrated Device Technology, Inc. - Santa Clara CA
International Classification:
G03F007/20
US Classification:
430322, 430394, 430494
Abstract:
A method for generating a photoresist structure is disclosed in which a layer of photoresist is deposited over a semiconductor substrate. In a first exposure, the layer of photoresist is exposed to deep ultraviolet light. A second exposure is then performed using a different wavelength of light to pattern the layer of photoresist. The photoresist is then developed so as to form a photoresist structure having reduced thickness and rounded corners. This gives a photoresist structure having a reduced shadow area. An angled ion implant can then be performed using the photoresist structure as a mask.