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Peter A Knoot

from Marana, AZ
Age ~71
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Also known as:
Peter Anton Knoot, Peter A Schlueter
Related to:
Karen L Blankenship, 67Tyler Knoot, 40Allan M Lees, 65Hannah KnootBenjamin J Knoot, 28Matt Schlueter, 38Julia C Schlueter, 63Laurie L Knoot, 67Martin C Nicholson, 62Matthew I Knoot, 38
Connected to:
Melissa M Knoot, 47Patricia E Knoot, 76Andrea V Knop, 54Brian Knop, 47Charles M Knop, 93Christine M Knop, 44Kevin M Knop, 34Philip H Knop, 60Ruth D Knop, 63Thomas A Knop, 53

Peter Knoot Phones & Addresses

  • Marana, AZ
  • Santa Clara, CA
  • 158 Northam Ave, San Carlos, CA 94070
  • 1781 Terrace Dr, Belmont, CA 94002
  • 1914 Bishop Rd, Belmont, CA 94002

Work

Company: Synquanon Jan 2019 Position: Owner and chief designer

Education

Degree: Doctorates, Doctor of Philosophy School / High School: Rensselaer Polytechnic Institute Specialities: Chemistry

Skills

Program Management • Cross Functional Team Leadership • Start Ups • Project Management • Product Management • Product Development • Strategy • Management • Six Sigma • Business Process Improvement • Business Strategy • Manufacturing • Energy • Semiconductors • Energy Efficiency • Renewable Energy • Cleantech • Change Management • Leadership • Business Planning • Analysis • Process Improvement • Engineering • Project Planning • Energy Management • Strategic Planning • Lean Manufacturing • Ms Project • Driver Training • Design of Experiments • Product Life Cycle Management • Technology Development • Digital Photography • Electronics • Customer Satisfaction • Semiconductor Fabrication • Photoshop • Lightroom • Atmospheric Chemistry • Product Lifecycle Management • Qa Engineering • Qc Tools • Cost Reduction • Strategy Development • Compound Semiconductors • Music Production • Guitarist • Solid State Lighting • Microcontrollers • Physical Chemistry

Languages

Dutch • Spanish

Awards

Richard a. clarke annual environmental l... • Star of quality - Litton industries

Ranks

Certificate: Pragmatic Marketing Product Management

Interests

Science and Technology • Environment • Arts and Culture

Industries

Utilities

Public records

Vehicle Records

Peter Knoot

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Address:
158 Northam Ave, San Carlos, CA 94070
Phone:
(415) 973-3701
VIN:
WMWMF73597TL87654
Make:
MINI
Model:
COOPER
Year:
2007

Resumes

Resumes

Peter Knoot Photo 1

Owner And Chief Designer

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Location:
14197 north Hidden Arroyo Pass, Marana, AZ
Industry:
Utilities
Work:
Synquanon
Owner and Chief Designer
Pacific Gas and Electric Company Mar 2007 - Jan 2018
Principal
Peter Knoot Custom Guitars Mar 2007 - Jan 2018
Owner and Luthier
Partners For Success Mar 2007 - Jan 2018
Founder and Chief Executive Officer
Speedring Indoor Kart Racing Aug 2000 - Feb 2005
Chief Executive Officer and President
Education:
Rensselaer Polytechnic Institute
Doctorates, Doctor of Philosophy, Chemistry University of Southern California
Skills:
Program Management
Cross Functional Team Leadership
Start Ups
Project Management
Product Management
Product Development
Strategy
Management
Six Sigma
Business Process Improvement
Business Strategy
Manufacturing
Energy
Semiconductors
Energy Efficiency
Renewable Energy
Cleantech
Change Management
Leadership
Business Planning
Analysis
Process Improvement
Engineering
Project Planning
Energy Management
Strategic Planning
Lean Manufacturing
Ms Project
Driver Training
Design of Experiments
Product Life Cycle Management
Technology Development
Digital Photography
Electronics
Customer Satisfaction
Semiconductor Fabrication
Photoshop
Lightroom
Atmospheric Chemistry
Product Lifecycle Management
Qa Engineering
Qc Tools
Cost Reduction
Strategy Development
Compound Semiconductors
Music Production
Guitarist
Solid State Lighting
Microcontrollers
Physical Chemistry
Interests:
Science and Technology
Environment
Arts and Culture
Languages:
Dutch
Spanish
Awards:
Richard A. Clarke Annual Environmental Leadership Award
Pacific Gas and Electric Company
The annual Richard A. Clarke Environmental Leadership Awards honor an individual and a team whose efforts best demonstrate “Environmental Leadership, a two-prong concept: Environmental refers to substantive areas such as water quality, air quality, energy and water conservation and efficiency, environmental justice, pollution prevention, and natural resources stewardship. Leadership means attributes such as creating demonstrated management commitment, sharing of best management practices, forming beneficial partnerships with environmental groups and environmental regulatory agencies, finding innovative solutions, and developing programs that earn the company positive recognition from outside parties.
Star of Quality
Litton Industries
Earned for instituting statistical process control methods in manufacturing.
Certifications:
Pragmatic Marketing Product Management
Lean Six Sigma Master Black Belt
Project Management Professional (Pmp)
Pragmatic Marketing

