Shuji Sue Ding

6346361, Feb 12, 2002

Oct 6, 1999

09/413181

Jianhui Shan - High Bridge NJ
Shuji Ding - Branchburg NJ
Eleazar B. Gonzalez - Bloomfield NJ
Dinesh N. Khanna - Flemington NJ

Clariant Finance (BVI) Limited

G03F 07021

430168, 430169, 430175, 430176, 430510, 430512, 525 52

A method of coupling a diazonium salt with an organic polymer comprising, on order, the steps of: providing a polymer in one liquid phase; providing an diazonium salt in a separate liquid phase; contacting the separate phases, and thereby reacting the polymer and the diazonium salt.

20020061473, May 23, 2002

Nov 9, 2001

10/008656

Jianhui Shan - High Bridge NJ, US
Shuji Ding - Branchburg NJ, US
Eleazar Gonzalez - Bloomfield NJ, US
Dinesh Khanna - Flemington NJ, US

G03F007/30
G03F007/004

430/326000, 430/270100, 430/512000, 430/330000

A method of coupling a diazonium salt with an organic polymer comprising, on order, the steps of: providing a polymer in one liquid phase; providing a diazonium salt in a separate liquid phase; contacting the separate phases, and thereby reacting the polymer and the diazonium salt.

57337144, Mar 31, 1998

Sep 30, 1996

8/724109

Iain McCulloch - Murray Hill NJ
Ralph R. Dammel - Flemington NJ
Anthony J. Corso - Flemington NJ
Shuji Ding - Somerville NJ
Dana L. Durham - Flemington NJ
Ping-Hung Lu - Bridgewater NJ
Ming Kang - Colonia NJ
Dinesh N. Khanna - Flemington NJ

Clariant Finance (BVI) Limited

G03C 500
C03F 830

430325

The present invention relates to a novel antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polymer and an organic solvent or a mixture of organic solvents, where the novel polymer comprises a unit containing a dye that absorbs from about 180 nm to about 450 nm and a unit containing a crosslinking group.

61875066, Feb 13, 2001

Aug 5, 1999

9/368740

Shuji Ding - Branchburg NJ
Dinesh N. Khanna - Flemington NJ
Mark A. Spak - Edison NJ
Dana L. Durham - Flemington NJ
Jianhui Shan - High Bridge NJ
Eleazer Gonzalez - Bloomfield NJ

Clariant Finance (BVI) Limited

G03C 500
C03F 830

4302711

The present invention relates to a novel antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polymer and an organic solvent or mixture of solvents, where the novel polymer comprises a unit containing a dye that absorbs from about 180 nm to about 450 nm and does not contain a crosslinking group.

59811455, Nov 9, 1999

Apr 30, 1997

8/846986

Shuji Ding - Branchburg NJ
Dinesh N. Khanna - Flemington NJ
Ping-Hung Lu - Bridgewater NJ
Jianhui Shan - High Bridge NJ
Ralph R. Dammel - Flemington NJ
Dana L. Durham - Flemington NJ
M. Dalil Rahman - Flemington NJ
Iain McCulloch - Basking Ridge NJ

Clariant Finance (BVI) Limited

C08F 830
G08F 711
G08F 709

4302711

The present invention relates to a novel polymer suitable for use as an antireflective coating or as an additive in photoresist for absorption of reflected light. The novel polymer comprises at least one unit containing a dye that absorbs from about 180 nm to about 450 nm and at least one unit that contains no aromatic funtionality. The polymer is soluble in organic solvents, preferrably solvents of low toxicity, or it may be soluble in water, which may additionally contain other water miscible organic solvents.

59944307, Nov 30, 1999

Apr 30, 1997

8/841750

Shuji Ding - Branchburg NJ
Ping-Hung Lu - Bridgewater NJ
Dinesh N. Khanna - Flemington NJ
Jianhui Shan - High Bridge NJ
Dana L. Durham - Flemington NJ
Ralph R. Dammel - Flemington NJ
M. Dalil Rahman - Flemington NJ

Clariant Finance BVI) Limited

C08K 500

524 80

The present invention relates to an antireflective coating composition comprising a novel polymer in a solvent composition. The invention further comprises processes for using the antireflective coating composition in photolithography. The antireflective coating composition comprises a novel polymer and a solvent composition, where the novel polymer of the antireflective coating comprises at least one unit containing a dye that absorbs from about 180 nm to about 450 nm and at least one unit that contains no aromatic funtionality. The solvent may be organic, preferrably, a solvent of low toxicity, or it may be water, which may additionally contain other water miscible organic solvents.

57631352, Jun 9, 1998

Sep 30, 1996

8/722711

Shuji Ding - Somerville NJ
Ping-Hung Lu - Bridgewater NJ
Dinesh N. Khanna - Flemington NJ
Anthony J. Corso - Flemington NJ

Clariant Finance (BVI) Limited

G03F 7023
G03F 732

430191

A light-sensitive positive photoresist composition containing a film forming resin, a photoactive compound, a solvent, and an arylhydrazo dye. The dyed photoresist reduces the linewidth variation of the resist pattern on a reflective substrate while giving good lithographic performance.

56522975, Jul 29, 1997

Aug 16, 1996

8/699001

Iain McCulloch - Murray Hill NJ
Ralph R. Dammel - Flemington NJ
Dana L. Durham - Flemington NJ
Ping-Hung Lu - Bridgewater NJ
Ming Kang - Colonia NJ
Dinesh N. Khanna - Flemington NJ
Shuji Ding - Branchburg NJ

Hoechst Celanese Corporation - Somerville NJ

C08F 830
C08F22600
G03G 1306

524555

The present invention relates to a novel aqueous antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polymer and water, where the novel polymer of the antireflective coating comprises at least one unit containing a dye that absorbs from about 180 nm to about 450 nm, at least one unit containing a crosslinking group and at least one unit derived from a hydrophilic vinyl monomer or a vinyl monomer capable of becoming hydrophilic.