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Yukinori Ikegawa

from Cupertino, CA
Age ~58
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Also known as:
I A
Phone and address:
202 Calvert Dr APT 193, Cupertino, CA 95014
Related to:
Rimi Ikegawa
Connected to:
Stephanie A Ikegbunam, 37Nonye U Ikegwuonu, 40Bryan S Ikehara, 72Ronald S Ikehara, 63Keisuke Ikehata, 50Karl L Ikehorn, 69Chester M Ikei, 77Dan N Ikei, 48Chuck Ikeji, 69Ernest O Ikeji, 76

Yukinori Ikegawa Phones & Addresses

  • 202 Calvert Dr APT 193, Cupertino, CA 95014

Publications

Us Patents

Method Of Manufacturing Plasmon Generator

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US Patent:
8400884, Mar 19, 2013
Filed:
Jan 19, 2012
Appl. No.:
13/353981
Inventors:
Hironori Araki - Milpitas CA, US
Yoshitaka Sasaki - Santa Clara CA, US
Hiroyuki Ito - Milpitas CA, US
Kazuki Sato - Milpitas CA, US
Shigeki Tanemura - Milpitas CA, US
Yukinori Ikegawa - Milpitas CA, US
Assignee:
Headway Technologies, Inc. - Milpitas CA
International Classification:
G11B 21/08
G11B 7/085
US Classification:
369 1302, 369 1303, 369 1314, 369 1332, 369 1333, 369 1334, 36911227
Abstract:
A method of manufacturing a plasmon generator includes the steps of forming an accommodation part and forming the plasmon generator to be accommodated in the accommodation part. The step of forming the accommodation part includes the steps of: forming a dielectric layer having an upper surface; etching the dielectric layer by using an etching mask and thereby forming a groove in the dielectric layer; and forming a dielectric film in the groove. The groove has first and second sidewalls and a bottom. Each of the first and second sidewalls forms an angle in the range of 0 to 15 relative to the direction perpendicular to the upper surface of the dielectric layer. The dielectric film includes a first portion interposed between the first sidewall and the first side surface, and a second portion interposed between the second sidewall and the second side surface.

Magnetic Head For Perpendicular Magnetic Recording Having A Return Path Section

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US Patent:
8416528, Apr 9, 2013
Filed:
May 3, 2012
Appl. No.:
13/463298
Inventors:
Yoshitaka Sasaki - Santa Clara CA, US
Hiroyuki Ito - Milpitas CA, US
Shigeki Tanemura - Milpitas CA, US
Kazuki Sato - Milpitas CA, US
Yukinori Ikegawa - Milpitas CA, US
Atsushi Iijima - Hong Kong, CN
Tatsuya Shimizu - Hong Kong, CN
Assignee:
Headway Technologies, Inc. - Milpitas CA
SAE Magnetics (H.K.) Ltd. - Hong Kong
International Classification:
G11B 5/127
US Classification:
36012502, 2960316
Abstract:
A magnetic head includes a main pole and a return path section located above a top surface of a substrate. The main pole has an end face located in a medium facing surface. The return path section is located on the front side in the direction of travel of a recording medium relative to the main pole and is farther from the top surface of the substrate than is the main pole. The return path section has: a front end face located on the front side of the main pole in the medium facing surface; and an inclined surface located on the front side and connected to the front end face. The inclined surface is not exposed in the medium facing surface. An angle greater than 90 is formed between the front end face and the inclined surface.

Taper-Etching Method And Method Of Manufacturing Near-Field Light Generator

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US Patent:
8461050, Jun 11, 2013
Filed:
Jun 10, 2011
Appl. No.:
13/157938
Inventors:
Hironori Araki - Milpitas CA, US
Yoshitaka Sasaki - Santa Clara CA, US
Hiroyuki Ito - Milpitas CA, US
Kazuki Sato - Milpitas CA, US
Shigeki Tanemura - Milpitas CA, US
Yukinori Ikegawa - Milpitas CA, US
Assignee:
Headway Technologies, Inc. - Milpitas CA
International Classification:
H01L 21/311
US Classification:
438701, 438 31, 257E21249, 257E21231
Abstract:
A method of taper-etching a layer to be etched that is made of SiOor SiON and has a top surface. The method includes the step of forming an etching mask with an opening on the top surface of the layer to be etched, and the step of taper-etching a portion of the layer to be etched, the portion being exposed from the opening, by reactive ion etching so that a groove having two wall faces that intersect at a predetermined angle is formed in the layer to be etched. The etching mask is formed of a material containing elemental Al. The step of taper-etching employs an etching gas that contains a main component gas, which contributes to the etching of the layer to be etched, and N.

Method Of Forming Main Pole Of Thermally-Assisted Magnetic Recording Head

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US Patent:
8465658, Jun 18, 2013
Filed:
May 18, 2011
Appl. No.:
13/110442
Inventors:
Hironori Araki - Milpitas CA, US
Yoshitaka Sasaki - Santa Clara CA, US
Hiroyuki Ito - Milpitas CA, US
Kazuki Sato - Milpitas CA, US
Shigeki Tanemura - Milpitas CA, US
Yukinori Ikegawa - Milpitas CA, US
Assignee:
Headway Technologies, Inc. - Milpitas CA
International Classification:
B44C 1/22
G11B 5/127
G11B 11/00
US Classification:
216 22, 216 2, 216 24, 216 41, 216 56, 216 58, 216 67, 216 69, 216 70, 216 71, 36012501, 36012502, 36012503, 36012504, 36012505, 36012506, 296021, 2960301, 2960307, 2960313, 369 1301, 369 1302, 369 1314, 369 1317, 369 1318, 369 1322, 369 1324, 369 1332, 369 1333
Abstract:
In a method of forming a main pole, an initial accommodation layer is etched by RIE using a first etching mask having a first opening, whereby a groove is formed in the initial accommodation layer. Next, a part of the initial accommodation layer including the groove is etched by RIE using a second etching mask having a second opening, so that the groove becomes an accommodation part. The main pole is then formed in the accommodation part. The first etching mask has first and second sidewalls that face the first opening and are opposed to each other at a first distance in a track width direction. The second etching mask has third and fourth sidewalls that face the second opening and are opposed to each other at a second distance greater than the first distance.