Business Records

Name / Title
Company / Classification
Phones & Addresses
Peter Knoot
President
SPEEDRING INDOOR KART RACING, INC
2900 Mead Ave, Santa Clara, CA 95051

Publications

Us Patents

Gas Manifold For Uniform Gas Distribution And Photochemistry

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US Patent:
6395643, May 28, 2002
Filed:
Nov 13, 2000
Appl. No.:
09/712312
Inventors:
Peter A. Knoot - San Carlos CA
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
H01L 21302
US Classification:
438730, 438695, 438771
Abstract:
The invention provides a system for providing a flow of a short-lived, reactive process gas species into an RTP chamber without creating ionic species. An RTP chamber includes a transparent quartz window assembly. The window assembly has a first pane facing a wafer inside the RTP chamber. A second pane is positioned adjacent a heat lamp array on the outside of the RTP chamber. A window side wall joins the first and second panes at their peripheral edges to provide an internal chamber therebetween. A plurality of channels extend through the first pane from the internal chamber to the inside of the RTP chamber. A port communicates between the internal chamber and a process gas source. The window assembly also includes a reflective surface facing the internal chamber. An ultraviolet light source is positioned to illuminate process gas flowing through the window assembly with ultraviolet light such that the ultraviolet light alters the chemistry of the process gas. A process using the reactive gas species can be turned on and off quickly by turning on and off the ultraviolet light.

Method And Apparatus For Insitu Vapor Generation

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US Patent:
6410456, Jun 25, 2002
Filed:
Nov 21, 2000
Appl. No.:
09/718443
Inventors:
Christian M. Gronet - Portola Valley CA
Peter A. Knoot - San Carlos CA
Gary E. Miner - Newark CA
Guangcai Xing - Fremont CA
David R. Lopes - Sunnyvale CA
Satheesh Kuppurao - Santa Clara. CA
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
C23C 16455
US Classification:
438769, 438770, 438773, 438787, 4272554, 42725537
Abstract:
A method of forming an oxide on a substrate. According to the method of the present invention a substrate is placed in a chamber. An oxygen containing gas and a hydrogen containing gas are then fed into the chamber. The oxygen containing gas and the hydrogen containing gas are then caused to react with one another to form water vapor in the chamber. The water vapor then oxidizes the substrate.

Method And Apparatus For Insitu Vapor Generation

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US Patent:
20020136831, Sep 26, 2002
Filed:
May 7, 2002
Appl. No.:
10/140678
Inventors:
Christian Gronet - Portola Valley CA, US
Peter Knoot - San Carlos CA, US
Gary Miner - Newark CA, US
Guangcai Xing - Fremont CA, US
David Lopes - Sunnyvale CA, US
Satheesh Kuppurao - Santa Clara CA, US
International Classification:
C23C016/00
B05D003/02
US Classification:
427/255280, 427/314000
Abstract:
A method of forming an oxide on a substrate. According to the method of the present invention a substrate is placed in a chamber. An oxygen containing gas and a hydrogen containing gas are then fed into the chamber. The oxygen containing gas and the hydrogen containing gas are then caused to react with one another to form water vapor in the chamber. The water vapor then oxidizes the substrate.

Lamphead For A Rapid Thermal Processing Chamber

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US Patent:
20030029859, Feb 13, 2003
Filed:
Aug 8, 2001
Appl. No.:
09/925208
Inventors:
Peter Knoot - San Carlos CA, US
Paul Steffas - Santa Clara CA, US
Assignee:
Applied Materials, Inc.
International Classification:
H05B001/02
F27D011/00
US Classification:
219/483000, 219/486000, 219/501000, 118/725000, 219/390000
Abstract:
A semiconductor processing system and method. The system includes an assembly of radiant energy sources and a programmable switch array configured to selectively deliver power to each radiant energy source based on a plurality of control signals. The method includes measuring the temperature at a plurality of regions on a substrate and controlling a plurality of radiant energy sources to correct any non-radial temperature discontinuities.

