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Pongsthorn Uralwong Phones & Addresses

  • 1675 Ebbetts Dr, Campbell, CA 95008
  • San Jose, CA
  • Santa Clara, CA
  • Van Nuys, CA

Work

Position: Professional/Technical

Publications

Us Patents

Etching Of Solar Cell Materials

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US Patent:
7455787, Nov 25, 2008
Filed:
Aug 1, 2003
Appl. No.:
10/632747
Inventors:
Douglas H. Rose - Austin TX, US
Pongsthorn Uralwong - Campbell CA, US
David D. Smith - San Jose CA, US
Assignee:
Sunpower Corporation - San Jose CA
International Classification:
C23F 1/00
US Classification:
216 24, 216 41, 216 83, 216 95, 216100, 136256
Abstract:
A solar cell is fabricated by etching one or more of its layers without substantially etching another layer of the solar cell. In one embodiment, a copper layer in the solar cell is etched without substantially etching a topmost metallic layer comprising tin. For example, an etchant comprising sulfuric acid and hydrogen peroxide may be employed to etch the copper layer selective to the tin layer. A particular example of the aforementioned etchant is a Co-Bra Etcho etchant modified to comprise about 1% by volume of sulfuric acid, about 4% by volume of phosphoric acid, and about 2% by volume of stabilized hydrogen peroxide. In one embodiment, an aluminum layer in the solar cell is etched without substantially etching the tin layer. For example, an etchant comprising potassium hydroxide may be employed to etch the aluminum layer without substantially etching the tin layer.

Etching Of Solar Cell Materials

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US Patent:
8029683, Oct 4, 2011
Filed:
Oct 14, 2008
Appl. No.:
12/251296
Inventors:
Douglas H. Rose - Mountain View CA, US
Pongsthorn Uralwong - Campbell CA, US
David D. Smith - San Jose CA, US
Assignee:
SunPower Corporation - San Jose CA
International Classification:
B29D 11/00
B44C 1/22
US Classification:
216 24, 216 41, 216 83, 252 791, 252 795, 136256
Abstract:
A solar cell is fabricated by etching one or more of its layers without substantially etching another layer of the solar cell. In one embodiment, a copper layer in the solar cell is etched without substantially etching a topmost metallic layer comprising tin. For example, an etchant comprising sulfuric acid and hydrogen peroxide may be employed to etch the copper layer selective to the tin layer. A particular example of the aforementioned etchant is a Co-Bra Etch etchant modified to comprise about 1% by volume of sulfuric acid, about 4% by volume of phosphoric acid, and about 2% by volume of stabilized hydrogen peroxide. In one embodiment, an aluminum layer in the solar cell is etched without substantially etching the tin layer. For example, an etchant comprising potassium hydroxide may be employed to etch the aluminum layer without substantially etching the tin layer.

Substrate Carrier For Electroplating Solar Cells

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US Patent:
20050061665, Mar 24, 2005
Filed:
Aug 4, 2004
Appl. No.:
10/912348
Inventors:
Luca Pavani - Fermo, IT
Neil Kaminar - Boulder Creek CA, US
Pongsthorn Uralwong - Campbell CA, US
Thomas Phu - Alameda CA, US
Douglas Rose - Austin TX, US
Thomas Pass - San Jose CA, US
Assignee:
SunPower Corporation - Sunnyvale CA
International Classification:
C25D017/06
US Classification:
204297060
Abstract:
A carrier for use in processing of a plurality of wafers or other substrates includes a support frame on which the wafers are mounted and in one embodiment at least one auxiliary frame for holding the substrates on the support frame. A plurality of clips extend from the auxiliary frame and engage the substrates in pressure engagement, and fasteners retain the auxiliary frame in position with respect to the support frame. In one embodiment two auxiliary frames can be employed for holding wafers on opposing surfaces of the support frame. The support frame has electrically non-conducting surfaces whereby the processing does not affect the support frame, and the auxiliary frame is made of electrically non- conductive material. The clips are electrically conductive and bridge current from the support frame to the wafers during plating operations. In another embodiment, auxiliary frame are not used and the wafer retention clips are mounted on the support frame. In use, the carrier can support a high number of units for processing with no significant mechanical stress being transferred to the wafers during loading and unloading from the carrier. The carriers and wafers can be transferred easily for different chemical baths and can be handled safely during rinsing and drying steps.

