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Kenneth H Kubala

from Longmont, CO
Age ~44
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Related to:
George F Kubala, 94John T Kubala, 30Kristie M Bryant, 48Mitzi Bryant, 55Brad M Kennedy, 48Chris M Clifton, 42Brandon G Bryant, 45Margaret M Kubala, 77Gregory B Bryant, 49
Connected to:
Beth E Kubala, 54Beverly A Kubala, 66Dan J Kubala, 93Juliana M Kubala, 58Melissa J Kubala, 54Nicholas Kubala, 35Patricia A Kubala, 47Peter P Kubala, 89Sarah A Kubala, 35Holli M Kubalak, 53

Kenneth Kubala Phones & Addresses

  • 3969 Da Vinci Dr, Longmont, CO 80503 (720) 684-6540
  • West, TX
  • Elm Mott, TX
  • Kyle, TX
  • McLean, TX
  • Austin, TX
  • 737 Arrowood St, Longmont, CO 80503

Resumes

Resumes

Kenneth Kubala Photo 1

Kenneth Kubala

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Location:
Greater Denver Area
Industry:
Design
Kenneth Kubala Photo 2

Account Executive For Kelly Scientific

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Location:
Denver, CO
Industry:
Staffing And Recruiting
Work:
Kelly Services
Account Executive For Kelly Scientific
Robert Half Jul 2017 - Nov 2018
Office Team Staffing Manager
St. Vrain Valley School District Dec 2016 - May 2017
Substitute Teacher
University of Colorado Boulder Sep 2015 - Dec 2015
Private Tutor
University of Colorado Boulder Jan 2015 - May 2015
Graduate Instructor, Techniques In Neuroscience
Education:
University of Colorado Boulder 2007 - 2015
Doctorates, Doctor of Philosophy, Neuroscience Texas State University 2006 - 2006
Masters, Psychology, Neuroscience Texas A&M University 2004 - 2004
Bachelors, Bachelor of Science, Psychology Texas State Technical College 2001 - 2001
Associates
Skills:
Science
Research
Neuroscience
Statistics
Data Analysis
Spss
Presentations
Behavioral Neuroscience
Laboratory Skills
Hplc
Public Speaking
Powerpoint
Statview
R and C++ Programing
Phython
Word Processing
Microsoft Excel
Computer Proficiency
Optogenetics
Microarray Analysis
Neuroanatomy
Laser Electro Optics
Team Problem Solving
Interpersonal Skills
Standard Operating Procedures
Equipment Maintenance
Animal Handling
Good Manufacturing Practices
Kenneth Kubala Photo 3

Kenneth Kubala

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Business Records

Name / Title
Company / Classification
Phones & Addresses
Kenneth Kubala
Director
BOLD SPRINGS WATER SUPPLY CORPORATION
Rr 1 BOX 215, West, TX 76691
Kenneth Kubala
City Secretary
West, City of (Inc)
Legislative Body · Police Protection
110 N Reagan St, Tours, TX 76691
PO Box 97, Tours, TX 76691
(254) 826-5351, (254) 826-5311

Publications

Us Patents

Lithographic Systems And Methods With Extended Depth Of Focus

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US Patent:
7088419, Aug 8, 2006
Filed:
Jun 1, 2004
Appl. No.:
10/858337
Inventors:
Gregory E. Johnson - Boulder CO, US
Kenneth S. Kubala - Boulder CO, US
Assignee:
CDM Optics, Inc. - Boulder CO
International Classification:
G03B 27/00
US Classification:
355 18, 355 53, 355 67
Abstract:
An optical lithography system that has extended depth of focus exposes a photoresist coating on a wafer, and includes an illumination sub-system, a reticle, and an imaging lens that has a pupil plane function to form an aerial image of the reticle proximate to the photoresist. The pupil plane function provides the extended depth of focus such that the system may be manufactured or used with relaxed tolerance, reduced cost and/or increased throughput. The system may be used to form precise vias within integrated circuits even in the presence of misfocus or misalignment.

