Resumes
Resumes
Yohan Zondak Phones & Addresses
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6178 Glider Dr, San Jose, CA 95123
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1638 Willow Lake Ln, San Jose, CA 95131
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1405 Phelps Ave, San Jose, CA 95117 (408) 866-0423
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Charlottesville, VA
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Cupertino, CA
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West Lafayette, IN
Publications
Us Patents
Pre-Treatment To Eliminate The Defects Formed During Electrochemical Plating
View pageUS Patent:
20070080067, Apr 12, 2007
Filed:
Oct 7, 2005
Appl. No.:
11/245559
Inventors:
Haiyang Gu - San Jose CA, US
Jeff Yang - Sunnyvale CA, US
Ho Wee - Santa Clare CA, US
Ming Xi - Palo Alto CA, US
Glen Mori - Gilroy CA, US
Yohan Zondak - San Jose CA, US
Jeff Yang - Sunnyvale CA, US
Ho Wee - Santa Clare CA, US
Ming Xi - Palo Alto CA, US
Glen Mori - Gilroy CA, US
Yohan Zondak - San Jose CA, US
International Classification:
C23C 28/00
C25D 5/34
C25D 5/34
US Classification:
205183000, 205205000
Abstract:
Embodiments of the invention provide methods for reducing formation of void-type defects on the surface of a substrate during electrochemical plating. Embodiments of the invention provide methods to improve the wetting of a substrate surface prior to immersion and thereby minimize adhesion of bubbles to the substrate surface during immersion. A thin uniform metal oxide is formed on a metal layer on the substrate immediately prior to substrate immersion. In one aspect, exposing the substrate to an oxygen-containing gas, e.g. air, forms the metal oxide. The oxygen-containing gas may be flowed over the substrate or the substrate may be rotated at a high rate in the presence of an oxygen-containing gas. In another aspect, non-uniform metal oxides are first removed from the substrate in an anneal process and a thin uniform metal oxide is subsequently re-formed. An optimized substrate immersion method may also be used to further reduce void defects.