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Minoru Tomozawa Phones & Addresses

  • 3 Riding Club Rd, Troy, NY 12180 (518) 272-1252
  • Plantation, FL
  • Davie, FL

Work

Position: Retired

Education

Degree: Associate degree or higher

Public records

Vehicle Records

Minoru Tomozawa

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Address:
3 Riding Clb Rd, Troy, NY 12180
Phone:
(518) 272-1252
VIN:
JTNBK3EK1A3048987
Make:
TOYOTA
Model:
CAMRY
Year:
2010

Publications

Us Patents

Process For Making Rare Earth Containing Glass

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US Patent:
8304081, Nov 6, 2012
Filed:
Oct 16, 2007
Appl. No.:
12/446132
Inventors:
Minoru Tomozawa - Troy NY, US
Bungo Hatta - Shigaken, JP
Assignee:
Rensselaer Polytechnic Institute - Troy NY
Sekisui Chemical Co., Ltd. - Shiga
International Classification:
B32B 17/00
C03B 25/00
C03B 27/012
US Classification:
428426, 428697, 428702, 65116, 65117, 65434
Abstract:
The invention relates to a process for making a SiO—REO—AlOglass comprising preparing a glass according to a conventional process wherein the conventional process comprises a step of heat treating a mixture of SiO, REO, and AlOat a temperature greater than the spinodal temperature for 0. 1 to 10 hours wherein REOis a rare earth oxide and RE is a rare earth element chosen from Sc, Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, and combinations thereof. The invention also relates to glasses prepared by the process and glass lasers, optical amplifiers and laminated glass that comprise the glass prepared by the process.

Preparation Of High Purity, Low Water Content Fused Silica Glass

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US Patent:
20040089024, May 13, 2004
Filed:
Nov 8, 2002
Appl. No.:
10/290999
Inventors:
Minoru Tomozawa - Troy NY, US
Victor Lou - Schenectady NY, US
Assignee:
Rensselaer Polytechnic Institute - Troy NY
International Classification:
C03B032/00
C03B032/02
US Classification:
065/033100
Abstract:
A process for the preparation of crystalline silica powder from amorphous silica powder is disclosed. The water and hydroxyl content in the crystalline powder is much lower than that in the amorphous silica powder. The process involves heating the amorphous silica powder in the presence of a noble metal without the need for adding an impurity, such as an alkali crystallization promoter. Preferably, the amorphous silica powder is sol-gel derived, and a high purity silica glass product can therefore be made having a water content of less than 0.1 ppm.

Radiation Coloration Resistant Glass

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US Patent:
46208631, Nov 4, 1986
Filed:
Oct 14, 1983
Appl. No.:
6/542219
Inventors:
Minoru Tomozawa - Troy NY
E. Bruce Watson - Troy NY
John Acocella - Troy NY
Assignee:
Rensselaer Polytechnic Institute - Troy NY
International Classification:
C03C 2300
US Classification:
65 3012
Abstract:
A radiation coloration resistant glass is disclosed which is used in a radiation environment sufficient to cause coloration in most forms of glass. The coloration resistant glass includes higher proportions by weight of water and has been found to be extremely resistant to color change when exposed to such radiation levels. The coloration resistant glass is free of cerium oxide and has more than about 0. 5% by weight water content. Even when exposed to gamma radiation of more than 10. sup. 7 rad, the coloration resistant glass does not lose transparency.

Isbn (Books And Publications)

Treatise on Materials Science and Technology: Glass IV

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Author

Minoru Tomozawa

ISBN #

0123418267

Minoru K Tomozawa from Troy, NY, age ~86 Get Report