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Kim Lee Phones & Addresses

  • San Jose, CA
  • Mountain View, CA
  • Santa Clara, CA

Professional Records

License Records

Kim Eun Lee

License #:
337690
Category:
Nurse Practitioner - Family Health
Issued Date:
Nov 29, 2012
Type:
NURSE PRACTITIONER IN FAMILY HEALTH

Kim Jessica Lee

License #:
017296
Category:
Occupational Therapist
Issued Date:
Mar 26, 2012
Type:
OCCUPATIONAL THERAPY

Kim H Lee

License #:
20250 - Expired
Category:
Nursing
Issued Date:
Mar 22, 2006
Effective Date:
Nov 1, 2011
Expiration Date:
Oct 31, 2011
Type:
Licensed Practical Nurse

Kim H Lee

License #:
75355 - Expired
Category:
Nursing Support
Issued Date:
Jul 14, 2006
Effective Date:
Nov 8, 2010
Type:
Nurse Aide

Lawyers & Attorneys

Kim Lee Photo 1

Kim Lee - Lawyer

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Office:
Lee & Wu, Solicitors
ISLN:
919763287
Admitted:
1997
Kim Lee Photo 2

Kim Lee - Lawyer

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Specialties:
Public Finance
Government Law
Corporate
General Practice
ISLN:
900509511
Admitted:
1993
University:
Yale College, B.A., 1989
Law School:
New York University, J.D., 1993

Medicine Doctors

Kim Lee Photo 3

Dr. Kim Lee, San Jose CA - MD (Doctor of Medicine)

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Specialties:
Internal Medicine
Address:
Kaiser Permanente San Jose Medical
260 International Cir, San Jose, CA 95119
(408) 972-7000 (Phone)
Certifications:
Internal Medicine, 1987
Awards:
Healthgrades Honor Roll
Languages:
English
Hospitals:
Kaiser Permanente San Jose Medical
260 International Cir, San Jose, CA 95119

Kaiser Permanente San Jose Medical Center
250 Hospital Parkway, San Jose, CA 95119

Kaiser Permanente Vallejo Medical Center
975 Sereno Drive, Vallejo, CA 94589
Education:
Medical School
Jefferson Medical College Of Thomas Jefferson University, Thomas Jefferson University
Graduated: 1991
Medical School
West La Va Med Center
Graduated: 1992
Medical School
West La Va Med Center
Graduated: 1994
Medical School
University Of California Los Angeles
Graduated: 1994
Kim Lee Photo 4

Kim Lee, San Francisco CA - OD (Doctor of Optometry)

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Specialties:
Child & Adolescent Psychiatry
Address:
5372 Mission St, San Francisco, CA 94112
(415) 452-8320 (Phone)
Languages:
English
Education:
Medical School
University of California At San Diego
Graduated: 2006
Kim Lee Photo 5

Kim C. Lee

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Specialties:
Pediatrics, Adolescent Medicine
Work:
Best Care Pediatrics
470 State Rte 79 STE 12, Morganville, NJ 07751
(732) 970-9070 (phone), (732) 970-9071 (fax)
Education:
Medical School
SUNY Downstate Medical Center College of Medicine
Graduated: 1992
Conditions:
Acute Bronchitis
Acute Conjunctivitis
Acute Pharyngitis
Acute Sinusitis
Acute Upper Respiratory Tract Infections
Languages:
Chinese
English
Description:
Dr. Lee graduated from the SUNY Downstate Medical Center College of Medicine in 1992. He works in Morganville, NJ and specializes in Pediatrics and Adolescent Medicine. Dr. Lee is affiliated with Centrastate Medical Center.
Kim Lee Photo 6

Kim C. Lee

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Specialties:
Nephrology, Internal Medicine
Work:
Healthcare Partners Medical Group
880 S Atlantic Blvd STE 101, Monterey Park, CA 91754
(626) 281-6969 (phone), (626) 281-5245 (fax)
Education:
Medical School
Inst of Med I, Yangon, Myanmar
Graduated: 1971
Conditions:
Abnormal Vaginal Bleeding
Acne
Acute Upper Respiratory Tract Infections
Anxiety Phobic Disorders
Candidiasis of Vulva and Vagina
Languages:
Chinese
English
Spanish
Description:
Dr. Lee graduated from the Inst of Med I, Yangon, Myanmar in 1971. She works in Monterey Park, CA and specializes in Nephrology and Internal Medicine. Dr. Lee is affiliated with Beverly Hospital, Monterey Park Hospital and White Memorial Medical Center.
Kim Lee Photo 7

