Search

Jun Lee Phones & Addresses

  • Stoneham, MA
  • Medford, MA
  • Astoria, NY
  • Boston, MA

Professional Records

Medicine Doctors

Jun Lee Photo 1

Dr. Jun Yup Lee, Palisades Park NJ - DC (Doctor of Chiropractic)

View page
Specialties:
Chiropractic
Address:
545 Broad Ave Suite 1, Palisades Park, NJ 07650
(201) 585-1020 (Phone), (201) 585-1215 (Fax)
Languages:
English
Jun Lee Photo 2

Dr. Jun B Lee - MD (Doctor of Medicine)

View page
Hospitals:
505 E 70Th St, New York, NY 10021

NewYork-Presbyterian/Weill Cornell Medical Center
525 East 68Th Street, New York, NY 10065
Education:
Medical Schools
Joan Sanford I Weill Medical College Of Cornell University
Graduated: 2000
Jun Lee Photo 3

Jun B. Lee

View page
Specialties:
Nephrology
Work:
The Rogosin Institute Nephrology
505 E 70 St STE 203, New York, NY 10021
(212) 746-1578 (phone), (212) 746-8483 (fax)
Education:
Medical School
Cornell University Weill Medical College
Graduated: 2000
Procedures:
Dialysis Procedures
Conditions:
Acute Renal Failure
Chronic Renal Disease
Acute Glomerulonephritis
Kidney Cancer
Nephrotic Syndrome
Languages:
Chinese
English
Korean
Spanish
Description:
Dr. Lee graduated from the Cornell University Weill Medical College in 2000. He works in New York, NY and specializes in Nephrology. Dr. Lee is affiliated with New York Presbyterian Hospital Weill Cornell Medical Center.
Jun Lee Photo 4

Jun Lee, Flushing NY - PT (Physical therapy)

View page
Specialties:
Physical Therapy
Address:
4021 159Th St Suite 2, Flushing, NY 11358
(718) 661-1500 (Phone), (718) 661-1503 (Fax)
Languages:
English
Jun Lee Photo 5

Jun B Lee, New York NY

View page
Specialties:
Nephrologist
Address:
525 E 68Th St, New York, NY 10065
505 E 70Th St, New York, NY 10021
Education:
Cornell University, Weill Cornell Medical College - Doctor of Medicine
Board certifications:
American Board of Internal Medicine Certification in Internal Medicine
American Board of Internal Medicine Sub-certificate in Nephrology (Internal Medicine)
Jun Lee Photo 6

Jun Yup Lee, Palisades Park NJ

View page
Specialties:
Chiropractor
Address:
545 Broad Ave, Palisades Park, NJ 07650
Jun Lee Photo 7

Jun Lee, Flushing NY

View page
Specialties:
Physical Therapist
Address:
4021 159Th St, Flushing, NY 11358

License Records

Jun L Lee

License #:
PNT.044316 - Expired
Issued Date:
Jan 19, 2006
Expiration Date:
May 9, 2010
Type:
Pharmacy Intern

Lawyers & Attorneys

Jun Lee Photo 8

Jun Suh Lee - Lawyer

View page
Address:
Kim & Chang
(237) 031-769x (Office)
Licenses:
New York - Delinquent 2005
Education:
Smu Dedman Law School
Jun Lee Photo 9

Jun Ho Lee - Lawyer

View page
Address:
Kim & Chang
(237) 031-176x (Office)
Licenses:
New York - Delinquent 2008
Education:
Harvard Law School
Jun Lee Photo 10

Jun Hwa Lee, New York NY - Lawyer

View page
Address:
Departmental Disciplinary Committee, Supreme Court, Appellate Division
61 Broadway, New York, NY 10006
(212) 401-0800 (Office)
Licenses:
New York - Currently registered 2001
Education:
Syracuse University
Jun Lee Photo 11

Jun Hee Lee - Lawyer

View page
Address:
Taejoon Pharm Co. Ltd
Licenses:
Missouri - Good Standing, Active 2003
Jun Lee Photo 12

