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Jane E Frommer

from San Jose, CA
Age ~71
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Also known as:
Jane Te Frommer, Jane F Frommer, Jane E F Boyer, Jane E Boyer, Jane F Boyer, Jane E F Boter
Phone and address:
18710 Vista De Almaden, San Jose, CA 95120
(408) 927-5998
Related to:
Emily Boyer, 37James Boyd, 69Chris Boyd, 40Christian Boyd, 41James A Boyd, 63
Connected to:
Allan D Frommert, 78Brittany Frommer, 29Cary D Frommer, 67Diandra M Frommer, 44Donald W Frommer, 102Frances M Frommer, 79Jeremy P Frommer, 55Joseph R Frommer, 102Karen B Frommer, 77Traci L Frommer, 36

Jane Frommer Phones & Addresses

  • 18710 Vista De Almaden, San Jose, CA 95120 (408) 927-5998 (408) 927-7879
  • San Diego, CA
  • Morgan Hill, CA
  • Framingham, MA

Publications

Us Patents

High Density Data Storage Medium

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US Patent:
7463572, Dec 9, 2008
Filed:
Aug 29, 2003
Appl. No.:
10/652421
Inventors:
Jane Frommer - San Jose CA, US
Robert D. Miller - San Jose CA, US
Craig Hawker - Los Gatos CA, US
Urs T. Duerig - Rueschlikon, CH
Bernd Gotsmann - Horgen, CH
Peter Vettiger - Langnau Am Albis, CH
Mark A. Lantz - Zurich, CH
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
G11B 9/00
US Classification:
369126
Abstract:
A data storage medium is disclosed from which information is reproduced by scanning a surface of the medium with a tip positioned in contact therewith. The medium includes a substrate and a polymer recording surface within which data bit values are determined by the topographical state at the bit location. The polymer contains thermally reversible crosslinkages.

High Density Data Storage Medium

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US Patent:
7471614, Dec 30, 2008
Filed:
Aug 29, 2003
Appl. No.:
10/652543
Inventors:
Jane Frommer - San Jose CA, US
Robert D. Miller - San Jose CA, US
Craig Hawker - Santa Barbara CA, US
Urs T. Duerig - Rueschlikon, CH
Bernd W Gotsmann - Horgen, CH
Peter Vettiger - Langnau Am Albis, CH
Gerd K. Binnig - Wollerau, CH
Victor Yee-Way Lee - San Jose CA, US
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
G11B 9/00
US Classification:
369126
Abstract:
A method reading, writing, and erasing data includes bringing a thermal-mechanical probe into proximity with a layer of cross-linked polymeric material to induce a deformed region at a point in the film, thereby writing information; bringing a thermal-mechanical probe into proximity with the deformed region, thereby reading information; and bringing a thermal-mechanical probe into proximity with the deformed region, further deforming it in such a way to eliminate the deformed region, thereby erasing the information; and repeating the storing, reading, and erasing steps at points in the film.

Scanning Probe-Based Lithography Method

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US Patent:
7491425, Feb 17, 2009
Filed:
Oct 29, 2004
Appl. No.:
10/978028
Inventors:
Michel Despont - Adliswil, CH
Urs T. Duerig - Rueschlikon, CH
Jane E. Frommer - San Jose CA, US
Bernd W. Gotsmann - Horgen, CH
James L. Hedrick - Pleasanton CA, US
Craig Jon Hawker - Los Gatos CA, US
Robert D. Miller - San Jose CA, US
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
B05D 3/06
US Classification:
427277, 427557, 427355, 427271, 977849, 977850, 977851, 977855, 977857
Abstract:
A resist medium in which features are lithographically produced by scanning a surface of the medium with an AFM probe positioned in contact therewith. The resist medium comprises a substrate; and a polymer resist layer within which features are produced by mechanical action of the probe. The polymer contains thermally reversible crosslinkages. Also disclosed is a method that generally includes scanning a surface of the polymer resist layer with an AFM probe positioned in contact with the resist layer, wherein heating the probe and a squashing-type mechanical action of the probe produces features in the layer by thermally reversing the crosslinkages.

High Density Data Storage Medium, Method And Device

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US Patent:
7558186, Jul 7, 2009
Filed:
Jan 2, 2007
Appl. No.:
11/618945
Inventors:
Richard Anthony DiPietro - Campbell CA, US
Urs T. Duerig - Rueschlikon, CH
Jane Elizabeth Frommer - San Jose CA, US
Bernd Walter Gotsmann - Horgan, CH
Erik Christopher Hagberg - Evansville IN, US
James Lupton Hedrick - Pleasanton CA, US
Armin W. Knoll - Adliswil, CH
Teddie Peregrino Magbitang - San Jose CA, US
Robert Dennis Miller - San Jose CA, US
Russell Clayton Pratt - Los Gatos CA, US
Charles Gordon Wade - Los Gatos CA, US
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
G11B 3/00
C08G 61/02
US Classification:
369127, 369129, 528 86
Abstract:
A composition of matter for the recording medium of nanometer scale thermo-mechanical information storage devices and a nanometer scale thermo-mechanical information storage device. The composition includes: one or more polyaryletherketone polymers, each of the one or more polyaryletherketone polymers having two terminal ends, each terminal end having two or more phenylethynyl moieties. The one or more polyaryletherketone polymers are thermally cured and the resulting cross-linked polyaryletherketone resin used as the recording layers in atomic force data storage devices.

