Resumes
Resumes
Jacob Lipcon Phones & Addresses
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84 Webcowet Rd, Arlington, MA 02474
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4 Sweet Bay Ln, Lincoln, MA 01773 (781) 259-2900
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36 Spring Rd, Concord, MA 01742
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10 Wendell St, Cambridge, MA 02138
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Winchester, MA
Publications
Us Patents
Laser Spectral Engineering For Lithographic Process
View pageUS Patent:
6853653, Feb 8, 2005
Filed:
Dec 21, 2001
Appl. No.:
10/036925
Inventors:
Ronald L. Spangler - Arlington MA, US
Jacob P. Lipcon - Winchester MA, US
John A. Rule - Hingham MA, US
Robert N. Jacques - Andover MA, US
Armen Kroyan - San Diego CA, US
Ivan Lalovic - San Diego CA, US
Igor V. Fomenkov - San Diego CA, US
John M. Algots - San Diego CA, US
Jacob P. Lipcon - Winchester MA, US
John A. Rule - Hingham MA, US
Robert N. Jacques - Andover MA, US
Armen Kroyan - San Diego CA, US
Ivan Lalovic - San Diego CA, US
Igor V. Fomenkov - San Diego CA, US
John M. Algots - San Diego CA, US
Assignee:
Cymer, Inc. - San Diego CA
International Classification:
H01J003/10
US Classification:
372 20, 372 25, 372 30, 372 32
Abstract:
An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2. 0 millisecond.
Control System For A Two Chamber Gas Discharge Laser
View pageUS Patent:
7039086, May 2, 2006
Filed:
Jul 30, 2003
Appl. No.:
10/631349
Inventors:
John P. Fallon - Andover MA, US
John A. Rule - Hingham MA, US
Robert N. Jacques - San Diego CA, US
Jacob Lipcon - Winchester MA, US
Richard L. Sandstrom - Encinitas CA, US
William N. Partlo - Poway CA, US
Alexander I. Ershov - San Diego CA, US
Toshihiko Ishihara - San Diego CA, US
John Meisner - San Diego CA, US
Richard M. Ness - San Diego CA, US
Paul C. Melcher - El Cajon CA, US
John A. Rule - Hingham MA, US
Robert N. Jacques - San Diego CA, US
Jacob Lipcon - Winchester MA, US
Richard L. Sandstrom - Encinitas CA, US
William N. Partlo - Poway CA, US
Alexander I. Ershov - San Diego CA, US
Toshihiko Ishihara - San Diego CA, US
John Meisner - San Diego CA, US
Richard M. Ness - San Diego CA, US
Paul C. Melcher - El Cajon CA, US
Assignee:
Cymer, Inc. - San Diego CA
International Classification:
H01S 3/22
US Classification:
372 55, 372 57
Abstract:
The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) Finjection controls with novel learning algorithm.
Control System For A Two Chamber Gas Discharge Laser
View pageUS Patent:
7079564, Jul 18, 2006
Filed:
Jul 14, 2005
Appl. No.:
11/181258
Inventors:
John P. Fallon - Andover MA, US
John A. Rule - Hingham MA, US
Robert N. Jacques - San Diego CA, US
Jacob P. Lipcon - Arlington MA, US
William N. Partlo - Poway CA, US
Alexander I. Ershov - San Diego CA, US
Toshihiko Ishihara - San Diego CA, US
John Meisner - San Diego CA, US
Richard M. Ness - San Diego CA, US
Paul C. Melcher - El Cajon CA, US
John A. Rule - Hingham MA, US
Robert N. Jacques - San Diego CA, US
Jacob P. Lipcon - Arlington MA, US
William N. Partlo - Poway CA, US
Alexander I. Ershov - San Diego CA, US
Toshihiko Ishihara - San Diego CA, US
John Meisner - San Diego CA, US
Richard M. Ness - San Diego CA, US
Paul C. Melcher - El Cajon CA, US
Assignee:
Cymer, Inc. - San Diego CA
International Classification:
H01S 3/22
US Classification:
372 55
Abstract:
The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) Finjection controls with novel learning algorithm.
Laser Spectral Engineering For Lithographic Process
View pageUS Patent:
7298770, Nov 20, 2007
Filed:
Aug 5, 2004
Appl. No.:
10/912933
Inventors:
Ronald L. Spangler - Arlington MA, US
Jacob P. Lipcon - Winchester MA, US
John A. Rule - Hingham MA, US
Robert N. Jacques - La Jolla CA, US
Armen Kroyan - San Diego CA, US
Ivan Lalovic - San Diego CA, US
Igor V. Fomenkov - San Diego CA, US
John M. Algots - San Diego CA, US
Jacob P. Lipcon - Winchester MA, US
John A. Rule - Hingham MA, US
Robert N. Jacques - La Jolla CA, US
Armen Kroyan - San Diego CA, US
Ivan Lalovic - San Diego CA, US
Igor V. Fomenkov - San Diego CA, US
John M. Algots - San Diego CA, US
Assignee:
Cymer, Inc. - San Diego CA
International Classification:
H01S 3/22
H01S 3/223
H01S 3/10
H01S 3/13
H01S 3/223
H01S 3/10
H01S 3/13
US Classification:
372 55, 372 9, 372 20, 372 23, 372 24, 372 25, 372 32, 372 57
Abstract:
An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2. 0 millisecond.
