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Ilya L Rushkin

from Acton, MA
Age ~57
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Also known as:
Il Ya Rushkin, Llya Rushkin, Ilya N
Phone and address:
3 Beechnut St, Acton, MA 01720
(978) 263-7297
Related to:
Stanley Chen
Connected to:
Edward C Rushkowski, 91Paula L Rushlau, 55Paige N Rushlo, 35Angela A Rushlow, 57Denise Rushlow, 60Derric I Rushlow, 54Keith B Rushlow, 64Kris E Rushlow, 61Linda S Rushlow, 82Michael A Rushlow, 44

Ilya Rushkin Phones & Addresses

  • 3 Beechnut St, Acton, MA 01720 (978) 263-7297
  • 6 Lois Dr, Walpole, MA 02081 (508) 668-7294
  • 9 Berkeley St, West Warwick, RI 02893
  • Bridgewater, NJ
  • New Providence, NJ
  • Troy, NY
  • Watervliet, NY
  • Albany, NY
  • 3 Beechnut St, Acton, MA 01720 (508) 633-9828

Work

Company: Desktop metal Apr 2018 Position: Lead fluid chemist

Education

Degree: Doctorates, Doctor of Philosophy Specialities: Chemistry

Skills

Polymers • R&D • Coatings • Materials • Materials Science • Product Development • Polymer Science • Plastics • Adhesives • Polymer Chemistry • Characterization • Chemistry • Composites • Testing • Polymer Characterization • Formulation

Industries

Plastics

Resumes

Resumes

Ilya Rushkin Photo 1

Lead Fluid Chemist

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Location:
3 Beechnut St, Acton, MA 01720
Industry:
Plastics
Work:
Desktop Metal
Lead Fluid Chemist
Flexcon Mar 2012 - Mar 2018
Senior Chemist and Scientist
Dymax Aug 2010 - Nov 2011
R and D Director
Saint-Gobain Performance Plastics Jun 2006 - Aug 2010
Technology Manager
Fujifilm Electronic Materials Sep 1999 - Jun 2006
Research Associate
Education:
University at Albany, Suny 1992 - 1994
Master of Science, Masters, Chemistry
Skills:
Polymers
R&D
Coatings
Materials
Materials Science
Product Development
Polymer Science
Plastics
Adhesives
Polymer Chemistry
Characterization
Chemistry
Composites
Testing
Polymer Characterization
Formulation

Publications

Us Patents

Stable Non-Photosensitive Polyimide Precursor Compositions For Use In Bilayer Imaging Systems

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US Patent:
7018776, Mar 28, 2006
Filed:
Dec 10, 2003
Appl. No.:
10/732734
Inventors:
Ilya Rushkin - Walpole MA, US
Ahmad A. Naiini - Greenwich RI, US
William D. Weber - Rumford RI, US
Don Perry - North Providence RI, US
Richard Hopla - Cranston RI, US
Assignee:
Arch Specialty Chemicals, Inc. - Norwalk CT
International Classification:
G03C 1/795
G03F 7/09
G03F 7/20
G03F 7/30
G03F 7/38
G03F 7/40
US Classification:
4302711, 430325, 430326, 430327, 430329, 430330, 430331
Abstract:
Stable non-photosensitive polyimide precursor compositions with an adhesion promoter in a non-NMP solvent for use in forming high temperature resistant relief images and a process for making said images. The non-photosensitive polyimide precursor compositions comprise.

Photosensitive Resin Compositions

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US Patent:
7101652, Sep 5, 2006
Filed:
Mar 9, 2004
Appl. No.:
10/796587
Inventors:
Ahmad A. Naiini - East Greenwich RI, US
Ilya Rushkin - Walpole MA, US
Richard Hopla - Cranston RI, US
Donald Racicot - Providence RI, US
Assignee:
Arch Specialty Chemicals, Inc. - Norwalk CT
International Classification:
G03F 7/023
G03F 7/30
US Classification:
430190, 430 18, 430191, 430192, 430193, 430326, 528335, 528338, 528339, 528340, 528347, 528348
Abstract:
New photosensitive PBO precursor polymers which contain diazoquinone moieties attached to its backbone and in which all amino end groups are converted into amide groups. The photosensitive formulation based on the disclosed PBO precursor polymers have good imaging and mechanical properties as well as superior shelf life stability. Photosensitive polybenzoxazole precursor polymers having (sulfon)amide end groups (with or without attached diazoquinone groups) can be formulated into photosensitive compositions with diazoquinone photoactive compounds which lack benzylic hydrogens on the backbone to yield compositions producing films significantly lighter in color after curing.

Photosensitive Resin Compositions

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US Patent:
7129011, Oct 31, 2006
Filed:
Jun 3, 2004
Appl. No.:
10/860783
Inventors:
Ilya Rushkin - Walpole MA, US
Ahmad A. Naiini - East Greenwich RI, US
Richard Hopla - Cranston RI, US
Pamela J. Waterson - Northbridge MA, US
William D. Weber - Rumford RI, US
David B. Powell - Minnetonka MN, US
Assignee:
Arch Specialty Chemicals, Inc. - Norwalk CT
International Classification:
G03F 7/004
G03F 7/30
US Classification:
430 18, 4302701, 430325, 430330, 430905
Abstract:
A heat resistant negative working photosensitive composition that comprises.