Kim G. Lee

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Description:
Dr. Lee graduated from the Royal Coll of Surgeons in Ireland, Med Sch, Dublin, Ireland in 1991. He works in Grand Rapids, MI and 1 other location and specializes in Pediatric Cardiology. Dr. Lee is affiliated with Butterworth Hospital.
Kim Lee Photo 8

Kim Soo Lee

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Specialties:
Psychiatry
Education:
University of California at San Diego (2006)
Kim Lee Photo 9

Kim M Iverson Lee, San Jose CA

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Specialties:
Internal Medicine
Physical Medicine & Rehabilitation
Work:
San Jose Medical Center
280 Hospital Pkwy, San Jose, CA 95119
Education:
University of Southern California(1984)
Kim Lee Photo 10

Kim Ming Lee, San Francisco CA

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Specialties:
Optometrist
Address:
5372 Mission St, San Francisco, CA 94112

Business Records

Name / Title
Company / Classification
Phones & Addresses
Kim Lee
Administrative Assistant
Emergency Services Academy Ltd
ESA
Training - Industrial Safety. Fire Department Equipment & Supplies. Employment Training. Emergency Planning Consultants. Schools - Health & Safety. Training Programs
161 Broadway Blvd, 2nd Floor, Sherwood Park, AB T8H 2A8
(780) 416-8822, (780) 449-4787
Kim Lee
Owner
Bay Area Paralegal Service
Paralegal Services
417 Camille Cir, San Jose, CA 95134
(408) 456-0450
Kim Lee
Partner
Minnda Scientific
Chemical Consultant
43551 Msn Blvd, Fremont, CA 94539
(408) 230-9370
Kim Lee
Principal
Hay Cheng
Whol Farm Supplies
291 Channi Loop, Danville, CA 94506
Kim Lee
Administrative Assistant
Emergency Services Academy Ltd
Training - Industrial Safety · Fire Department Equipment & Supplies · Employment Training · Emergency Planning Consultants · Schools - Health & Safety · Training Programs
(780) 416-8822, (780) 449-4787
Kim Lee
Senior Vice Presiden
Global Atlantic Risk Services LLC
Diversified Financial Services
Kim Lee
Branch Manager
County of Weber
Regulation Misc Commercial Sector · Executive Office · General Government · Housing Program · Administrative Educational Programs · Court · Legal Services Office Executive Office · County Computer Processing Center
(801) 399-8374, (801) 399-8401, (801) 399-8498, (801) 399-8623
Kim Lee
Irving & Mission, LLC
Real Estate Investment
9000 Crow Cyn Rd, Danville, CA 94506
265 5 Ave, San Francisco, CA 94118

Publications

Us Patents

Patterned Heat Conducting Photocathode For Electron Beam Source

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US Patent:
6376984, Apr 23, 2002
Filed:
Jul 29, 1999
Appl. No.:
09/364274
Inventors:
Andres Fernandez - Dublin CA
Marian Mankos - San Francisco CA
Kim Lee - Fremont CA
Steven T. Coyle - Newark CA
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
H01J 3150
US Classification:
313530, 31323101
Abstract:
A photocathode emitter as a source of electron beams, having an optically transmissive substrate patterned to define a protrusion, heat conducting material occupying the space surrounding the protrusion, and a photoemitter layer over the protrusion. The photoemitter is positioned on the side of the substrate opposite the surface on which the illumination is incident, and has an irradiation region at the contact with the top of the protrusion patterned on the substrate, and an emission region opposite the irradiation region, these regions being defined by the path of the illumination. The heat conducting material around the protrusion conducts heat away from this focused region of illumination on the photocathode to allow higher currents to be achieved from the photocathode and thus permits higher throughput rates in applications including electron beam lithography. In one version, the photocathode is fabricated using microfabrication techniques, to achieve a small emission spot size.