Laser Spectral Engineering For Lithographic Process
View pageUS Patent:
7382815, Jun 3, 2008
Filed:
Aug 9, 2004
Appl. No.:
10/915517
Inventors:
Ronald L. Spangler - Arlington MA, US
Jacob P. Lipcon - Winchester MA, US
John A. Rule - Hingham MA, US
Robert N. Jacques - La Jolla CA, US
Armen Kroyan - San Diego CA, US
Ivan Lalovic - San Diego CA, US
Igor V. Fomenkov - San Diego CA, US
John M. Algots - San Diego CA, US
Jacob P. Lipcon - Winchester MA, US
John A. Rule - Hingham MA, US
Robert N. Jacques - La Jolla CA, US
Armen Kroyan - San Diego CA, US
Ivan Lalovic - San Diego CA, US
Igor V. Fomenkov - San Diego CA, US
John M. Algots - San Diego CA, US
Assignee:
Cymer, Inc. - San Diego CA
International Classification:
H01S 5/00
US Classification:
372 55, 372 57
Abstract:
An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2. 0 millisecond.
Control System For A Two Chamber Gas Discharge Laser
View pageUS Patent:
7596164, Sep 29, 2009
Filed:
Mar 15, 2006
Appl. No.:
11/376364
Inventors:
John P. Fallon - Andover MA, US
John A. Rule - Hingham MA, US
Robert N. Jacques - San Diego CA, US
Jacob P. Lipcon - Arlington MA, US
William N. Partlo - Poway CA, US
Alexander I. Ershov - San Diego CA, US
Toshihiko Ishihara - San Diego CA, US
John Meisner - San Diego CA, US
Richard M. Ness - San Diego CA, US
Paul C. Melcher - El Cajon CA, US
John A. Rule - Hingham MA, US
Robert N. Jacques - San Diego CA, US
Jacob P. Lipcon - Arlington MA, US
William N. Partlo - Poway CA, US
Alexander I. Ershov - San Diego CA, US
Toshihiko Ishihara - San Diego CA, US
John Meisner - San Diego CA, US
Richard M. Ness - San Diego CA, US
Paul C. Melcher - El Cajon CA, US
Assignee:
Cymer, Inc. - San Diego CA
International Classification:
H01S 3/223
US Classification:
372 57, 372 55
Abstract:
The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) Finjection controls with novel learning algorithm.
Laser Wavelength Control Unit With Piezoelectric Driver
View pageUS Patent:
20020154669, Oct 24, 2002
Filed:
Dec 21, 2001
Appl. No.:
10/027210
Inventors:
Ronald Spangler - Arlington MA, US
Robert Jacques - Andover MA, US
John Rule - Hingham MA, US
Frederick Palenschat - Lemon Grove CA, US
Igor Fomenkov - San Diego CA, US
John Algots - San Diego CA, US
Jacob Lipcon - Winchester MA, US
Richard Sandstrom - Encinitas CA, US
Robert Jacques - Andover MA, US
John Rule - Hingham MA, US
Frederick Palenschat - Lemon Grove CA, US
Igor Fomenkov - San Diego CA, US
John Algots - San Diego CA, US
Jacob Lipcon - Winchester MA, US
Richard Sandstrom - Encinitas CA, US
International Classification:
H01S003/223
H01S003/22
H01S003/13
H01S003/22
H01S003/13
US Classification:
372/055000, 372/032000
Abstract:
An electric discharge laser with fast wavelength correction. Fast wavelength correction equipment includes at least one piezoelectric drive and a fast wavelength measurement system and fast feedback response times. In a preferred embodiment, equipment is provided to control wavelength on a slow time frame of several milliseconds, on a intermediate time from of about one to five milliseconds and on a very fast time frame of a few microseconds. Preferred techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver for tuning the laser wavelength using a tuning mirror. A preferred control technique is described (utilizing a very fast wavelength monitor) to provide the slow and intermediate wavelength control with the combination of a stepper motor and a piezoelectric driver. Very fast wavelength control is provided with a piezoelectric load cell in combination with the piezoelectric driver. Preferred embodiments provide () fast feedback control based on wavelength measurements, () fast vibration control, () active damping using the load cell and an active damping module, () transient inversion using feed forward algorithms based on historical burst data. A preferred embodiment adapts the feed forward algorithms to current conditions. Another preferred embodiment measures tuning mirror position to permit wavelength pretuning and active wavelength tuning.
Robot Arm With Unequal Link Lengths And Variable Non-Linear Wrist Orientation
View pageUS Patent:
20230032442, Feb 2, 2023
Filed:
Oct 14, 2022
Appl. No.:
17/965907
Inventors:
- Wakefield MA, US
Martin Hosek - Lowell MA, US
Jacob Lipcon - Arlington MA, US
Martin Hosek - Lowell MA, US
Jacob Lipcon - Arlington MA, US
International Classification:
B25J 9/04
B25J 9/10
H01L 21/677
B25J 11/00
B25J 9/10
H01L 21/677
B25J 11/00
Abstract:
A substrate transport arm including a first link; a second link rotatably connected to the first link; a third link rotatably connected to the second link at a wrist joint; and a mechanical transmission having a pulley. The third link includes an end effector configured to support a substrate thereon. The mechanical transmission is connected to the third link to control rotation of the third link on the second link. The mechanical transmission is configured to control rotation of the third link as a function of an angle between the first and second links such that, as the first and second links are rotated relative to each other, the wrist joint follows a wrist path which includes a curved portion, and where a center of the substrate supported on the end effector is moved along a substantially straight substrate path as the wrist joint follows the curved portion.