Method And Apparatus To Separate Molecules According To Their Mobilities

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US Patent:
7579149, Aug 25, 2009
Filed:
Jan 31, 2005
Appl. No.:
11/047250
Inventors:
Jane E. Frommer - San Jose CA, US
Kerem Unal - San Jose CA, US
Hemantha K. Wickramasinghe - San Jose CA, US
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
C12Q 1/68
C12P 19/34
C12M 23/00
B01D 57/02
US Classification:
435 6, 435 911, 4352831, 204450
Abstract:
A method and apparatus for separating molecules comprises placing different kinds of molecular species onto a probe; and introducing an electric field between the probe and a surface in proximity with the probe so that the different kinds of molecular species may be separated, wherein the different kinds of molecular species have differing mobilities, and wherein the different kinds of molecular species may be separated according to their differing mobilities, such that molecular species that have different mobilities migrate along the probe at different speeds towards the surface. The molecular species may comprise molecules. Alternatively, the molecular species may comprise molecular assemblies, wherein the molecular assemblies may comprise at least one of cells, bacteria, and viruses.

Method For High Density Data Storage And Read-Back

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US Patent:
7723458, May 25, 2010
Filed:
Mar 25, 2008
Appl. No.:
12/054614
Inventors:
Richard Anthony DiPietro - Campbell CA, US
Urs T. Duerig - Rueschlikon, CH
Jane Elizabeth Frommer - San Jose CA, US
Bernd Walter Gotsmann - Horgen, CH
Erik Christopher Hagberg - Evansville IN, US
James Lupton Hedrick - Pleasanton CA, US
Armin W. Knoll - Zurich, CH
Teddie Peregrino Magbitang - San Jose CA, US
Robert Dennis Miller - San Jose CA, US
Russell Clayton Pratt - Los Gatos CA, US
Charles Gordon Wade - Los Gatos CA, US
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
C08G 8/02
C08G 14/00
C08L 29/00
C08L 31/00
G11B 9/00
G11B 3/00
US Classification:
528125, 525220, 369126, 369153, 369154
Abstract:
An approach is presented for designing a polymeric layer for nanometer scale thermo-mechanical storage devices. Cross-linked polyaryletherketone polymers are used as the recording layers in atomic force data storage devices, giving significantly improved performance when compared to previously reported cross-linked and linear polymers. The cross-linking of the polyaryletherketone polymers may be tuned to match thermal and force parameters required in read-write-erase cycles.

Protection Of Polymer Surfaces During Micro-Fabrication

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US Patent:
7749915, Jul 6, 2010
Filed:
Mar 31, 2008
Appl. No.:
12/058924
Inventors:
Ute Drechsler - Rueschlikon, CH
Urs T. Duerig - Rueschlikon, CH
Jane Elizabeth Frommer - San Jose CA, US
Bernd W. Gotsmann - Horgen, CH
James Lupton Hedrick - Pleasanton CA, US
Armin W. Knoll - Adliswil, DE
Tobias Kraus - Zurich, CH
Robert Dennis Miller - San Jose CA, US
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
H01L 21/308
H01L 21/311
H01L 21/312
US Classification:
438725, 438694, 438702, 438703, 438717, 438719, 438928, 216 49, 216 72, 216 79, 257E21254
Abstract:
A method of protecting a polymeric layer from contamination by a photoresist layer. The method includes: (a) forming a polymeric layer over a substrate; (b) forming a non-photoactive protection layer over the polymeric layer; (c) forming a photoresist layer over the protection layer; (d) exposing the photoresist layer to actinic radiation and developing the photoresist layer to form a patterned photoresist layer, thereby exposing regions of the protection layer; (e) etching through the protection layer and the polymeric layer where the protection layer is not protected by the patterned photoresist layer; (f) removing the patterned photoresist layer in a first removal process; and (g) removing the protection layer in a second removal process different from the first removal process.

Method For High Density Data Storage And Read-Back

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US Patent:
7811499, Oct 12, 2010
Filed:
Jun 26, 2006
Appl. No.:
11/474678
Inventors:
Richard Anthony DiPietro - Campbell CA, US
Urs T. Duerig - Rueschlikon, CH
Jane Elizabeth Frommer - San Jose CA, US
Bernd Walter Gotsmann - Horgen, CH
Erik Christopher Hagberg - Evansville IN, US
James Lupton Hedrick - Pleasanton CA, US
Armin W. Knoll - Zurich, CH
Teddie Peregrino Magbitang - San Jose CA, US
Robert Dennis Miller - San Jose CA, US
Russell Clayton Pratt - Los Gatos CA, US
Charles Gordon Wade - Los Gatos CA, US
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
B29C 45/76
US Classification:
264293, 264 401
Abstract:
An approach is presented for designing a polymeric layer for nanometer scale thermo-mechanical storage devices. Cross-linked polyaryletherketone polymers are used as the recording layers in atomic force data storage devices, giving significantly improved performance when compared to previously reported cross-linked and linear polymers. The cross-linking of the polyaryletherketone polymers may be tuned to match thermal and force parameters required in read-write-erase cycles.

Isbn (Books And Publications)

Interfacial Properties on the Submicron Scale

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Author

Jane Frommer

ISBN #

0841236917

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Jane E Frommer from San Jose, CA, age ~71 Get Report