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Michael C Sarin

from Oceanside, CA
Age ~71
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Also known as:
Michael Christopher Sarin, Michael Christophe Sarin, Michael E Sarin, Michael O Sarin, Mike C Sarin, Michael Null
Related to:
Charlene D Walkenhorst, 69Mathew SarinRae Sarin, 94Krista A Sarin, 38Craig Fisher, 73
Connected to:
Akshay Sarin, 43Anil Sarin, 66Anshul Sarin, 49Ashima Sarin, 47Bhart A Sarin, 43Chanthaburi Sarin, 43Margaret Sarin, 75Rahul Sarin, 35Salaish K Sarin, 54Sheryl J Sarin, 64

Michael Sarin Phones & Addresses

  • Oceanside, CA
  • Mesa, AZ
  • 9443 33Rd St, Phoenix, AZ 85028 (602) 996-6665 (602) 996-6881
  • Show Low, AZ

Professional Records

License Records

Michael Sarin

Address:
9443 N 33 Way, Phoenix, AZ
License #:
30040 - Active
Category:
Professional
Issued Date:
Feb 6, 1996
Expiration Date:
Mar 31, 2020

Business Records

Name / Title
Company / Classification
Phones & Addresses
Michael C Sarin
Manager
MJM UNLIMITED, LLC
9443 N 33 Way, Phoenix, AZ 85028
Michael Sarin
Manager
PERSONELL STRATEGIES LLC
Employment Agency
9443 N 33 Way, Phoenix, AZ 85028
Michael Sarin
President/ceo, Owner, President
EMPOWERTECH, INC
Engineering Services
9443 N 33 Way, Phoenix, AZ 85028
(602) 953-7444

Publications

Us Patents

Systems And Methods For Mass Flow Controller Verification

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US Patent:
20140060147, Mar 6, 2014
Filed:
Aug 28, 2012
Appl. No.:
13/597043
Inventors:
Michael Christopher Sarin - Phoenix AZ, US
Rafael Mendez - Phoenix AZ, US
Gregory Bartlett - Phoenix AZ, US
Eric Hill - Phoenix AZ, US
Keith R. Lawson - Phoenix AZ, US
Andy Rosser - Bristol, GB
Assignee:
ASM IP Holding B.V. - Almere
International Classification:
G01F 25/00
F17D 1/00
US Classification:
73 116, 137 2, 137455
Abstract:
A method and system are disclosed for verifying the flow rate of gas through a mass flow controller, such as a mass flow controller used with a tool for semiconductor or solar cell fabrication. To verify the mass flow rate measured by the mass flow controller, gas passing through the mass flow controller is also passed through a mass flow meter. The measured flow rate through the mass flow controller is compared to the measured flow rate through the mass flow meter and any difference between the two measured flow rates is determined. Depending upon the magnitude of any difference, the flow of gas to the mass flow controller may be altered.

Closed Loop Method And Apparatus For Preventing Exhausted Reactant Gas From Mixing With Ambient Air And Enhancing Repeatability Of Reaction Gas Results On Wafers

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US Patent:
51182866, Jun 2, 1992
Filed:
Jan 17, 1991
Appl. No.:
7/642536
Inventors:
Michael C. Sarin - Phoenix AZ
Assignee:
Amtech Systems - Tempe AZ
International Classification:
F27D 1900
US Classification:
432 2
Abstract:
Mixing of spent reactant gases with ambient air inside a semiconductor wafer fabrication facility is avoided and consequently corrosion of a scavenger box in a wafer fabrication facility is avoided. Repeatability of reaction gas results on wafers in a process tube is improved by maintaining precisely constant pressure in the wafer processing tube, which is operated close to ambient atmospheric pressure. This is accomplished by positioning an exhaust tube downstream from the wafers in the processing tube at a location that results in a uniform, repeatable reaction gas flow pattern between the wafers. Pressures at or near that point are measured by a differential manometer referenced to ambient atmospheric pressure to produce a pressure-indicating signal. The pressure indicating signal is electronically compared with a preset constant signal representative of the desired constant pressure at the pressure measurement point to produce an error signal. The error signal is used to continuously vary the position of an exhaust valve in the exhaust tube and thereby maintain the measured pressure constant despite variations in ambient atmospheric pressure and variations in an exhaust gas scrubber system coupled to the exhaust tube.

