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Lee D Clementi

from Clover, SC
Age ~63
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Also known as:
Lee Amory Clementi, Lee William Clementi, Lee Terri Clementi, Lee Armory Clementi, Leonard D Clementi, Leonard Clement Theresa, Clementi D Lee, Dante Clementi Lee
Phone and address:
85 Hamilton Woods Ct, Lake Wylie, SC 29710
(803) 831-1485
Related to:
Robert L Unger, 66Alice Lee, 42David Lee, 52Jae I Lee, 49Lauren Lee, 38
Connected to:
Aaron N Clemente, 32Adrian ClementeAdrienne D Clement, 46Agustin Clemente, 66Alanna J Clement, 35Alberto A Clemente, 77Alfred Clemente, 37Alfredo J Clemente, 60Alicia S Clement, 49Alissa M Clement, 51

Lee Clementi Phones & Addresses

  • 85 Hamilton Woods Ct, Clover, SC 29710 (803) 831-1485
  • 85 Hamiltons Ferry Rd, Clover, SC 29710
  • Lake Wylie, SC
  • 901 Queens Rd, Charlotte, NC 28207
  • Jupiter, FL
  • York, SC

Work

Company: Ade optical systems 1984 to 1999 Position: Optical engineer, systems engineer

Education

Degree: Bachelors, Bachelor of Science School / High School: Lehigh University Specialities: Engineering, Physics

Industries

Real Estate

Resumes

Resumes

Lee Clementi Photo 1

Principal

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Location:
Clover, SC
Industry:
Real Estate
Work:
Ade Optical Systems 1984 - 1999
Optical Engineer, Systems Engineer
Clementi Properties 1984 - 1999
Principal
Education:
Lehigh University
Bachelors, Bachelor of Science, Engineering, Physics

Business Records

Name / Title
Company / Classification
Phones & Addresses
Lee Clementi
Owner
Clementi Properties
Real Estate Agent/Manager
Charlotte, NC 28247
Lee Clementi
Manager
Woodhaven Villas
Dwelling Operator
4000 Frst Hl Blvd, West Palm Beach, FL 33406
(561) 965-4444
Lee D Clementi
CLEMENTI PROPERTIES, INC
7257 Pineville Matthews-Rd, Charlotte, NC 28226
85 Hamilton Wood Ct, Clover, SC 29710
Lee Clementi
Director
Game Masters of Orlando, Inc
819 Henley Pl, Charlotte, NC 28207

Publications

Us Patents

Wafer Inspection System For Distinguishing Pits And Particles

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US Patent:
6509965, Jan 21, 2003
Filed:
Jul 17, 2001
Appl. No.:
09/906062
Inventors:
Michael E. Fossey - Newbury Park CA
John C. Stover - Charlotte NC
Lee D. Clementi - Lake Wylie SC
Assignee:
ADE Optical Systems Corporation - Charlotte NC
International Classification:
G01N 2100
US Classification:
3562372, 356343, 356364, 3562374
Abstract:
A surface inspection system and method is provided which detects defects such as particles or pits on the surface of a workpiece, such as a silicon wafer, and also distinguishes between pit defects and particle defects. The surface inspection system comprises an inspection station for receiving a workpiece and a scanner positioned and arranged to scan a surface of the workpiece at the inspection station. The scanner includes a light source arranged to project a beam of P-polarized light and a scanner positioned to scan the P-polarized light beam across the surface of the workpiece. The system further provides for detecting differences in the angular distribution of the light scattered from the workpiece and for distinguishing particle defects from pit defects based upon these differences.

Method And Apparatus For Mapping Surface Topography Of A Substrate

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US Patent:
6621581, Sep 16, 2003
Filed:
Oct 15, 1999
Appl. No.:
09/418722
Inventors:
James David Hunt - Charlotte NC
Lee Dante Clementi - Lake Wylie SC
Charles A. Monjak - Clover SC
Assignee:
ADE Corporation - Westwood MA
International Classification:
G01B 1124
US Classification:
356601
Abstract:
Full surface maps of slope and height are determined for the surface of a highly smooth surface such as a silicon wafer, by an apparatus which includes a light source for creating a light beam and scanning and wafer transport systems which cause the incident beam to be scanned over the full surface of the wafer. A quad cell light detector is positioned to receive the beam specularly reflected from the wafer surface, the quad cell detector having four cells arranged in quadrants with each cell providing an electrical signal indicative of the amount of light received by the cell. A processor is programmed to calculate changes in spot location on the detector based on the signals from the cells, and to calculate changes in surface slopes based on the changes in spot location. Full maps of X- and Y-slope are produced, and a line integration algorithm is used for calculating full surface height maps. Regions of surface height gradient exceeding a threshold are flagged as defects by the processor.