Systems And Methods For Minimizing Aberrating Effects In Imaging Systems

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US Patent:
7260251, Aug 21, 2007
Filed:
Mar 31, 2004
Appl. No.:
10/813993
Inventors:
Kenneth Scott Kubala - Boulder CO, US
Alan Eugene Baron - Boulder CO, US
Assignee:
CDM Optics, Inc. - Boulder CO
International Classification:
G06K 9/00
US Classification:
382128, 382232, 382255, 382321, 359 16, 359196, 359279, 250216, 2502019
Abstract:
An imaging system for reducing aberrations from an intervening medium, and an associated method of use are provided. The system may be an optical or task-based optical imaging system including optics, such as a phase mask, for imaging a wavefront of the system to an intermediate image and modifying phase of the wavefront such that an optical transfer function of the system is substantially invariant to focus-related aberrations from the medium. A detector detects the intermediate image, which is further processed by a decoder, removing phase effects from the optics and forming a final image substantially clear of the aberrations. Other systems may employ an encoder that codes wavefronts of acoustical waves propagating through a medium to make the wavefronts substantially invariant to acoustical aberrations from the medium. Imaging and decoding of the wavefronts reverse effects of the wavefront coding and produce sounds substantially free of the aberrations.

Methods For Minimizing Aberrating Effects In Imaging Systems

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US Patent:
7319783, Jan 15, 2008
Filed:
Nov 17, 2006
Appl. No.:
11/560987
Inventors:
Kenneth Scott Kubala - Boulder CO, US
Alan Eugene Baron - Boulder CO, US
Assignee:
CDM Optics, Inc. - Boulder CO
International Classification:
G06K 9/00
US Classification:
382128, 382232, 382255, 359 16, 359279, 2502019
Abstract:
A method for reducing optical distortion within an optical system employing adaptive optics, includes modifying phase of a wavefront of the optical system with a wavefront coding element. Image data of the optical system is post-processed to remove phase effects induced by the wavefront coding element, to reduce optical distortion caused by the adaptive optics and associated with one or more of quilting, stuck actuator and piston error.

Systems And Methods For Minimizing Aberrating Effects In Imaging Systems

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US Patent:
7450745, Nov 11, 2008
Filed:
Nov 17, 2006
Appl. No.:
11/561065
Inventors:
Kenneth Scott Kubala - Boulder CO, US
Alan Eugene Baron - Boulder CO, US
Assignee:
OmniVision CDM Optics, Inc. - Boulder CO
International Classification:
G06K 9/00
US Classification:
382128, 382232, 382255, 359 16, 359279, 2502019
Abstract:
An imaging system for reducing aberrations from an intervening medium, and an associated method of use are provided. The system may be an optical or task-based optical imaging system including optics, such as a phase mask, for imaging a wavefront of the system to an intermediate image and modifying phase of the wavefront such that an optical transfer function of the system is substantially invariant to focus-related aberrations from the medium. A detector detects the intermediate image, which is further processed by a decoder, removing phase effects from the optics and forming a final image substantially clear of the aberrations. Other systems may employ an encoder that codes wavefronts of acoustical waves propagating through a medium to make the wavefronts substantially invariant to acoustical aberrations from the medium. Imaging and decoding of the wavefronts reverse effects of the wavefront coding and produce sounds substantially free of the aberrations.

Low Height Imaging System And Associated Methods

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US Patent:
7453653, Nov 18, 2008
Filed:
Sep 14, 2005
Appl. No.:
11/227316
Inventors:
Kenneth Scott Kubala - Boulder CO, US
Robert H. Cormack - Boulder CO, US
Assignee:
OmniVision CDM Optics, Inc. - Boulder CO
International Classification:
G02B 13/18
US Classification:
359708, 359652
Abstract:
Low height imaging systems may include one or more optical channels and a detector array. Each of the optical channels may be associated with one or more detectors of the array, have one or more optical components and a restrictive ray corrector, and be configured to direct steeper incident angle field rays onto the detectors. Alternatively, each of the optical channels may be associated with at least one detector, and have an aspheric GRIN lens. Another low height imaging system has an array of detectors and a GRIN lens having a surface with wavefront coding and configured to direct steeper incident angle field rays onto more than one of the detectors. One method forms a lens with wavefront coding. The method includes positioning a lens in a mold; and curing material onto a surface of the lens to form an aspheric surface of the lens with wavefront coding.