Etching Of Solar Cell Materials

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US Patent:
20090039312, Feb 12, 2009
Filed:
Oct 14, 2008
Appl. No.:
12/251285
Inventors:
Douglas H. ROSE - Mountain View CA, US
Pongsthorn URALWONG - Campbell CA, US
David D. SMITH - San Jose CA, US
International Classification:
C09K 13/04
C01B 13/00
C09K 13/02
US Classification:
252 792, 423641, 252 795
Abstract:
A solar cell is fabricated by etching one or more of its layers without substantially etching another layer of the solar cell. In one embodiment, a copper layer in the solar cell is etched without substantially etching a topmost metallic layer comprising tin. For example, an etchant comprising sulfuric acid and hydrogen peroxide may be employed to etch the copper layer selective to the tin layer. A particular example of the aforementioned etchant is a Co-Bra Etch etchant modified to comprise about 1% by volume of sulfuric acid, about 4% by volume of phosphoric acid, and about 2% by volume of stabilized hydrogen peroxide. In one embodiment, an aluminum layer in the solar cell is etched without substantially etching the tin layer. For example, an etchant comprising potassium hydroxide may be employed to etch the aluminum layer without substantially etching the tin layer.

Etching Of Solar Cell Materials

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US Patent:
20110312119, Dec 22, 2011
Filed:
Aug 30, 2011
Appl. No.:
13/220974
Inventors:
Douglas H. ROSE - San Jose CA, US
Pongsthorn URALWONG - Campbell CA, US
David D. SMITH - Campbell CA, US
International Classification:
H01L 31/02
US Classification:
438 57, 257E3111
Abstract:
A solar cell is fabricated by etching one or more of its layers without substantially etching another layer of the solar cell. In one embodiment, a copper layer in the solar cell is etched without substantially etching a topmost metallic layer comprising tin. For example, an etchant comprising sulfuric acid and hydrogen peroxide may be employed to etch the copper layer selective to the tin layer. A particular example of the aforementioned etchant is a Co-Bra Etch etchant modified to comprise about 1% by volume of sulfuric acid, about 4% by volume of phosphoric acid, and about 2% by volume of stabilized hydrogen peroxide. In one embodiment, an aluminum layer in the solar cell is etched without substantially etching the tin layer. For example, an etchant comprising potassium hydroxide may be employed to etch the aluminum layer without substantially etching the tin layer.

Etching Of Solar Cell Materials

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US Patent:
20190044006, Feb 7, 2019
Filed:
Oct 8, 2018
Appl. No.:
16/154416
Inventors:
- San Jose CA, US
Pongsthorn URALWONG - Campbell CA, US
David D. SMITH - Campbell CA, US
Assignee:
SunPower Corporation - San Jose CA
International Classification:
H01L 31/0224
H01L 31/02
H01L 31/18
Abstract:
A solar cell is fabricated by etching one or more of its layers without substantially etching another layer of the solar cell. In one embodiment, a copper layer in the solar cell is etched without substantially etching a topmost metallic layer comprising tin. For example, an etchant comprising sulfuric acid and hydrogen peroxide may be employed to etch the copper layer selective to the tin layer. A particular example of the aforementioned etchant is a Co-Bra Etch etchant modified to comprise about 1% by volume of sulfuric acid, about 4% by volume of phosphoric acid, and about 2% by volume of stabilized hydrogen peroxide. In one embodiment, an aluminum layer in the solar cell is etched without substantially etching the tin layer. For example, an etchant comprising potassium hydroxide may be employed to etch the aluminum layer without substantially etching the tin layer.

Etching Of Solar Cell Materials

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US Patent:
20170162728, Jun 8, 2017
Filed:
Dec 12, 2016
Appl. No.:
15/376192
Inventors:
- San Jose CA, US
Pongsthorn URALWONG - Campbell CA, US
David D. SMITH - Campbell CA, US
Assignee:
SunPower Corporation - San Jose CA
International Classification:
H01L 31/0224
H01L 31/02
Abstract:
A solar cell is fabricated by etching one or more of its layers without substantially etching another layer of the solar cell. In one embodiment, a copper layer in the solar cell is etched without substantially etching a topmost metallic layer comprising tin. For example, an etchant comprising sulfuric acid and hydrogen peroxide may be employed to etch the copper layer selective to the tin layer. A particular example of the aforementioned etchant is a Co-Bra Etch etchant modified to comprise about 1% by volume of sulfuric acid, about 4% by volume of phosphoric acid, and about 2% by volume of stabilized hydrogen peroxide. In one embodiment, an aluminum layer in the solar cell is etched without substantially etching the tin layer. For example, an etchant comprising potassium hydroxide may be employed to etch the aluminum layer without substantially etching the tin layer.
Pongsthorn Uralwong from Campbell, CA, age ~63 Get Report