Jun Hee Lee - Lawyer

View page
Licenses:
New York - Due to reregister within 30 days of birthday 2011
Education:
University of Southern California Law School
Jun Lee Photo 13

Jun Hee Lee, New York NY - Lawyer

View page
Address:
Office of Legal Affairs
United Nations S 3430C, New York, NY 10017
(212) 963-9075 (Office)
Licenses:
New York - Currently registered 1990
Education:
Columbia University School of Law
Jun Lee Photo 14

Jun Lee - Lawyer

View page
Specialties:
Corporate Finance
Mortgage Finance
ISLN:
900600928
Admitted:
1993
University:
Syracuse University; Haverford College, B.A., 1987; George Washington University Law School
Law School:
Cornell University, J.D., 1992

Resumes

Resumes

Jun Lee Photo 15

Jun Lee Edison, NJ

View page
Work:
Costume SuperCenter
Edison, NJ
Jun 2013 to May 2014
Inventory Support

Victoria's Secret
Edison, NJ
Oct 2011 to Aug 2012
Merchandise Flow Supervisor

New York Golf Center
Lawrenceville, NJ
Feb 2010 to Mar 2011
Assistant Manager

Cold Stone Creamery
Edison, NJ
Mar 2011 to Present
Manager

Education:
Mason Gross School of the Arts
New Brunswick, NJ
2004 to 2007
Bachelor in Fine Arts

Middlesex County College
Edison, NJ
2001 to 2004
Associates Degree in Fine Arts

Skills:
Computer Sufficient (Microsoft Word, Microsoft Excel, and Microsoft PowerPoint)

Business Records

Name / Title
Company / Classification
Phones & Addresses
Jun Lee
President
One River Managment Inc
Management Services
28 Dempsey Ave, Edgewater, NJ 07020
Jun S Lee
President
AIRIST BOSTON CO INC
333 Sylvan Ave STE 219, Englewood Cliffs, NJ 07632
349A 4 St, Palisades Park, NJ 07650
Jun Lee
Owner
Woofy Pet
Animal Services · Pet Grooming
982 Riv Rd, Edgewater, NJ 07020
(201) 969-1500
Jun Lee
Owner
C.C. Nails Inc
Beauty Shop
45 S Livingston Ave, Livingston, NJ 07039
(973) 716-0001
Jun Lee
Partner
Junlee Ptpc
Individual and Family Services, Nsk · Individual/Family Services · Nonclassifiable Establishments
4021 159 St, Flushing, NY 11358
(718) 661-1500
Jun Sung Lee
Director
KOREAN METHODIST CHURCH OF NEW ENGLAND, INC
5 St Luke's Rd, Allston, MA 02134
255 Grapevine Rd, Wenham, MA 01984
Jun Lee
CFO
RED ASSOCIATES U.S., INC
Management Consulting Services
26 Broadway SUITE 2505, New York, NY 10004
26 Broadway #13, New York, NY 10004
(212) 483-8899
Jun Lee
Principal
A Cleaner
Repair Services
2 Ml Rd, Yonkers, NY 10709

Publications

Isbn (Books And Publications)

History and Utopian Disillusion: The Dialectical Politics in the Novels of John Dos Passos

View page
Author

Jun Young Lee

ISBN #

0820486426

Us Patents

Ultrasonically Generated Paramagnetic Polymer Particles

View page
US Patent:
6423410, Jul 23, 2002
Filed:
Aug 2, 1999
Appl. No.:
09/365506
Inventors:
Irving Sucholeiki - Watertown MA
Jun Young Lee - Medford MA
Assignee:
MDS Proteomics, Inc. - Toronto
International Classification:
B32B 516
US Classification:
428403, 428407, 524202
Abstract:
A composite paramagnetic particle and method of making are provided. In one aspect of the invention, a particle comprising a multitude of submicron polymer bead aggregates covalently cross-linked to each other to form larger diameter particles is presented. Distributed throughout the composite paramagnetic particle are vacuous cavities. Each submicron polymer bead has distributed throughout its interior and surface submicron magnetite crystals. In another aspect of the invention, composite particles are made using high energy ultrasound during polymerization of one or more vinyl monomers. In one embodiment, high energy ultrasound is used during an emulsification step and during the early stages of the polymerization process to produce micron sized composite paramagnetic particles. The particles according to the invention exhibit a high percent magnetite incorporation and water and organic solvent stability.

