Inventors:
Mehdi Vaez-Iravani - Los Gatos CA, US
Stephen Biellak - Sunnyvale CA, US
Assignee:
KLA-Tencor Corporation - San Jose CA
International Classification:
G01N 21/88
Abstract:
Systems and methods for inspecting wafers are provided. One system includes a detection subsystem configured to separately and simultaneously detect light scattered from different portions of a single spot obliquely, or normally, illuminated on a wafer and to separately generate output responsive to the separately detected light that can be used to detect defects on the wafer. The system can, therefore, effectively perform a multi-spot type of inspection of the wafer using only a single obliquely or normally illuminated spot on the wafer.