Positive Photosensitive Resin Compositions

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US Patent:
7132205, Nov 7, 2006
Filed:
Jun 3, 2004
Appl. No.:
10/860784
Inventors:
Ilya Rushkin - Walpole MA, US
Ahmad A. Naiini - East Greenwich RI, US
Richard Hopla - Cranston RI, US
Pamela J. Waterson - Northbridge MA, US
William D. Weber - Rumford RI, US
Assignee:
Arch Specialty Chemicals, Inc. - Norwalk CT
International Classification:
G03F 7/004
G03F 7/30
US Classification:
430 18, 4302701, 430320, 430326, 430330, 430906
Abstract:
An end-capped polybenzoxazole precursor having acid labile functional groups, positive working photosensitive compositions thereof and use of the compositions for producing heat resistant relief images on substrates.

Photosensitive Resin Compositions

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US Patent:
7195849, Mar 27, 2007
Filed:
Mar 4, 2004
Appl. No.:
10/793341
Inventors:
Ahmad A. Naiini - East Greenwich RI, US
Pamela J. Waterson - Northbridge MA, US
William D. Weber - Rumford RI, US
Ilya Rushkin - Walpole MA, US
Richard Hopla - Cranston RI, US
Jon Metivier - Billerica MA, US
Assignee:
Arch Specialty Chemicals, Inc. - Norwalk CT
International Classification:
G03F 7/023
G03F 7/30
US Classification:
430 18, 430190, 430191, 430192, 430193, 430326, 430330
Abstract:
A positive photosensitive resin composition comprising:.

Thermally Stable Composite Material Formed Of Polyimide

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US Patent:
8309645, Nov 13, 2012
Filed:
Oct 4, 2007
Appl. No.:
11/867520
Inventors:
Gwo S. Swei - Vandalia OH, US
Ilya L. Rushkin - Acton MA, US
Pawel Czubarow - Wellesley MA, US
David Worth House - Arlington Heights IL, US
David DeCoster - Barrington RI, US
Olivier Guiselin - Northboro MA, US
Assignee:
Saint-Gobain Performance Plastics Corporation - Aurora OH
International Classification:
C08K 3/04
US Classification:
524496, 524405, 524409, 524414, 524495
Abstract:
A composite material includes a polyimide matrix material and an exfoliated graphite material dispersed within the polyimide matrix material. The composite material exhibits a Thermal Stability Index of at least about 20 and has a particle distribution in which 90% of the particles have a particle size not greater than 500 micrometers.

Free-Acid Containing Polymers And Their Use In Photoresists

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US Patent:
20030064321, Apr 3, 2003
Filed:
Aug 28, 2002
Appl. No.:
10/229771
Inventors:
Sanjay Malik - Attleboro MA, US
Ilya Rushkin - Walpole MA, US
Gregory Spaziano - Providence RI, US
David Brzozowy - Bristol RI, US
Art Medina - Duluth GA, US
Assignee:
ARCH SPECIALTY CHEMICALS, INC. - NORWALK CT
International Classification:
G03F007/038
G03F007/30
US Classification:
430/270100, 430/325000
Abstract:
An improved binder resist for use in radiation sensitve photoresist compositions comprises a polymer having monomeric units of (a) carboxylic anhydride units, (b) alkenyl silane units and (c) units containing an acid labile group, and wherein the polymer contains from about 1 to about 3 mol % of free acid wherein the free acid is provided either by the presence in the polymer of a futher monomeric unit having free acids groups or by hydrolysis of sufficient of the carboxylic anhydride monomeric unit.

Novel Beta-Oxo Compounds And Their Use In Photoresist

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US Patent:
20030078354, Apr 24, 2003
Filed:
Feb 21, 2002
Appl. No.:
10/081732
Inventors:
Art Medina - Duluth GA, US
Ilya Rushkin - Walpole MA, US
Gregory Spaziano - Providence RI, US
David Brzozowy - Bristol RI, US
Assignee:
ARCH SPECIALTY CHEMICALS, INC. - NORWALK CT
International Classification:
G03F007/038
G03F007/38
C08F224/00
C08F234/02
G03C001/492
G03C001/76
US Classification:
526/266000, 430/270100, 430/325000, 430/905000, 526/268000, 526/270000
Abstract:
Polymers comprising monomeric units of acid sensitive (acid labile) monomers and from about 2 to about 20% by weight of monomeric units of -oxo ester containing monomers, wherein the -oxo ester containing monomers are free of lactams or lactones, are useful as binder resins in radiation sensitive photoresist compositions for producing a resist image on a substrate.
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Ilya L Rushkin from Acton, MA, age ~57 Get Report