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Majid Te Keshavarz

from Pleasanton, CA
Age ~64
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Also known as:
Majid K Keshavarz, Mitra Keshavarz, Mitra Rafiei-Keshavarz, Majid I, Majid Z
Phone and address:
1688 Orchard Way, Pleasanton, CA 94566
Related to:
Saeid Keshavarz, 57Mitra Rafiei, 55Salar Keshavarz, 42
Connected to:
Amid Keshavarzi, 56Anita V Keshavan, 42Aparna S Keshavan, 39Balaji I Keshava, 78Elham Keshavarzian, 43H Keshavarz, 44Madapusi K Keshavan, 73Moe Keshavarzi, 48Shirin Keshavarz, 71Shruthi Keshavan, 61

Majid Keshavarz Phones & Addresses

  • 1688 Orchard Way, Pleasanton, CA 94566
  • 871 Gray Fox Cir, Pleasanton, CA 94566
  • 622 Edgewater Blvd, Foster City, CA 94404
  • Santa Barbara, CA
  • Fremont, CA
  • Alameda, CA
  • Troy, NY

Business Records

Name / Title
Company / Classification
Phones & Addresses
Majid Keshavarz
President
NLITEN ENERGY CORPORATION
Plumbing/Heating/Air Cond Contractor · Business Services at Non-Commercial Site
650 Castro St SUITE 120-422, Mountain View, CA 94041
120 Holly Ct, Mountain View, CA 94043
(650) 964-1828

Publications

Us Patents

Methods Of Forming Quantum Dots Of Group Iv Semiconductor Materials

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US Patent:
6794265, Sep 21, 2004
Filed:
Aug 2, 2002
Appl. No.:
10/212004
Inventors:
Howard Wing Hoon Lee - Fremont CA
Bingshen Gao - Mountain View CA
Majid Keshavarz - Pleasanton CA
Assignee:
UltraDots, Inc. - Fremont CA
International Classification:
H01L 2176
US Classification:
438409, 2523016 F, 423348
Abstract:
The invention relates to a method of forming a quantum dot. A particle that includes a semiconductor material Y selected from the group consisting of Si and Ge is provided. Sound energy and light energy is applied to the particle to form a quantum dot. The quantum dot exhibits photoluminescence with a quantum efficiency that is greater than 10 percent. The quantum dot includes a core, and the core includes Y.

Molecular Self-Assembly In Substrate Processing

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US Patent:
7309658, Dec 18, 2007
Filed:
Nov 22, 2005
Appl. No.:
11/284572
Inventors:
David E. Lazovsky - San Jose CA, US
Tony P. Chiang - San Jose CA, US
Majid Keshavarz - San Jose CA, US
Assignee:
Intermolecular, Inc. - San Jose CA
International Classification:
H01L 21/4763
H01L 21/302
US Classification:
438754, 438637, 438678, 257E21251, 257E21309, 257E21577
Abstract:
Systems and methods for molecular self-assembly are provided. The molecular self-assembly receives a substrate that includes one or more regions of dielectric material. A molecularly self-assembled layer is formed on an exposed surface of the dielectric material. The molecularly self-assembled layer includes material(s) having a molecular characteristic and/or a molecular type that includes one or more of a molecular characteristic and/or a molecular type of a head group of molecules of the material, a molecular characteristic and/or a molecular type of a terminal group of molecules of the material, and a molecular characteristic and/or a molecular type of a linking group of molecules of the material. The molecular characteristic(s) and molecular type(s) are selected according to at least one pre-specified property of the molecularly self-assembled layer.

Molecular Self-Assembly In Substrate Processing

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US Patent:
7972972, Jul 5, 2011
Filed:
Oct 31, 2007
Appl. No.:
11/932033
Inventors:
David E. Lazovsky - San Jose CA, US
Tony P. Chiang - San Jose CA, US
Majid Keshavarz - San Jose CA, US
Assignee:
Intermolecular, Inc. - San Jose CA
International Classification:
H01L 21/469
US Classification:
438765, 438761, 4283044, 257E21242
Abstract:
Methods for sealing a porous dielectric are presented including: receiving a substrate, the substrate including the porous dielectric; exposing the substrate to an organosilane, where the organosilane includes a hydrolysable group for facilitating attachment with the porous dielectric, and where the organosilane does not include an alkyl group; and forming a layer as a result of the exposing to seal the porous dielectric. In some embodiments, methods are presented where the organosilane includes: alkynyl groups, aryl groups, fluoroalkyl groups, heteroarlyl groups, alcohol groups, thiol groups, amine groups, thiocarbamate groups, ester groups, ether groups, sulfide groups, and nitrile groups. In some embodiments, method further include: removing contamination from the porous dielectric and a conductive region of the substrate prior to the exposing; and removing contamination from the conductive region after the forming.

