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Kyle Hadcock Phones & Addresses

  • 63 Lapham Park, Webster, NY 14580
  • 43 Windsor Blvd, Londonderry, NH 03053 (603) 421-0547
  • Geneseo, NY
  • Rochester, NY

Work

Position: Professional/Technical

Resumes

Resumes

Kyle Hadcock Photo 1

Mechanical Engineer

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Location:
63 Lapham Park, Webster, NY 14580
Industry:
Mechanical Or Industrial Engineering
Work:
Ocean Insights
Mechanical Engineer

Lumetrics
Principal Opto-Mechanical Engineer

Lumetrics Dec 2008 - Jan 2013
Opto-Mechanical Engineer

Lumetrics Mar 2007 - Dec 2008
Applications Engineer

Osram Sylvania Jun 2006 - Dec 2006
Process Engineer
Education:
Rochester Institute of Technology 2004 - 2008
Bachelors, Bachelor of Science, Mechanical Engineering
Skills:
Solidworks
Engineering
Optics
Manufacturing
Optical Engineering
Product Development
Metrology
Cad
Interferometry
Team Leadership
Assembly
Microsoft Office
Medical Devices
Excel
Design of Experiments
Lean Manufacturing
Project Management
Automation
Matlab
Minitab
Sales
Peer Mentoring
R&D
Gage R&R
Management
Quality Assurance
Testing
Technical Writing
Sheet Metal
Solid Modeling
Inspection
Ce Testing
Interests:
Family
Football
Computers
Outdoors
Nascar
Home Improvement
Hunting
Kyle Hadcock Photo 2

Kyle Hadcock

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Publications

Us Patents

Rotational And Linear System And Methods For Scanning Of Objects

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US Patent:
20110128552, Jun 2, 2011
Filed:
Dec 2, 2010
Appl. No.:
12/958532
Inventors:
Kyle J. HADCOCK - Webster NY, US
Stephen HEVERON-SMITH - Webster NY, US
Vincent LAMANNA - Ontario NY, US
David BARANSON - Encinitas CA, US
Assignee:
LUMETRICS, INC. - West Henrietta NY
International Classification:
G01B 11/00
US Classification:
356496
Abstract:
A scanning system comprised of a multi-axis drive module comprised of a first linear drive operable along a first axis, a second linear drive joined to the first linear drive and operable along a second axis non-parallel to the first axis, and a first rotary drive mounted on the second linear drive, operable around an axis parallel to the first axis, and comprised of a rotary fixture for holding the object. A first optical probe is provided for scanning the object. The rotary fixture for holding the object may include a central object-receiving port. A first fluid circuit may be provided, which is in communication with the central object-receiving port. In that manner, an internal cavity of the object may be pressurized through a passageway in the portion of the object that is disposed in the central object-receiving port, thereby stabilizing a region of the object to be scanned.

Apparatus And Method For Measurement Of Multilayer Structures

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US Patent:
20200393240, Dec 17, 2020
Filed:
Aug 27, 2020
Appl. No.:
17/004717
Inventors:
- Rochester NY, US
Kyle J. Hadcock - Webster NY, US
Donald S. Gibson - West Henrietta NY, US
Filipp V. Ignatovich - Rochester NY, US
Assignee:
Lumetrics, Inc. - Rochester NY
International Classification:
G01B 11/06
G01B 9/02
G01N 21/45
Abstract:
A method of identifying the material and determining the physical thickness of each layer in a multilayer structure is disclosed. The method includes measuring the optical thickness of each of the layers of the multilayer object as a function of wavelength of a light source and calculating a normalized group index of refraction dispersion curve for each layer in the multilayer structure. The measured normalized group index of refraction dispersion curves for each of the layers is then compared to a reference database of known materials and the material of each layer is identified. The physical thickness of each layer is then determined from the group index of refraction dispersion curve for the material in each layer and the measured optical thickness data. A method for determining the group index of refraction dispersion curve of a known material, and an apparatus for performing the methods are also disclosed.

Apparatus And Method For Measurement Of Multilayer Structures

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US Patent:
20190162660, May 30, 2019
Filed:
Oct 29, 2018
Appl. No.:
16/172910
Inventors:
- Rochester NY, US
Kyle J. HADCOCK - Webster NY, US
Donald S. GIBSON - West Henrietta NY, US
Filipp V. IGNATOVICH - Rochester NY, US
Assignee:
Lumetrics, Inc. - Rochester NY
International Classification:
G01N 21/45
G01B 11/06
G01N 21/41
Abstract:
A method of identifying the material and determining the physical thickness of each layer in a multilayer structure is disclosed. The method includes measuring the optical thickness of each of the layers of the multilayer object as a function of wavelength of a light source and calculating a normalized group index of refraction dispersion curve for each layer in the multilayer structure. The measured normalized group index of refraction dispersion curves for each of the layers is then compared to a reference database of known materials and the material of each layer is identified. The physical thickness of each layer is then determined from the group index of refraction dispersion curve for the material in each layer and the measured optical thickness data. A method for determining the group index of refraction dispersion curve of a known material, and an apparatus for performing the methods are also disclosed.

Method Of Measurement Of Multilayer Structures

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US Patent:
20180321145, Nov 8, 2018
Filed:
May 3, 2017
Appl. No.:
15/585495
Inventors:
- Rochester NY, US
Donald S. GIBSON - West Henrietta NY, US
Kyle J. HADCOCK - Webster NY, US
Filipp V. IGNATOVICH - Rochester NY, US
Assignee:
Lumetrics, Inc. - Rochester NY
International Classification:
G01N 21/45
G01B 11/06
G01B 9/02
Abstract:
A method of identifying the material and determining the physical thickness of each layer in a multilayer structure is disclosed. The method includes measuring the optical thickness of each of the layers of the multilayer object as a function of wavelength of a light source and calculating a normalized group index of refraction dispersion curve for each layer in the multilayer structure. The measured normalized group index of refraction dispersion curves for each of the layers is then compared to a reference data base of known materials and the material of each layer is identified. The physical thickness of each layer is then determined from the group index of refraction dispersion curve for the material in each layer and the measured optical thickness data. A method for determining the group index of refraction dispersion curve of a known material is also disclosed.
Kyle J Hadcock from Webster, NY, age ~39 Get Report