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Todd Bailey Phones & Addresses

  • Joliet, IL
  • Bourbonnais, IL
  • Litchfield, IL
  • Austin, TX
  • Kankakee, IL

Work

Company: Realty Austin Address: 1209 W. 5Th Street, #300, Austin, TX 78703 Phones: (512) 289-0653

Skills

Expert Negotiator • Listing Pro • Certified Buyer Professional

Awards

Austin Business Journal Top 50 • Platinum Top 50 Nominee

Images

Specialities

Buyer's Agent • Listing Agent

Professional Records

Medicine Doctors

Todd Bailey Photo 1

Todd D. Bailey

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Specialties:
Anesthesiology
Work:
Western Anesthesiology Associates
615 S New Ballas Rd, Saint Louis, MO 63141
(636) 386-9224 (phone), (636) 386-7679 (fax)
Education:
Medical School
Saint Louis University School of Medicine
Graduated: 1999
Languages:
English
Description:
Dr. Bailey graduated from the Saint Louis University School of Medicine in 1999. He works in Saint Louis, MO and specializes in Anesthesiology. Dr. Bailey is affiliated with Mercy Hospital St Louis.
Todd Bailey Photo 2

Todd David Bailey

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Specialties:
Anesthesiology
Pain Medicine
Pain Medicine
Education:
Saint Louis University (1999)

Lawyers & Attorneys

Todd Bailey Photo 3

Todd Bailey - Lawyer

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Office:
Bailey Law Office, PLLC
Specialties:
Probate
Maritime Law
Social Security Disability
Wills
Estate Planning
Personal Injury
Real Property
Business Law
Construction Law
Admiralty
Agriculture
Automobile
Elder Law
Advocacy
Guardianship
Conservatorship
Oil
Gas
Torts
Wrongful Death
Zoning
Planning
Land Use
Administrative/Regulatory Law
Admiralty & Maritime Law
Adoption
Arbitration & Mediation
Business Purchase & Sale
Contracts
Divorce
Elder Law & Advocacy
Family Law
Guardianship & Conservatorship
Immigration & Naturalization
Litigation
Medicaid & Medicare
Medical Malpractice
Negligence Law
Nonprofit & Tax-Exempt Org
Oil & Gas
Premises Liability
Probate & Estate
Social Security
Transportation
Wills & Trusts
Planning & Land Use
ISLN:
920869084
Admitted:
2005
University:
Bowling Green State University, B.A., 1992
Law School:
Wayne State University, J.D., 2004

Real Estate Brokers

Todd Bailey Photo 4

Todd Bailey, Austin TX Real Estate Specialist

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Specialties:
Buyer's Agent
Listing Agent
Work:
Realty Austin
1209 W. 5Th Street, #300, Austin, TX 78703
(512) 289-0653 (Office), (512) 289-0653 (Cell)
Links:
Site
Todd Bailey Photo 5

Todd Bailey, Austin TX Broker

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Specialties:
Residential sales
Luxury homes
Work:
Realty Austin
Austin, TX
(512) 289-0653 (Phone)
License #501464
Client type:
Home Buyers
Home Sellers
Property type:
Single Family Home
Condo/Townhome
Multi-family
Awards:
Austin Business Journal Top 50
Platinum Top 50 Nominee
Skills:
Expert Negotiator
Listing Pro
Certified Buyer Professional

