Yuval Ofir Phones & Addresses
-
Amherst, MA
Publications
Us Patents
Direct Incident Beam Lithography For Patterning Nanoparticles, And The Articles Formed Thereby
View pageUS Patent:
20090047485, Feb 19, 2009
Filed:
Aug 18, 2008
Appl. No.:
12/193437
Inventors:
Yuval Ofir - Amherst MA, US
Vincent Martin Rotello - Amherst MA, US
Mark Thomas Tuominen - Shutesbury MA, US
Qijun Xiao - Amherst MA, US
Bappaditya Samanta - Amherst MA, US
Vincent Martin Rotello - Amherst MA, US
Mark Thomas Tuominen - Shutesbury MA, US
Qijun Xiao - Amherst MA, US
Bappaditya Samanta - Amherst MA, US
International Classification:
B32B 5/02
G03F 7/00
G03F 7/00
US Classification:
428206, 430311
Abstract:
Disclosed herein is a method for generating a three-dimensional structure on a surface. The method comprises forming a layer comprising a plurality of nanoparticles on a surface; and exposing a portion of the layer to incident radiation having a defined pattern at a dosage effective to aggregate the nanoparticles in the exposed portion of the layer into a three-dimensional structure, wherein the three-dimensional structure has a shape defined by the pattern of the radiation and a height defined by the dosage of the incident radiation and a thickness of the nanoparticle layer. Alternatively, the method comprises forming a layer comprising a plurality of nanoparticles on a surface of a three-dimensional template; and exposing at least a portion of the layer to incident radiation at a dosage effective to aggregate the nanoparticles in the exposed portion of the layer into a three-dimensional structure that corresponds to the three-dimensional template.
Functionalized Nanostructure, Methods Of Manufacture Thereof And Articles Comprising The Same
View pageUS Patent:
20090264317, Oct 22, 2009
Filed:
Apr 9, 2009
Appl. No.:
12/421259
Inventors:
Yuval Ofir - Amherst MA, US
Vincent Martin Rotello - Amherst MA, US
Brian John Jordan - Andover MA, US
Kenneth Raymond Carter - Hadley MA, US
Vincent Martin Rotello - Amherst MA, US
Brian John Jordan - Andover MA, US
Kenneth Raymond Carter - Hadley MA, US
Assignee:
UNIVERSITY OF MASSACHUSETTS - Boston MA
International Classification:
C40B 50/14
C40B 30/00
C40B 40/04
C40B 40/06
C40B 40/10
B29C 35/08
B32B 3/00
C40B 30/00
C40B 40/04
C40B 40/06
C40B 40/10
B29C 35/08
B32B 3/00
US Classification:
506 16, 506 30, 506 7, 506 15, 506 18, 264132, 264496, 4281951, 422 681
Abstract:
Disclosed is a method comprising disposing a functionalized patternable material on a substrate, wherein the functionalized patternable material comprises a first click chemical moiety; patterning the functionalized patternable material; and reacting the first click chemical moiety with a complementary reactant to form an functionalized patterned surface, the complementary reactant comprising a second click chemical moiety that reacts with the first click chemical moiety; the complementary reactant comprising an functional group.