Method And An Article Of Manufacture For Determining Optimum Operating Points For Power/Cost And Helium-Air Ratios In A Tubular Transportation System

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US Patent:
20200001897, Jan 2, 2020
Filed:
May 13, 2019
Appl. No.:
16/411065
Inventors:
- CULVER CITY CA, US
MICHAEL SARIN - PHOENIX AZ, US
ALEXANDRE ZISA - COLOMIERS, FR
SPENCER JOHN BALDWIN - OLYMPIA WA, US
International Classification:
B61C 15/04
B65G 51/04
B61B 13/10
Abstract:
A tubular transportation system is disclosed for transporting one or more passengers or one or more cargos via a capsule along a predetermined route. A method and an algorithm are described for determining optimum operating points for power/cost and helium-air ratios in a plurality of substantially evacuated tubes in a tubular transportation system for transporting one or more passengers or one or more cargos via a capsule along a predetermined route.

Method Of Using Air And Helium In Low-Pressure Tube Transportation Systems

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US Patent:
20200001898, Jan 2, 2020
Filed:
May 13, 2019
Appl. No.:
16/411086
Inventors:
- Culver City CA, US
MICHAEL SARIN - PHOENIX AZ, US
ALEXANDRE ZISA - COLOMIERS, FR
SPENCER JOHN BALDWIN - OLYMPIA WA, US
International Classification:
B61C 15/04
B65G 51/04
B61B 13/10
Abstract:
Implementations are described for maintaining helium/air mixture within a tube in an evacuated tube transportation system. A first implementation includes a set of helium tanks uniformly fitted along the tube length, where helium is injected with controlled valves that open or close to maintain the desired level of helium. An operations control center (OCC) receives helium concentration levels in the tube and instructs a controller in the tube to release helium into the tube when detected levels of helium is lower than the desired level of helium. Another implementation is described where a capsule traversing the tube may have a source of helium gas that can be released into the tube. A hybrid approach is also described where helium can be released from a source within the tube and from another source within the capsule.

Tube Transportation Systems Using A Gaseous Mixture Of Air And Hydrogen

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US Patent:
20200001899, Jan 2, 2020
Filed:
Jun 28, 2019
Appl. No.:
16/456711
Inventors:
- Culver City CA, US
MICHAEL SARIN - PHOENIX AZ, US
ALEXANDRE ZISA - COLOMIERS, FR
International Classification:
B61C 15/04
B65G 51/04
B61B 13/10
Abstract:
A tubular transportation system is disclosed for transporting one or more passengers or one or more cargos via a capsule along a predetermined route. The tubular transportation system has: (1) a plurality of substantially evacuated tubes arranged along the predetermined route, where each tube is maintained at a pressure that is below atmospheric pressure; and (2) means for maintaining within each tube in the plurality of substantially evacuated tubes, a gaseous composition comprising a mixture of a first percentage, x, of hydrogen and a second percentage, (100-x), of air, and wherein the first percentage, x, of hydrogen is picked based on a predetermined power value and a leak rate associated with the tube.

Method Of Using Air And Hydrogen In Low Pressure Tube Transportation

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US Patent:
20200001900, Jan 2, 2020
Filed:
Jun 28, 2019
Appl. No.:
16/456812
Inventors:
- Culver City CA, US
MICHAEL SARIN - PHOENIX AZ, US
ALEXANDRE ZISA - COLOMIERS, FR
International Classification:
B61C 15/04
B65G 51/04
B61B 13/10
Abstract:
A method is described for maintaining a gaseous composition within a tube (that is part of tubular transportation system for transporting passengers or cargos via a capsule), where the tube is arranged along a predetermined route. The method comprises: (a) pumping the tube to a pressure that is below atmospheric pressure until the tube is substantially evacuated; (b) identifying a predetermined power value; (c) identifying a first percentage, x, of hydrogen based on the predetermined power value identified in (b) and a leak rate associated with the tube; (d) maintaining within each tube in the plurality of substantially evacuated tubes, a gaseous composition comprising a mixture of a first percentage, x, of hydrogen and a second percentage, (100-x), of air.

Apparatus And Method Related To Reaction Chamber With Shutter System

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US Patent:
20160340780, Nov 24, 2016
Filed:
May 22, 2015
Appl. No.:
14/719472
Inventors:
- Almere, NL
Wentao Wang - Phoenix AZ, US
Timothy J. Sullivan - Gilbert AZ, US
Michael C. Sarin - Phoenix AZ, US
International Classification:
C23C 16/458
C23C 16/455
Abstract:
A reaction chamber assembly with a shutter system may be used in the processing of semiconductor substrates. The shutter system may facilitate gas flow control and temperature control within the reaction chamber assembly.
Control profile
Michael C Sarin from Oceanside, CA, age ~71 Get Report