Method For Insitu Vapor Generation For Forming An Oxide On A Substrate

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US Patent:
61598666, Dec 12, 2000
Filed:
Feb 22, 2000
Appl. No.:
9/507946
Inventors:
Christian M. Gronet - Portola Valley CA
Peter A. Knoot - San Carlos CA
Gary E. Miner - Newark CA
Guangcai Xing - Fremont CA
David R. Lopes - Sunnyvale CA
Satheesh Kuppurao - Santa Clara CA
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
H01L 2131
US Classification:
438769
Abstract:
A method of forming an oxide on a substrate. According to the method of the present invention a substrate is placed in a chamber. An oxygen containing gas and a hydrogen containing gas are then fed into the chamber. The oxygen containing gas and the hydrogen containing gas are then caused to react with one another to form water vapor in the chamber. The water vapor then oxidizes the substrate.

Low Temperature Control Of Rapid Thermal Processes

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US Patent:
61304158, Oct 10, 2000
Filed:
Apr 22, 1999
Appl. No.:
9/296223
Inventors:
Peter A. Knoot - San Carlos CA
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
H05B 102
A21B 200
G01J 500
US Classification:
219502
Abstract:
An apparatus for processing a semiconductor substrate mounted in a thermal processing chamber includes a heating system for heating the substrate, which includes lamps facing a front side of the substrate and a power supply system providing power to at least one of the lamps with a DC power component and an AC power component at a selected frequency. The AC power component is a selected fraction of the DC power component. The apparatus also has a sensor facing a back side of the substrate for providing a detected signal indicative of measured radiation from the back side of the substrate. A lock-in system provides a lock-in signal indicative of a magnitude of an AC component of the detected signal at the selected frequency in response to the detected signal and a reference signal at the selected frequency. A processing system is adapted to determine a transmitted portion of the measured radiation that is transmitted through the substrate based upon the lock-in signal, the detected signal and the selected fraction.

Tuning A Substrate Temperature Measurement System

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US Patent:
61648167, Dec 26, 2000
Filed:
Aug 14, 1998
Appl. No.:
9/133993
Inventors:
Wolfgang Aderhold - Cupertino CA
Abhilash J. Mayur - Salinas CA
Peter A. Knoot - San Carlos CA
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
G01K 1500
US Classification:
374 1
Abstract:
A technique and system for tuning temperature sensor readings in a thermal processing chamber includes determining an actual temperature profile for a substrate based on measurements of the substrate. A simulated temperature profile for the substrate is calculated using a respective interim temperature correction value for one or more temperature sensors associated with the chamber. A Gaussian-like distribution for thermal contributions from multiple radiation sources in the chamber can be used to simulate the temperature profile. The simulated temperature profile and the actual temperature profile are combined to form an estimated temperature profile. A final value for each respective temperature correction value is determined using an optimization algorithm which results in the estimated temperature profile being substantially uniform across the surface of the substrate. Each final temperature correction value is used as an offset to temperature measurements obtained from the corresponding temperature sensors.

Method And Apparatus For Measuring Substrate Temperatures

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US Patent:
6179466, Jan 30, 2001
Filed:
Mar 18, 1998
Appl. No.:
9/044217
Inventors:
Bruce W. Peuse - San Carlos CA
Gary E. Miner - Fremont CA
Mark Yam - San Jose CA
Aaron Hunter - Santa Cruz CA
Peter Knoot - San Carlos CA
Jason Mershon - Santa Clara CA
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
G01J 500
G01K 1500
US Classification:
374128
Abstract:
A method of correcting a temperature probe reading in a thermal processing chamber for heating a substrate, including the steps of heating the substrate to a process temperature and using a first, a second and a third probe to measure the temperature of the substrate. The first probe has a first effective reflectivity and the second probe has a second effective reflectivity. The first probe produces a first temperature indication, the second probe produces a second temperature indication and the third probe produces a third temperature indication. The first and second effective reflectivities may be different. From the first and second temperature indications, a corrected temperature reading for the first probe may be derived, wherein the corrected temperature reading is a more accurate indicator of an actual temperature of the substrate than an uncorrected readings produced by both the first and second probes. A corrected temperature reading for the third probe may be derived by adjusting the temperature correction calculated for the first probe according to the measured emissivity sensitivity associated with the environment of the third probe to provide a corrected temperature reading that is a more accurate indicator of an actual temperature of the substrate in the environment of the third probe. An apparatus for carrying out the method is also disclosed.
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Peter A Knoot from Marana, AZ, age ~71 Get Report