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Irene J Hsu

from Bryn Mawr, PA
Age ~44
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Also known as:
Irene Su
Phone and address:
12 Arthur Rd, Rosemont, PA 19010
Related to:
Elias I Hsu, 48Eliot I Hsu, 47
Connected to:
Abby C Hsu, 40Alyssa Y Hsu, 51Andro R Hsu, 48Annie C Hsu, 47Athena Hsu, 51Audrey Hsu, 30Ava A Hsu, 69Billy H Hsu, 63Brittni E Hsu, 36Catherine Hsu, 52

Irene Hsu Phones & Addresses

  • 12 Arthur Rd, Bryn Mawr, PA 19010
  • Wilmington, DE
  • Conshohocken, PA
  • 73 Alexis Dr, Newark, DE 19702
  • 682 John Christian Dr, Bridgewater, NJ 08807
  • Cockeysville, MD
  • Cranford, NJ
  • Baltimore, MD
  • Avenel, NJ

Work

Company: Evonik 2017 Position: Ad and ts manager - insulation americas

Education

Degree: Doctorates, Doctor of Philosophy School / High School: University of Delaware 2009 to 2011 Specialities: Chemical Engineering

Skills

Chemistry • Characterization • Thin Films • Scanning Electron Microscopy • Powder X Ray Diffraction • Nanotechnology • R&D • Chemical Engineering • Fuel Cells • Surface Chemistry • Atomic Layer Deposition • Materials Science • Spectroscopy • Electroplating • Heterogeneous Catalysis • Polymers

Industries

Research

Resumes

Resumes

Irene Hsu Photo 1

Ad And Ts Manager - Insulation Americas

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Location:
165 east 9Th Ave, Runnemede, NJ 08078
Industry:
Research
Work:
Evonik
Ad and Ts Manager - Insulation Americas
Air Products
Spray Polyurethane Foam Applications Development Engineer
Air Products Sep 2011 - Dec 2014
Phd Career Development Program, Senior Research Engineer
University of Delaware Sep 2006 - Aug 2011
Research Assistant
Merck Jun 2003 - Aug 2006
Engineer - Technical Operations
Education:
University of Delaware 2009 - 2011
Doctorates, Doctor of Philosophy, Chemical Engineering University of Delaware 2009 - 2009
Master of Science, Masters, Chemical Engineering The Johns Hopkins University 1999 - 2003
Bachelors, Bachelor of Science, Chemical Engineering
Skills:
Chemistry
Characterization
Thin Films
Scanning Electron Microscopy
Powder X Ray Diffraction
Nanotechnology
R&D
Chemical Engineering
Fuel Cells
Surface Chemistry
Atomic Layer Deposition
Materials Science
Spectroscopy
Electroplating
Heterogeneous Catalysis
Polymers

Publications

Us Patents

Silicon Precursors And Compositions Comprising Same For Depositing Low Dielectric Constant Films

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US Patent:
20130260575, Oct 3, 2013
Filed:
Feb 22, 2013
Appl. No.:
13/773931
Inventors:
Raymond Nicholas Vrtis - Orefield PA, US
Irene Joann Hsu - Conshohocken PA, US
Assignee:
AIR PRODUCTS AND CHEMICALS, INC. - Allentown PA
International Classification:
H01L 21/02
US Classification:
438789, 106122
Abstract:
A chemical vapor deposition method for producing a porous organosilica glass film comprising: introducing into a reaction chamber gaseous reagents comprising a porogenated precursor; optionally a structure former precursor selected from the group consisting an organosilane, an organosiloxane, and combinations thereof; and optionally a porogen precursor; applying an energy source to the gaseous reagents in the chamber to induce reaction of the gaseous reagents to deposit a preliminary film on the substrate, wherein the preliminary film contains the porogen; and removing from the preliminary film at least a portion of the porogen to provide the porous film with pores and a dielectric constant less than 2.6.

Amine Composition Useful For Making Polyurethane Foam

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US Patent:
20180009930, Jan 11, 2018
Filed:
Jul 11, 2017
Appl. No.:
15/647009
Inventors:
- Essen, DE
Juan Jesus Burdeniuc - Colmar PA, US
Irene Joann Hsu - Bryn Mawr PA, US
Renee Jo Keller - Orwigsburg PA, US
Timothy Joseph Miller - Northampton PA, US
Jared Denis Bender - Breinigsville PA, US
Jane Kniss - Kempton PA, US
International Classification:
C08G 18/20
C08G 18/22
C08G 101/00
Abstract:
A catalyst composition for making polyurethane foam, the catalyst composition including a compound having a general formula RRRN, wherein each of R, Rand Rare independently selected from the group consisting of:wherein n=1 to 5; and R4, R5 and R6 are each independently hydrogen, methyl, ethyl and propyl groups; hydrogen, a C1-C6 alkyl group compound, a C1-C6 cycloalkyl group compound, a C1-C6 alkenyl group compound, a C1-C6 alkynyl group compound, a C1-C6 aryl group compound, and a C1-C6 aralkyl group compound, each group being substituted or unsubstituted; wherein at least one of R, Rand Ris a compound according to formula (I). A polyurethane composition and method for forming a polyurethane foam are also disclosed.
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Irene J Hsu from Bryn Mawr, PA, age ~44 Get Report