Electrolyte Compositions

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US Patent:
8338008, Dec 25, 2012
Filed:
May 28, 2010
Appl. No.:
12/790601
Inventors:
Ge Zu - San Jose CA, US
Majid Keshavarz - Pleasanton CA, US
Assignee:
Deeya Energy, Inc. - Fremont CA
International Classification:
H01M 2/38
US Classification:
429 51, 429 50
Abstract:
An electrolyte for a flow cell battery is provided. The electrolyte includes a concentration of chromium ions that is greater than the concentration of iron ions.

Molecular Self-Assembly In Substrate Processing

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US Patent:
8372759, Feb 12, 2013
Filed:
Mar 10, 2011
Appl. No.:
13/045298
Inventors:
David E. Lazovsky - Los Gatos CA, US
Tony P. Chiang - Campbell CA, US
Majid Keshavarz - San Jose CA, US
Assignee:
Intermolecular, Inc. - San Jose CA
International Classification:
H01L 21/469
US Classification:
438765, 438 4, 438761, 4283044, 257E21242
Abstract:
Methods for sealing a porous dielectric are presented including: receiving a substrate, the substrate including the porous dielectric; exposing the substrate to an organosilane, where the organosilane includes a hydrolysable group for facilitating attachment with the porous dielectric, and where the organosilane does not include an alkyl group; and forming a layer as a result of the exposing to seal the porous dielectric. In some embodiments, methods are presented where the organosilane includes: alkynyl groups, aryl groups, fluoroalkyl groups, heteroaryl groups, alcohol groups, thiol groups, amine groups, thiocarbamate groups, ester groups, ether groups, sulfide groups, and nitrile groups. In some embodiments, method further include: removing contamination from the porous dielectric and a conductive region of the substrate prior to the exposing; and removing contamination from the conductive region after the forming.

Preparation Of Flow Cell Battery Electrolytes From Raw Materials

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US Patent:
8394529, Mar 12, 2013
Filed:
May 28, 2010
Appl. No.:
12/790595
Inventors:
Majid Keshavarz - Pleasanton CA, US
Aravamuthan Varadarajan - Fremont CA, US
Assignee:
Deeya Energy, Inc. - Fremont CA
International Classification:
H01M 6/04
US Classification:
429188, 429189
Abstract:
A method for preparing a redox flow battery electrolyte is provided. In some embodiments, the method includes the processing of raw materials that include sources of chromium ions and/or iron ions. The method further comprises the removal of impurities such as metal ions from those raw materials. In some embodiments, an ammonium salt may be used to remove metal impurities from an aqueous mixture of chromium ions and/or iron ions. Further provided is a redox flow battery comprising at least one electrolyte prepared from the above-identified methods.

Quenching System

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US Patent:
8541121, Sep 24, 2013
Filed:
Jan 13, 2011
Appl. No.:
13/006151
Inventors:
Majid Keshavarz - Pleasanton CA, US
Saroj Kumar Sahu - Mountain House CA, US
Ge Zu - San Jose CA, US
Assignee:
Deeya Energy, Inc. - Fremont CA
International Classification:
H01M 2/38
H01M 10/34
H01M 10/52
H01M 4/36
H01M 6/24
H01M 4/48
H01M 6/20
H01M 6/00
H01M 10/00
C25B 1/00
C25B 3/00
C25C 1/00
US Classification:
429 51, 429 57, 429101, 429105, 429107, 429109, 429122, 320100, 320107, 320137, 320166, 205334, 205335, 205615, 205618, 205620, 73 102, 73 191, 73655, 422 8205, 422 91
Abstract:
A quencher for a flow cell battery is described. The quencher utilizes a quench solution formed from FeClin a dilute HCl solution in order to quench chlorine emissions from the flow cell battery. A quench sensor is further described. The quench sensor monitors the concentration level of FeClin the quench solution and may also monitor the level of the quench solution in the quencher.

Methods Of Producing Hydrochloric Acid From Hydrogen Gas And Chlorine Gas

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US Patent:
8551299, Oct 8, 2013
Filed:
May 28, 2010
Appl. No.:
12/790613
Inventors:
Majid Keshavarz - Pleasanton CA, US
Saroj Kumar Sahu - Mountain House CA, US
Chockkalingam Karuppaiah - Fremont CA, US
Ge Zu - San Jose CA, US
Suresh Kumar Surapalan Nair - Fremont CA, US
Vasanthan Mani - Fremont CA, US
Assignee:
Deeya Energy, Inc. - Fremont CA
International Classification:
C01B 7/01
H01M 6/50
H01M 6/04
US Classification:
20415748, 20415752, 429 49, 429200
Abstract:
A method of producing HCl from Hand Clis provided. In some embodiments, the method comprises at least one photochemical chamber placed in fluid communication with at least one source of Hand at least one source of Cl. In some embodiments, the photochemical chamber effects the formation of HCl through the use of at least one source of ultraviolet radiation contained therein. In some embodiments, the HCl product may be captured and used as a gas. In some embodiments, the HCl product may be absorbed into water to form an aqueous HCl solution.
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Majid Te Keshavarz from Pleasanton, CA, age ~64 Get Report