Business Records

Name / Title
Company / Classification
Phones & Addresses
Mr. Todd Bailey
President
Bailey Siding & Remodeling Ltd
Siding Contractors. Doors - Installation. Windows - Installation & Service. Remodeling Services
Auburn, IL 62615
(217) 306-6874
Todd Bailey
Branch Sales Manager
Drake International
Employment Contractors - Temporary Help. Employment Agencies
1-201 Queens Ave., London, ON N6A 1J1
(519) 433-3151, (519) 673-3770
Todd Bailey
President
Bailey Siding & Remodeling Ltd
Siding Contractors · Doors - Installation · Windows - Installation & Service · Remodeling Services
Auburn, IL 62615
(217) 306-6874
Todd Bailey
Branch Sales Manager
Drake International
Employment Contractors - Temporary Help · Employment Agencies
(519) 433-3151, (519) 673-3770
Todd C. Bailey
NATIONAL DEALER ALLIANCE, LTD
Todd Bailey
MANAGER
303 SURF LLC
1209 W 5 St STE 300, Austin, TX 78703
Todd P. Bailey
Manager
BAILEY FISHERIES, LLC
Todd M Bailey
Manager
ABERRANT PROPERTY MANAGEMENT LLC
4111 Medical Pkwy STE 301, Austin, TX 78756
4711 Spicewood Spg #204, Austin, TX 78759

Publications

Us Patents

Template For Room Temperature, Low Pressure Micro-And Nano-Imprint Lithography

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US Patent:
6696220, Feb 24, 2004
Filed:
Oct 12, 2001
Appl. No.:
09/976681
Inventors:
Todd Bailey - Austin TX
Byung J. Choi - Round Rock TX
Matthew Colburn - Danburu CT
S. V. Sreenivasan - Austin TX
C. Grant Willson - Austin TX
John Ekerdt - Austin TX
Assignee:
Board of Regents, The University of Texas System - Austin TX
International Classification:
G03C 176
US Classification:
4302721, 4302751, 430302, 430320, 101473
Abstract:
Described are imprint lithography templates, methods of forming and using the templates, and a template holder device. An imprint lithography template may include a body with a plurality of recesses on a surface of the body. The body may be of a material that is substantially transparent to activating light. At least a portion of the plurality of recesses may define features having a feature size less than about 250 nm. A template may be formed by obtaining a material that is substantially transparent to activating light and forming a plurality or recesses on a surface of the template. In some embodiments, a template may further include at least one alignment mark. In some embodiments, a template may further include a gap sensing area. An imprint lithography template may be used to form an imprinted layer in a light curable liquid disposed on a substrate. During use, the template may be disposed within a template holder.

Imprint Lithography Template Comprising Alignment Marks

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US Patent:
6842229, Jan 11, 2005
Filed:
Dec 29, 2003
Appl. No.:
10/747795
Inventors:
Sidlgata V. Sreenivasan - Austin TX, US
Byung J. Choi - Round Rock TX, US
Matthew Colburn - Hopewell Junction NY, US
Todd Bailey - Fishkill NY, US
Assignee:
Board of Regents, The University of Texas System - Austin TX
International Classification:
G03B 2762
G03B 2758
US Classification:
355 75, 355 72
Abstract:
A system of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed.

Dual Wavelength Method Of Determining A Relative Position Of A Substrate And A Template

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US Patent:
6902853, Jun 7, 2005
Filed:
May 11, 2004
Appl. No.:
10/843195
Inventors:
Sidlgata V. Sreenivasan - Austin TX, US
Byung J. Choi - Round Rock TX, US
Matthew Colburn - Hopewell Junction NY, US
Todd Bailey - Fishkill NY, US
Assignee:
Board of Regents, The University of Texas System - Austin TX
International Classification:
G03F009/00
G03B027/42
US Classification:
430 22, 430 30, 356399, 356400, 356401
Abstract:
The present invention includes a method of determining a relative position of a substrate and a template spaced-apart therefrom, the substrate having substrate alignment marks disposed thereon and the template having template alignment marks disposed thereon, the method including, impinging first and second fluxes of light upon the substrate and template alignment marks, with the substrate and template alignment marks being responsive to the first flux of light defining a first response, and being responsive to the second flux of light defining a second response differing from the first response; and processing the first and second responses to form a focused image of the substrate and template alignment marks on a common plane, with the focused image indicating the relative position of the substrate and the template.