Gated Photocathode For Controlled Single And Multiple Electron Beam Emission

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US Patent:
6376985, Apr 23, 2002
Filed:
Mar 31, 1998
Appl. No.:
09/052903
Inventors:
Kim Y. Lee - Fremont CA
Marian Mankos - San Francisco CA
C. Neil Berglund - Oregon City OR
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
H01J 4006
US Classification:
313542, 313544, 313523, 313531, 313530, 313540
Abstract:
A photocathode having a gate electrode so that modulation of the resulting electron beam is accomplished independently of the laser beam. The photocathode includes a transparent substrate, a photoemitter, and an electrically separate gate electrode surrounding an emission region of the photoemitter. The electron beam emission from the emission region is modulated by voltages supplied to the gate electrode. In addition, the gate electrode may have multiple segments that are capable of shaping the electron beam in response to voltages supplied individually to each of the multiple segments.

Connection Detection Circuit And Method

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US Patent:
6378026, Apr 23, 2002
Filed:
May 24, 1999
Appl. No.:
09/317502
Inventors:
Paul S. Chan - Cupertino CA
Raymond Chow - Saratoga CA
Joost Decupere - Zaventem, BE
Kim Lee - San Jose CA
Henry K. Wong - Cupertino CA
Assignee:
SIPEX Corporation - Billerica MA
International Classification:
G06F 1300
US Classification:
710300, 713323
Abstract:
A circuit and a method are presented which allow for the detection of an active communication device connected to the circuit. The circuit output signal can be used to reduce the power consumption of related equipment when communication is not detected for a predetermined period of time. The circuit includes a plurality of input terminals coupled to respective inactive detection blocks. The circuit also includes an accumulated delay block having delay circuits in serial electrical communication. Each inactive detection block provides a signal to a respective delay circuit that indicates whether the corresponding input terminal is connected to an active driver in the communication device. Each delay circuit provides a delayed output signal to a subsequent delay circuit. The accumulated delay block provides an output signal indicating the presence or absence of the communication device based on the activity at the input terminals over the predetermined period of time.

Methods Of Making A Read Sensor With Use Of A Barrier Structure For Depositing Materials

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US Patent:
7070697, Jul 4, 2006
Filed:
Apr 14, 2003
Appl. No.:
10/413322
Inventors:
James Mac Freitag - San Jose CA, US
Kim Yang Lee - Fremont CA, US
Mustafa Pinarbasi - Morgan Hill CA, US
Chun-Ming Albert Wang - San Jose CA, US
Assignee:
Hitachi Global Storage Technologies Netherlands B.V. - Amsterdam
International Classification:
B44C 1/22
G11B 5/127
US Classification:
216 22, 216 41, 427132, 427282, 2960318, 360322
Abstract:
In one illustrative example, a method of making a read sensor of a magnetic head involves forming a barrier structure which surrounds a central mask formed over a plurality of read sensor layers; etching the read sensor layers to form the read sensor below the mask; and depositing, with use of the mask and the barrier structure, hard bias and lead layers to form around the read sensor. The barrier structure may be formed by, for example, depositing one or more barrier structure layers over the read sensor layers and performing a photolithography process. The barrier structure physically blocks materials being deposited at relatively low angles (e. g. angles at or below 71 degrees) so as to reduce their formation far underneath the mask (e. g. when using a bridged mask), which could otherwise form an electrical short, and/or to improve the symmetry of the deposited materials around the read sensor.

