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Juda Shohet Phones & Addresses

  • 1937 Arlington Pl, Madison, WI 53726 (608) 238-7089
  • Brooklyn, NY
  • New Castle, IN

Work

Position: Installation, Maintenance, and Repair Occupations

Education

Degree: Associate degree or higher

Publications

Isbn (Books And Publications)

The Plasma State

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Author

Juda Leon Shohet

ISBN #

0126405506

Us Patents

Micromachined Probe Apparatus And Methods For Making And Using Same To Characterize Liquid In A Fluidic Channel And Map Embedded Charge In A Sample On A Substrate

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US Patent:
7116115, Oct 3, 2006
Filed:
May 24, 2004
Appl. No.:
10/852058
Inventors:
Yogesh B. Gianchandani - Ann Arbor MI, US
Larry L. Chu - Madison WI, US
Kenichi Takahata - Ann Arbor MI, US
Ponnambalam Selvaganapathy - Freemont CA, US
Juda L. Shohet - Madison WI, US
Assignee:
The Regents of the University of Michigan - Ann Arbor MI
Wisconsin Alumni Research Foundation - Madison WI
International Classification:
G01R 27/26
G01R 31/02
G01R 31/302
US Classification:
324661, 324 72, 324 725, 324750
Abstract:
A micromachined probe apparatus and methods for making and using same to characterize liquid in a fluidic channel and map embedded charge in a sample on a substrate are provided. The probe apparatus includes an integrated scanning tip and a dither actuation mechanism. The actuation is achieved using a bent-beam electrothermal actuator, and the probe tip is insulated from the actuator with a wide isolation gap. The device is fabricated by a modified micro electro-discharge machining process which allows electrical isolation within the micromachined structure using an epoxy plug. The apparatus may be used to measure changes in the external surface potential of a microfluidic channel as a function of varying pH of liquid inside the channel. The apparatus also may be used to map embedded charge in a thin layer on a substrate, showing it to be suitable for monitoring microelectronics manufacturing processes.

Ion Purification For Plasma Ion Implantation

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US Patent:
52890104, Feb 22, 1994
Filed:
Dec 8, 1992
Appl. No.:
7/987122
Inventors:
Juda L. Shohet - Madison WI
Assignee:
Wisconsin Alumni Research Foundation - Madison WI
International Classification:
H01J 37317
US Classification:
25049221
Abstract:
Plasma source ion implantation is carried out within an evacuated chamber having a target, such as a semiconductor wafer, supported on a target stage, with pulses of high voltage applied to the target periodically to implant ions from a plasma into the target. The ions in the plasma are purified after formation of the plasma by passing the plasma through an ion cyclotron resonance system composed of excitation electrodes and ion collector electrodes surrounding an ion purification region, with a magnet providing a unidirectional magnetic field through the ion purification region. A radio frequency time varying electric field from the excitation electrodes drives unwanted ions having charge-to-mass ratios greater than or less than that of the desired ion species to resonance with the electric field. During resonance, the undesired ions are driven outwardly in expanding spirals until reaching the ion collector plates, where the unwanted ions are removed. The purified plasma is passed to a plasma implantation region within the chamber from which the desired ions are implanted into the target as pulses of voltage are applied to the target.

Mass Spectrometer Having Magnetic Trapping

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US Patent:
45888884, May 13, 1986
Filed:
Feb 11, 1985
Appl. No.:
6/700298
Inventors:
Sahba Ghaderi - Madison WI
Juda L. Shohet - Madison WI
Duane P. Littlejohn - Madison WI
Assignee:
Nicolet Instrument Corporation - Madison WI
International Classification:
H01J 4938
US Classification:
250291
Abstract:
A mass spectrometer of the type wherein the sample is ionized, excited into resonance and detected within a generally homogeneous magnetic field. During detection, the magnetic field is perturbed to form magnetic mirror regions to contain the ions. Prior to detection, the ions may be contained by conventional trapping techniques or by magnetic reflection.

Mass Spectrometer With Remote Ion Source

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US Patent:
47391650, Apr 19, 1988
Filed:
Feb 27, 1986
Appl. No.:
6/833975
Inventors:
Sahba Ghaderi - Madison WI
Duane P. Littlejohn - Madison WI
Juda L. Shohet - Madison WI
Assignee:
Nicolet Instrument Corporation - Madison WI
International Classification:
B01D 5944
US Classification:
250290
Abstract:
A remote ion source within an ICR mass spectrometer which provides an enhanced trapping (within an analyzer cell) of ions formed within that remote ion source. In a preferred embodiment, trapping enhancement is accomplished by means of magnetic perturbations of the magnetic field within the analyzer cell. The perturbations may be established by ferromagnetic means or electromagnetic means or by the use of permanent magnets to form a magnetic bottle. Ions formed within the remote ion source are extracted from that source by an electrostatic lens and directed toward the analyzer cell along the Z axis of the spectrometer magnetic field. Deceleration lenses, external to the analyzer cell, may be employed to further enhance the trapping capability of the analyzer cell. In some modes of operation, a ramped deceleration potential may be applied to the declaration lens for "grouping" of ions of different masses for analysis. Provision for mass selection is also made within the spectrometer disclosed herein.
Juda Leon Shohet from Madison, WI, age ~87 Get Report