Ultrasonically Generated Paramagnetic Polymer Particles

View page
US Patent:
6682660, Jan 27, 2004
Filed:
May 14, 2002
Appl. No.:
10/143903
Inventors:
Irving Sucholeiki - Watertown MA
Jun Young Lee - Medford MA
Assignee:
MDS Proteomics, Inc. - Toronto
International Classification:
H01F 100
US Classification:
252 6254, 523205, 523202, 523210
Abstract:
A composite paramagnetic particle and method of making are provided. In one aspect of the invention, a particle comprising a multitude of submicron polymer bead aggregates covalently cross-linked to each other to form larger diameter particles is presented. Distributed throughout the composite paramagnetic particle are vacuous cavities. Each submicron polymer bead has distributed throughout its interior and surface submicron magnetite crystals. In another aspect of the invention, composite particles are made using high energy ultrasound during polymerization of one or more vinyl monomers. In one embodiment, high energy ultrasound is used during an emulsification step and during the early stages of the polymerization process to produce micron sized composite paramagnetic particles. The particles according to the invention exhibit a high percent magnetite incorporation and water and organic solvent stability.

Interactive Systems Employing Robotic Companions

View page
US Patent:
20090055019, Feb 26, 2009
Filed:
May 8, 2008
Appl. No.:
12/117389
Inventors:
Walter Dan Stiehl - Somerville MA, US
Cynthia Breazeal - Cambridge MA, US
Jun Ki Lee - Cambridge MA, US
Allan Z. Maymin - Cos Cob CT, US
Heather Knight - Lexington MA, US
Robert L. Toscano - Chula Vista CA, US
Iris M. Cheung - Rochester MN, US
Assignee:
Massachusetts Institute of Technology - Cambridge MA
International Classification:
B25J 9/16
B25J 13/08
B25J 19/02
B25J 9/04
B25J 13/02
US Classification:
700249, 700264, 700254, 700258, 700259, 700260, 901 10, 901 17, 901 20, 901 30, 901 47, 901 50
Abstract:
An interactive system for interacting with a sentient being. The system includes a robotic companion of which the sentient being may be a user and an entity which employs the robot as a participant in an activity involving the user. The robotic companion responds to inputs from an environment that includes the user during the activity. The robotic companion is capable of social and affective behavior either under control of the entity or in response to the environment. The entity may provide an interface by which an operator may control the robotic companion. Example applications for the interactive system include as a system for communicating with patients that have difficulties communicating verbally, a system for teaching remotely-located students or students with communication difficulties, a system for facilitating social interaction between a remotely-located relative and a child, and systems in which the user and the robot interact with an entity such as a smart book. Also disclosed are control interfaces for the robotic companion, techniques for rendering the robotic companion sensitive to touch and responding to those touches, and techniques for providing quiet, back-drivable motion to components of the robotic companion.

Rain Water Collecting Device For Umbrellas

View page
US Patent:
53818121, Jan 17, 1995
Filed:
May 21, 1993
Appl. No.:
8/065433
Inventors:
Jun Lee - Flushing NY
International Classification:
A45B 2528
US Classification:
135 48
Abstract:
An inexpensive rain water collecting device which is easy to manufacture. The rain water collecting device provides an effective device which is adaptable to various umbrella tip sizes and avoids any bacterial growth problems. The rain water collecting device includes at least a reservoir having a first open end and a second open end, the first open end has an opening with an inner perimeter which is substantially equal to an outer perimeter of the umbrella tip, and the second open end has an opening with a perimeter which is greater than the inner perimeter of the opening of the first open end; a ferrule formed about the opening of the first open end; and at least one flow barrier about the second open end of the reservoir. After using an umbrella in the rain, it is collapsed. The rain water on the cloth of the umbrella then drains into the reservoir of the rain water collecting device.