Plasmon Generator Including Two Portions Made Of Different Metals

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US Patent:
8576674, Nov 5, 2013
Filed:
Oct 27, 2011
Appl. No.:
13/283064
Inventors:
Yoshitaka Sasaki - Santa Clara CA, US
Hiroyuki Ito - Milpitas CA, US
Shigeki Tanemura - Milpitas CA, US
Hironori Araki - Milpitas CA, US
Kazuki Sato - Milpitas CA, US
Yukinori Ikegawa - Milpitas CA, US
Assignee:
Headway Technologies, Inc. - Milpitas CA
International Classification:
G11B 11/00
US Classification:
369 1333, 369 1313, 36911227
Abstract:
A plasmon generator configured to excite a surface plasmon based on light includes a first portion formed of a first metal material and a second portion formed of a second metal material different from the first metal material. The plasmon generator has a front end face. The front end face includes a near-field light generating part that generates near-field light based on the surface plasmon. The second portion includes an end face located in the front end face. The second metal material satisfies at least one of the following requirements: a lower ionization tendency than that of the first metal material; a lower electrical conductivity than that of the first metal material; and a higher Vickers hardness than that of the first metal material.

Magnetic Head For Perpendicular Magnetic Recording Having A Main Pole And A Shield

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US Patent:
20130308227, Nov 21, 2013
Filed:
May 16, 2012
Appl. No.:
13/473159
Inventors:
Yoshitaka SASAKI - Santa Clara CA, US
Hiroyuki ITO - Milpitas CA, US
Shigeki TANEMURA - Milpitas CA, US
Kazuki SATO - Milpitas CA, US
Yukinori IKEGAWA - Milpitas CA, US
Atsushi IIJIMA - Hong Kong, CN
Tatsuya SHIMIZU - Hong Kong, CN
Assignee:
HEADWAY TECHNOLOGIES, INC. - MILPITAS CA
International Classification:
G11B 5/17
G11B 5/127
US Classification:
36012312, 2960307, G9B 505
Abstract:
A magnetic head includes a magnetic structure incorporating a write shield. The magnetic structure is formed to include a first magnetic layer, a second magnetic layer stacked on the first magnetic layer, and a seed layer. The first magnetic layer has a front end face located in the medium facing surface and a top surface. The second magnetic layer has a front end face located in the medium facing surface and a bottom surface. The top surface of the first magnetic layer includes a first region including an end located in the medium facing surface and a second region farther from the medium facing surface than the first region. The seed layer is not present on the first region of the top surface of the first magnetic layer but is present on the second region.

Waveguide And Manufacturing Method Thereof

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US Patent:
20230003940, Jan 5, 2023
Filed:
Jun 30, 2021
Appl. No.:
17/364588
Inventors:
Yukinori IKEGAWA - Milpitas CA, US
Dayu ZHOU - Milpitas CA, US
Koji SHIMAZAWA - Milpitas CA, US
Yoshitaka SASAKI - Los Gatos CA, US
Hiroyuki ITO - Milpitas CA, US
Yoji NOMURA - Milpitas CA, US
Assignee:
HEADWAY TECHNOLOGIES, INC. - Milpitas CA
International Classification:
G02B 6/122
G02B 6/136
G11B 13/08
G11B 5/012
Abstract:
A waveguide includes a core and a cladding. The core has an inlet on which light is incident. The core includes a front portion and a rear portion located between the front portion and the inlet. The front portion and the rear portion each have a thickness that is a dimension in a first direction and a width that is a dimension in a second direction. The first direction is orthogonal to a propagation direction of the light. The second direction is orthogonal to the propagation direction of the light and the first direction. The thickness of the front portion decreases with increasing distance from the inlet.

Magnetic Head For Perpendicular Magnetic Recording Including Two Side Shields Configured To Enable A Reduction In Width Of An End Face Of The Main Pole Located In A Medium Facing Surface And An Increase In Cross-Sectional Area Of The Main Pole In The Vicinity Of The Medium Facing Surface

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US Patent:
20190228795, Jul 25, 2019
Filed:
Jan 25, 2018
Appl. No.:
15/880458
Inventors:
Yoshitaka SASAKI - Los Gatos CA, US
Hiroyuki ITO - Milpitas CA, US
Kazuki SATO - Milpitas CA, US
Hironori ARAKI - Milpitas CA, US
Yukinori IKEGAWA - Milpitas CA, US
Yoji NOMURA - Milpitas CA, US
Assignee:
HEADWAY TECHNOLOGIES, INC. - Milpitas CA
International Classification:
G11B 5/39
Abstract:
A first side shield has a first sidewall and a second sidewall, and a second side shield has a third sidewall and a fourth sidewall. The first to fourth sidewalls have first to fourth edges, respectively, that are farthest from a top surface of a substrate. The distance between a rear end of the first edge and a rear end of the third edge in a track width direction is greater than the distance between a front end of the first edge and a front end of the third edge in the track width direction. The distance between the second edge and the fourth edge in the track width direction increases with increasing distance from the medium facing surface.
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Yukinori Ikegawa from Cupertino, CA, age ~58 Get Report