Methods Of Making Magnetic Write Heads Using Electron Beam Lithography

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US Patent:
7086139, Aug 8, 2006
Filed:
Apr 30, 2004
Appl. No.:
10/836136
Inventors:
Kim Y. Lee - Fremont CA, US
Jyh-Shuey Jerry Lo - San Jose CA, US
Assignee:
Hitachi Global Storage Technologies Netherlands B.V. - Amsterdam
International Classification:
G11B 5/127
G11B 5/187
US Classification:
2960307, 2960312, 2960313, 2960315, 2960318, 360122
Abstract:
A pedestal is formed over a first pole piece layer and insulator materials are formed to surround it. A gap layer made of a non-magnetic insulator or metal is then formed over the pedestal and the insulator, followed by the optional formation of a seed layer. A second pole piece is formed over the gap layer with or without the seed layer by forming a patterned resist using E-beam lithography and electroplating second pole piece materials within the patterned resist. After milling to remove side portions of the gap layer and the optional seed layer, a chemical etch is performed to remove a top portion of the insulator materials. The pedestal is then notched and trimmed by ion milling using the second pole piece as a mask to form a central notched structure. Since the second pole piece is precisely centered over the pedestal prior to notching, the pedestal is notched symmetrically to form a notched structure having side walls with angled slopes.

Magnetoresistive Sensor Having A Self Aligned Lead Overlay Structure And Method Of Fabrication Thereof

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US Patent:
7133263, Nov 7, 2006
Filed:
Dec 17, 2002
Appl. No.:
10/323339
Inventors:
Edward Hin Pong Lee - Santa Clara CA, US
Kim Y. Lee - Fremont CA, US
Tsann Lin - Saratoga CA, US
Assignee:
Hitachi Global Storage Technologies Netherlands B.V. - Amsterdam
International Classification:
G11B 5/33
G11B 5/127
US Classification:
360322, 2960301
Abstract:
A self aligned magnetoresistive sensor having a narrow and well defined track width and method of manufacture thereof.

Method For Making A Contact Magnetic Transfer Template

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US Patent:
7160477, Jan 9, 2007
Filed:
Jan 26, 2005
Appl. No.:
11/044288
Inventors:
Zvonimir Z. Bandic - San Jose CA, US
A. David Erpelding - San Jose CA, US
Jordan Asher Katine - San Jose CA, US
Quang Le - San Jose CA, US
Kim Y. Lee - Fremont CA, US
Jui-Lung Li - San Jose CA, US
Michael J. Rooks - Briarcliff Manor NY, US
Assignee:
Hitachi Global Storage Technologies Netherlands B.V. - Amsterdam
International Classification:
B44C 1/22
US Classification:
216 22, 216 88, 438692, 438740, 2960306, 2960307
Abstract:
A contact magnetic transfer (CMT) master template is made by first adhering a plastic film to a first surface of a silicon wafer. A resist pattern is then formed on the polyimide film and the polyimide is reactive-ion-etched through the resist to form recesses. The resist is removed and a chemical-mechanical-polishing (CMP) stop layer is deposited over the non-recessed regions of the polyimide, and optionally into the bottoms of the recesses. A layer of magnetic material is then deposited over the polyimide film to fill the recesses. A CMP process is then performed to remove magnetic material above the recesses and above the non-recessed regions and continued until the CMP stop layer is reached. The resulting upper surface of the polyimide film is then a continuous planar film of magnetic islands and regions of CMP stop layer material that function as the nonmagnetic regions of the template.

Methods For Improving Positioning Performance Of Electron Beam Lithography On Magnetic Wafers

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US Patent:
7172786, Feb 6, 2007
Filed:
May 14, 2004
Appl. No.:
10/845956
Inventors:
Alexander Adrian Girling Driskill-Smith - Los Gatos CA, US
Hieu Lam - Milpitas CA, US
Kim Y. Lee - San Jose CA, US
Assignee:
Hitachi Global Storage Technologies Netherlands B.V. - Amsterdam
International Classification:
B05D 5/12
US Classification:
427129, 427127, 427128, 427131
Abstract:
The present invention discloses a method for the production of sub-micron structures on magnetic materials using electron beam lithography. A subtractive process is disclosed wherein a portion of a magnetic material layer is removed from the substrate using conventional lithography, and the remaining portion of the magnetic material layer is patterned by e-beam lithography. A additive process is also disclosed wherein a thin magnetic seed layer is deposited on the substrate, a portion of which is removed by conventional lithography and replaced with a non-magnetic conducting layer. The remaining portion of magnetic seed layer is patterned by e-beam lithography and the final magnetic structure produced by electroplating.
Kim Chi Lee from San Jose, CA, age ~65 Get Report