Phosphorus Fugitive Emission Control

View page
US Patent:
20210384041, Dec 9, 2021
Filed:
Aug 19, 2021
Appl. No.:
17/406183
Inventors:
- Santa Clara CA, US
Timothy J. Miller - Ipswich MA, US
Jun Seok Lee - Andover MA, US
Il-Woong Koo - Andover MA, US
Deven Raj Mittal - Middleton MA, US
International Classification:
H01L 21/322
H01L 21/263
Abstract:
A method of processing and passivating an implanted workpiece is disclosed, wherein, after passivation, the fugitive emissions of the workpiece are reduced to acceptably low levels. This may be especially beneficial when phosphorus, arsine, germane or another toxic species is the dopant being implanted into the workpiece. In one embodiment, a sputtering process is performed after the implantation process. This sputtering process is used to sputter the dopant at the surface of the workpiece, effectively lowering the dopant concentration at the top surface of the workpiece. In another embodiment, a chemical etching process is performed to lower the dopant concentration at the top surface. After this sputtering or chemical etching process, a traditional passivation process can be performed.

System For Determining Cleaning Process Endpoint

View page
US Patent:
20210032746, Feb 4, 2021
Filed:
Jul 30, 2019
Appl. No.:
16/526310
Inventors:
- Santa Clara CA, US
Cuiyang Wang - Andover MA, US
Jun Seok Lee - Andover MA, US
International Classification:
C23C 16/44
G05B 23/02
G06K 9/62
Abstract:
A system for determining when a cleaning process has completed is disclosed. This system relies on an increase in the amount of gas in the processing chamber that occurs when the cleaning is complete. This increase in the amount of gas may be detected in several ways. In one embodiment, a downstream pendulum valve is used to maintain the pressure within the processing chamber at a predetermined value. An increase in the size of the opening in the pendulum valve is indicative of the amount of gas in the system. In another embodiment, a sensor may be used to monitor the pressure within the processing chamber, while the incoming and outgoing flow rates are held constant. An increase in the pressure is indicative of an increase in the amount of gas in the processing chamber. This increase in the amount of gas is used to terminate the cleaning process.

Phosphorus Fugitive Emission Control

View page
US Patent:
20200373170, Nov 26, 2020
Filed:
May 21, 2019
Appl. No.:
16/417853
Inventors:
- Santa Clara CA, US
Timothy J. Miller - Ipswich MA, US
Jun Seok Lee - Andover MA, US
Il-Woong Koo - Andover MA, US
Deven Raj Mittal - Middleton MA, US
International Classification:
H01L 21/322
Abstract:
A method of processing and passivating an implanted workpiece is disclosed, wherein, after passivation, the fugitive emissions of the workpiece are reduced to acceptably low levels. This may be especially beneficial when phosphorus, arsine, germane or another toxic species is the dopant being implanted into the workpiece. In one embodiment, a sputtering process is performed after the implantation process. This sputtering process is used to sputter the dopant at the surface of the workpiece, effectively lowering the dopant concentration at the top surface of the workpiece. In another embodiment, a chemical etching process is performed to lower the dopant concentration at the top surface. After this sputtering or chemical etching process, a traditional passivation process can be performed.

Techniques For Contact Formation In Self-Aligned Replacment Gate Device

View page
US Patent:
20190348509, Nov 14, 2019
Filed:
May 11, 2018
Appl. No.:
15/977324
Inventors:
- Gloucester MA, US
Wenhui Wang - Gloucester MA, US
Jun Lee - Andover MA, US
Sony Varghese - Manchester MA, US
Assignee:
Varian Semiconductor Equipment Associates, Inc. - Gloucester MA
International Classification:
H01L 29/40
H01L 29/66
H01L 21/28
H01L 21/321
H01L 29/49
Abstract:
A method may include providing a device structure, where the device structure includes a semiconductor region, and a gate structure, disposed over the semiconductor region. The gate structure may further include a gate metal. The method may further include oxidizing an upper portion of the gate metal, wherein the upper portion forms an oxide cap, and wherein a lower portion of the gate metal remains metallic.
Jun Chul Lee from Stoneham, MA, age ~46 Get Report