Wafer Inspection System For Distinguishing Pits And Particles

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US Patent:
20040085533, May 6, 2004
Filed:
Jun 24, 2003
Appl. No.:
10/601698
Inventors:
Michael Fossey - Newbury Park CA, US
John Stover - Charlotte NC, US
Lee Clementi - Lake Wylie SC, US
Assignee:
ADE Optical Systems Corporation
International Classification:
G01N021/00
US Classification:
356/239700
Abstract:
A surface inspection system and method is provided which detects defects such as particles or pits on the surface of a workpiece, such as a silicon wafer, and also distinguishes between pit defects and particle defects. The surface inspection system comprises an inspection station for receiving a workpiece and a scanner positioned and arranged to scan a surface of the workpiece at the inspection station. The scanner includes a light source arranged to project a beam of P-polarized light and a scanner positioned to scan the P-polarized light beam across the surface of the workpiece. The system further provides or detecting differences in the angular distribution of the light scattered from the workpiece and for distinguishing particle defects from pit defects based upon these differences.

Wafer Inspection System For Distinguishing Pits And Particles

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US Patent:
61185256, Sep 12, 2000
Filed:
Oct 27, 1997
Appl. No.:
8/958230
Inventors:
Michael E. Fossey - Newbury Park CA
John C. Stover - Charlotte NC
Lee D. Clementi - Lake Wylie SC
Assignee:
ADE Optical Systems Corporation - Charlotte NC
International Classification:
G01N 2100
US Classification:
3562372
Abstract:
A surface inspection system and method is provided which detects defects such as particles or pits on the surface of a workpiece, such as a silicon wafer, and also distinguishes between pit defects and particle defects. The surface inspection system comprises an inspection station for receiving a workpiece and a scanner positioned and arranged to scan a surface of the workpiece at the inspection station. The scanner includes a light source arranged to project a beam of P-polarized light and a scanner positioned to scan the P-polarized light beam across the surface of the workpiece. The system further provides for detecting differences in the angular distribution of the light scattered from the workpiece and for distinguishing particle defects from pit defects based upon these differences.

Particle Detection System With Coincident Detection

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US Patent:
53293517, Jul 12, 1994
Filed:
Nov 24, 1992
Appl. No.:
7/980684
Inventors:
Lee D. Clementi - Lake Wylie SC
Assignee:
Estek Corporation - Charlotte NC
International Classification:
G01N 2188
US Classification:
356237
Abstract:
The particle detection system detects particles or flaws on the surface of an article. The system has a source of light directed against the surface of the article and a detector for detecting light scattered from the article and indicative of the presence of particles or flaws present on the article. The detector includes a light collector positioned for receiving and collecting light scattered from the surface of the article, a light splitter cooperating with the collector for dividing the collected light into first and second light collect components, first and second photodetectors positioned for receiving respectively first and second like light components, and an electrical circuit for combining the output signals from the first and second photodetectors to form a combined output signal with a higher signal-to-noise ratio than traditional systems.

Methods And Apparatus For Identifying The Material Of A Particle Occurring On The Surface Of A Substrate

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US Patent:
61220477, Sep 19, 2000
Filed:
Jan 14, 1999
Appl. No.:
9/231685
Inventors:
John C. Stover - Charlotte NC
Songping Gao - Southborough MA
Michael E. Fossey - Woodland Hills CA
Lee Dante Clementi - Lake Wylie SC
Assignee:
ADE Optical Systems Corporation - Charlotte NC
International Classification:
G01N 2188
US Classification:
3562373
Abstract:
The composition of a particle occurring on the surface of a smooth substrate is identified by impinging the surface with a light beam having a strong P-polarized component at an oblique angle of incidence to the surface, and collecting light scattered from the surface at forward, center, and back locations relative to the portion of the surface impinged by the incident beam. The intensities of the light collected at these locations are measured by detectors and converted into signals, and the magnitudes of the signals are compared to correlations of particle material as a function of the relative magnitudes of the forward-, center-, and back-scatter signals so as to identify the material whose correlation most nearly matches the measured detector signals. Preferably, a ratio of the back detector signal magnitude to forward detector signal magnitude is correlated with particle material and back detector signal magnitude. Alternatively or additionally, a ratio of back detector signal magnitude to center detector signal magnitude is correlated with particle material and back detector signal magnitude.

Surface Inspection System And Method Of Inspecting Surface Of Workpiece

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US Patent:
57127018, Jan 27, 1998
Filed:
Mar 6, 1995
Appl. No.:
8/399962
Inventors:
Lee D. Clementi - Lake Wylie SC
Michael E. Fossey - Charlotte NC
Assignee:
ADE Optical Systems Corporation - Charlotte NC
International Classification:
G01N 2188
US Classification:
356237
Abstract:
A surface inspection system and methods of inspecting a surface of a workpiece are provided for detecting particles, defects, or other surface characteristics in or on a surface of the workpiece. The surface inspection system preferably has a transporter arranged for transporting a workpiece along a material path and a rotator associated with the transporter and arranged for rotating a workpiece during translational travel along the material path. A scanner is positioned and arranged for scanning a surface of a workpiece during rotational and translational travel along the material path. The scanner preferably includes a light source arranged to generate a light beam therefrom and a deflector positioned to receive the light beam and arranged for deflecting the light beam along a predetermined scan path across a surface of the workpiece as the workpiece rotationally and translationally travels along the material path. A collector also is preferably arranged for collecting light specularly reflected and scattered from the surface of the workpiece during rotational and translational travel along the material path.
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Lee D Clementi from Clover, SC, age ~63 Get Report