Method Of Varying Template Dimensions To Achieve Alignment During Imprint Lithography

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US Patent:
6916585, Jul 12, 2005
Filed:
May 27, 2003
Appl. No.:
10/446192
Inventors:
Sidlgata V. Sreenivasan - Austin TX, US
Byung J. Choi - Round Rock TX, US
Matthew Colburn - Austin TX, US
Todd Bailey - Austin TX, US
Assignee:
Board of Regents, The University of Texas Systems - Austin TX
International Classification:
G03F009/00
G03C005/00
US Classification:
430 22, 430 30, 430322
Abstract:
A method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed.

High Resolution Overlay Alignment Systems For Imprint Lithography

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US Patent:
6919152, Jul 19, 2005
Filed:
May 27, 2003
Appl. No.:
10/445863
Inventors:
S. V. Sreenivasan - Austin TX, US
Byung J. Choi - Round Rock TX, US
Matthew Colburn - Austin CT, US
Todd Bailey - Austin TX, US
Assignee:
Board of Regents, The University of Texas System - Austin TX
International Classification:
G03F009/00
G03B017/00
US Classification:
430 30, 430 22, 101130, 101131, 101DIG 36, 396428
Abstract:
A system of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed.

High-Resolution Overlay Alignment Methods For Imprint Lithography

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US Patent:
6921615, Jul 26, 2005
Filed:
Jul 16, 2001
Appl. No.:
09/907512
Inventors:
Sidlgata V. Sreenivasan - Austin TX, US
Byung J. Choi - Round Rock TX, US
Matthew Colburn - Danbury CT, US
Todd Bailey - Austin TX, US
Assignee:
Board of Regents, The University of Texas System - Austin TX
International Classification:
G03C005/00
G03F009/00
US Classification:
430 22, 430 30, 430322
Abstract:
A method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed.

Methods For High-Precision Gap And Orientation Sensing Between A Transparent Template And Substrate For Imprint Lithography

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US Patent:
6954275, Oct 11, 2005
Filed:
Aug 1, 2001
Appl. No.:
09/920341
Inventors:
Byung J. Choi - Round Rock TX, US
Matthew Colburn - Danbury CT, US
S. V. Sreenivasan - Austin TX, US
C. Grant Willson - Austin TX, US
Todd Bailey - Austin TX, US
John Ekerdt - Austin TX, US
Assignee:
Boards of Regents, The University of Texas System - Austin TX
International Classification:
G01B011/14
US Classification:
356614, 356625, 250548, 430 5
Abstract:
Described are high precision gap and orientation measurement methods between a template and a substrate used in imprint lithography processes. Gap and orientation measurement methods presented here include uses of broad-band light based measuring techniques.

Method Of Determining Alignment Of A Template And A Substrate Having A Liquid Disposed Therebetween

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US Patent:
7186483, Mar 6, 2007
Filed:
Mar 22, 2004
Appl. No.:
10/805916
Inventors:
Sidlgata V. Sreenivasan - Austin TX, US
Byung-Jin Choi - Round Rock TX, US
Matthew E. Colburn - Hopewell Junction NY, US
Todd C. Bailey - Fishkill NY, US
Assignee:
Board of Regents, The University of Texas System - Austin TX
International Classification:
G03C 5/00
G03F 9/00
US Classification:
430 22, 430 30, 430322
Abstract:
The present invention includes a method of aligning a substrate and a template spaced-apart from the substrate with an activating light curable liquid disposed therebetween, the substrate having substrate alignment marks and the template having template alignment marks, the method including, reducing a distance between the substrate and the template to cause a spreading of the activating light curable liquid; and varying an overlay placement of the template with respect to the substrate such that the template alignment marks are substantially aligned with the substrate alignment marks before the spreading causes the activating light curable liquid to cover an area between the substrate alignment marks and the template alignment marks.
Todd T Bailey from Joliet, ILDeceased Get Report