Yu C Guan

6570650, May 27, 2003

Sep 7, 2001

09/948974

Yu Guan - San Jose CA
Hong Fu - Fremont CA
Steven R. Lange - Alamo CA

KLA-Tenor Corporation - San Jose CA

G01N 2188

3562374, 3562371, 3562372, 3562373, 3562375, 250205, 25055926

Disclosed are methods and apparatus for designing an optical spectrum of an illumination light beam within an optical inspection system. A set of conditions for inspecting a film on a sample by directing an illumination light beam at the sample is determined. At least a portion of the illumination light beam is reflected off the sample and used to generate an image of at least a portion of the film on the sample. A plurality of peak wavelength values are determined for the optical spectrum of the illumination light beam so as to control color variation in the image of the film portion. The determination of the peak wavelengths is based on the determined set of conditions and a selected thickness range of the film. In one specific embodiment, the color variation is reduced, while in another embodiment the color variation is increased to enhance pattern contrast. An apparatus which implements the designed optical spectrum is also disclosed.

6831742, Dec 14, 2004

Oct 23, 2000

09/695577

Zhifeng Sui - Milpitas CA
Hongqing Shan - Cupertino CA
Nils Johansson - Los Gatos CA
Hamid Noorbakhsh - Fremont CA
Yu Guan - San Jose CA

Applied Materials, Inc - Santa Clara CA

G01J 400

356369, 356364, 356630, 438700, 216 2

A substrate processing apparatus comprises a chamber capable of processing a substrate , a radiation source to provide a radiation, a radiation polarizer adapted to polarize the radiation to one or more polarization angles that are selected in relation to an orientation of a feature being processed on the substrate , a radiation detector to detect radiation reflected from the substrate during processing and generate a signal, and a controller to process the signal.

7027146, Apr 11, 2006

Jun 27, 2002

10/185308

Ian Smith - Los Gatos CA, US
Christian Wolters - Campbell CA, US
Yu Guan - San Jose CA, US
Don Brayton - Sunland CA, US

KLA-Tencor Technologies Corp. - Milpitas CA

G01N 21/88

3562436

Methods for forming calibration standards for an inspection system and calibration standards are provided. One method includes scanning a first and a second specimen with an optical system. Master standard particles having a lateral dimension traceable to a national or international authority or first principles measurements are deposited on the first specimen. Product standard particles are deposited on the second specimen. In addition, the method includes determining a lateral dimension of the product standard particles by comparing data generated by scanning the two specimens. One calibration standard includes particles having a lateral dimension of less than about 100 nm deposited on a specimen. A distribution of the lateral dimension has a full width at half maximum of less than about 3%. The uncertainty of the lateral dimension is less than about 2%.

20130003053, Jan 3, 2013

Jun 15, 2012

13/524147

Yu Guan - Pleasanton CA, US

KLA-TENCOR CORPORATION - Milpitas CA

G01N 21/84
G06F 15/00

3562434, 702150

The present invention includes providing a plurality of standard particles; providing a substantially crystalline material having one or more characteristic spatial parameters, disposing the plurality of standard particles proximate to a portion of the substantially crystalline material, acquiring imagery data of the plurality of standard particles and the portion of the substantially crystalline material, establishing a spatial relationship between the plurality of standard particles and the portion of the substantially crystalline material utilizing the acquired imagery data, and determining one or more spatial parameters of the plurality of standard particles utilizing the one or more characteristic spatial parameters of the substantially crystalline material and the established spatial relationship between the plurality of standard particles and the portion of the substantially crystalline material.

20220415619, Dec 29, 2022

May 23, 2022

17/751048

- Beijing, CN
- Fremont CA, US
Yu Guan - Pleasanton CA, US

H01J 37/32

A plasma processing apparatus including a processing chamber having one or more sidewalls and a dome is provided. The plasma processing apparatus includes a workpiece support disposed in the processing chamber configured to support a workpiece during processing, an induction coil assembly for producing a plasma in the processing chamber, a Faraday shield disposed between the induction coil assembly and the dome, the Faraday shield comprising an inner portion and an outer portion, and a thermal management system. The thermal management system including one or more heating elements configured to heat the dome, and one or more thermal pads disposed between an outer surface of the dome and the heating elements, wherein the one or more thermal pads are configured to facilitate heat transfer between the one or more heating elements and the dome. Thermal management systems and methods for processing workpieces are also provided.

20150316411, Nov 5, 2015

Apr 29, 2015

14/699880

- Milpitas CA, US
Yu Guan - Pleasanton CA, US
James George - Berkeley CA, US

G01J 1/18
G01J 1/04
G01J 3/02
H05B 33/08

The present disclosure provides methods and apparatus for testing light-emitting diodes (LEDs), for example, measuring the optical radiation of an LED. In a method, a pulse-width modulated signal is provided to the LED. One or more characteristics of the PWM signal are varied so as to provide a forward voltage, V, corresponding to a target junction temperature, T, of the LED. The optical radiation of the LED is measured when the LED obtains the target junction temperature.

20150316604, Nov 5, 2015

Apr 27, 2015

14/696891

- Milpitas CA, US
Alan BRODIE - Palo Alto CA, US
James GEORGE - Berkeley CA, US
Yu GUAN - Pleasanton CA, US
Ralph NYFFENEGGER - Palo Alto CA, US

G01R 31/26

Light-emitting devices, such as LEDs, are tested using a photometric unit. The photometric unit, which may be an integrating sphere, can measure flux, color, or other properties of the devices. The photometric unit may have a single port or both an inlet and outlet. Light loss through the port, inlet, or outlet can be reduced or calibrated for. These testing systems can provide increased reliability, improved throughput, and/or improved measurement accuracy.