US Patent:
20020117637, Aug 29, 2002
Inventors:
Gary Donaldson - Hinesburg VT, US
Donald Rakowski - Milton VT, US
Nick Selva - Essex Junction VT, US
Assignee:
International Business machines Corporation - Armonk NY
International Classification:
G21K005/10
H01J037/08
Abstract:
An ion generator chamber, for an implantation apparatus, having its interior walls surfaces knurled or roughened so that any of the materials used in the chamber cannot deposit onto the interior wall surfaces in a size sufficiently large enough to adversely affect the operation of the chamber, if the deposits peel off the interior walls of the chamber. By limiting the size of any deposits on interior chamber walls, the invention extends the average life of the filaments used in the chamber as well as extending the average time between any necessary cleaning of the inner chamber walls thereby extending the operating life of the chamber.