System And Method For Optimizing Optical And Digital System Designs

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US Patent:
7469202, Dec 23, 2008
Filed:
Dec 1, 2004
Appl. No.:
11/000819
Inventors:
Gregory E. Johnson - Boulder CO, US
Kenneth S. Kubala - Boulder CO, US
Kenneth Ashley Macon - Longmont CO, US
Goran M. Rauker - Longmont CO, US
Assignee:
OmniVision CDM Optics, Inc. - Boulder CO
International Classification:
G06G 7/48
G06G 7/62
G06F 17/50
G02B 27/44
G02B 27/46
G02B 27/14
US Classification:
703 13, 703 6, 359563, 359637
Abstract:
A system, method and software product to optimize optical and/or digital system designs. An optical model of the optical system design is generated. A digital model of the digital system design is generated. Simulated output of the optical and digital models is analyzed to produce a score. The score is processed to determine whether the simulated output achieves one or more goals. One or more properties of at least one of the optical model and the digital model is modified if the goals are not achieved. The analyzing, processing and modifying is repeated until the goals are achieved, and an optimized optical system design and optimized digital system design are generated from the optical and digital models.

System And Method For Optimizing Optical And Digital System Designs

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US Patent:
7860699, Dec 28, 2010
Filed:
Dec 22, 2008
Appl. No.:
12/341359
Inventors:
Gregory E. Johnson - Boulder CO, US
Kenneth S. Kubala - Boulder CO, US
Kenneth Ashley Macon - Longmont CO, US
Goran M. Rauker - Longmont CO, US
Assignee:
OmniVision Technologies, Inc. - Santa Clara CA
International Classification:
G06G 7/48
G06G 7/62
G06F 17/50
G02B 27/44
G02B 27/46
G02B 27/14
US Classification:
703 13, 703 6, 359563, 359637
Abstract:
A software product includes instructions stored on computer-readable media, that when executed by a computer, perform steps for optimizing an optical system design and a digital system design. The instructions are for simulating an optical model of the optical system design, simulating a digital model of the digital system design, analyzing simulated output of the optical model and simulated output of the digital model, to produce a score, modifying the optical model and the digital model, based upon the score, controlling re-execution of the instructions for simulating the optical model, the instructions for simulating the digital model, the instructions for analyzing and the instructions for modifying to produce an optimized optical model and an optimized digital model, and outputting predicted performance of the optimized optical and digital models.

Lithographic Systems And Methods With Extended Depth Of Focus

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US Patent:
7876417, Jan 25, 2011
Filed:
Jul 21, 2006
Appl. No.:
11/490593
Inventors:
Gregory E. Johnson - Boulder CO, US
Kenneth S. Kubala - Boulder CO, US
Assignee:
OmniVision Technologies, Inc. - Santa Clara CA
International Classification:
G03B 27/00
US Classification:
355 18, 355 53, 355 67
Abstract:
An optical lithography system that has extended depth of focus exposes a photoresist coating on a wafer, and includes an illumination sub-system, a reticle, and an imaging lens that has a pupil plane function to form an aerial image of the reticle proximate to the photoresist. The pupil plane function provides the extended depth of focus such that the system may be manufactured or used with relaxed tolerance, reduced cost and/or increased throughput. The system may be used to form precise vias within integrated circuits even in the presence of misfocus or misalignment.
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Kenneth H Kubala from Longmont, CO, age ~44 Get Report