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Hyesog Lee

from Pleasanton, CA
Age ~47
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Also known as:
Hye S Lee, Joe Lee Hyesog, Lee Hyesog
Related to:
Hyun R Lee, 58Kum Ye Lee, 75Matthew Ilsuk LeeJee LeeEun S Lee, 49Woo B Lee, 78Ki LeeKyuin LeeDong J Shin, 81Il S Lee, 62Hwa Lee Dong, 79Sung H Lee, 49Jaesook B Lee, 92
Connected to:
A Lee, 45Abi A Lee, 31Abigail LeeAbu B Lee, 66Adela C Lee, 64Adelyn S Lee, 39Adrian J Lee, 36Adriane C Lee, 57Aen H Lee, 44Aeren Lee, 33

Hyesog Lee Phones & Addresses

  • Pleasanton, CA
  • San Jose, CA
  • Orange, CA
  • Norwalk, CA
  • Buena Park, CA
  • Cerritos, CA
  • El Cerrito, CA
  • Anaheim, CA
  • Los Angeles, CA
  • La Mirada, CA

Work

Company: Tanner research 2007 Position: Research scientist

Education

School / High School: Mechanical Engineering Department University of California at Los Angeles- Los Angeles, CA 2003 Specialities: Ph.D. in Nano/Micro fabrication, Nanophotonics, Microscopic Imaging, Plasmonics

Resumes

Resumes

Hyesog Lee Photo 1

Hyesog (Joe) Lee Orange, CA

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Work:
Tanner Research

2007 to Present
Research Scientist
UC Berkeley

May 2003 to Aug 2007
Graduate Student Researcher
Education:
Mechanical Engineering Department University of California at Los Angeles
Los Angeles, CA
2003 to 2007
Ph.D. in Nano/Micro fabrication, Nanophotonics, Microscopic Imaging, Plasmonics
University of California Los Angeles
Los Angeles, CA
2001 to 2003
M.S. in Mechanical Engineering
Mechanical Engineering Department University of California at Los Angeles
Los Angeles, CA
1997 to 2001
B.S. in Mechanical Engineering

Publications

Us Patents

Far-Field Superlensing

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US Patent:
20110188032, Aug 4, 2011
Filed:
Feb 4, 2010
Appl. No.:
12/658342
Inventors:
Ravi Verma - La Canada CA, US
Hyesog Lee - Norwalk CA, US
International Classification:
G01N 21/00
G02B 3/00
G02B 27/56
US Classification:
3562372, 359642, 359586, 359580
Abstract:
An apparatus for creating a sub-wavelength image in the farfield. In an example embodiment, the apparatus includes a far-field superlens that is adapted to generate a sub-wavelength image or a sub-diffraction-limited image at a far field distance from a negative-index material included in the superlens. The example far-field superlens includes a positive-index material and an adjacent positive-index material. The negative-index material has an output aperture at a first surface. A second surface or interface is positioned at a far field distance from the negative-index material such that a cavity or gap is formed between the second surface and the first surface, wherein the second surface represents an imaging surface. The gap may be filled with a dielectric material or may include a vacuum or air. In a more specific embodiment, the superlens further includes a first mechanism for producing one or more sub-diffraction-limited beam features at a far field distance from the negative-index layer via the cavity in which propagating electromagnetic energy from the incident electromagnetic energy propagates.

Superlens And Lithography Systems And Methods Using Same

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US Patent:
20100033701, Feb 11, 2010
Filed:
Aug 8, 2008
Appl. No.:
12/228113
Inventors:
Hyesog Lee - Buena Park CA, US
Massimo A. Sivilotti - Sierra Madre CA, US
Ravi K. Verma - Pasadena CA, US
International Classification:
G03B 27/54
G03B 27/32
US Classification:
355 67, 355 77
Abstract:
A superlens that includes, in one example embodiment, a positive-index material adjacent to a negative-index material, wherein the negative-index material includes aluminum. In a more specific embodiment, the positive-index material includes a dielectric layer, such as Poly(Methyl MethAcrylate) (PMMA), which is less than 50 nanometers thick. The negative-index material includes a smoothed aluminum layer less than 50 nanometers thick. The aluminum layer is disposed on the dielectric layer or vice versa, forming a superlens comprising the aluminum layer and the dielectric layer. In another embodiment, the superlens further includes plural aluminum layers separated by one or more layers of positive-index material. A mask is adjacent to the positive-index material. The mask may include one or more features that extend into a transparent substrate. The mask is positioned so that the positive-index material separates the mask from the smoothed aluminum layer. In an illustrative embodiment, the superlens is adapted for use with thermal lithography using nanoparticles.

Evacuated Periodic Structures And Methods Of Manufacturing

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US Patent:
20220283376, Sep 8, 2022
Filed:
Mar 7, 2022
Appl. No.:
17/653818
Inventors:
- Sunnyvale CA, US
Alastair John Grant - San Jose CA, US
Milan Momcilo Popovich - Leicester, GB
Shibu Abraham - Sunnyvale CA, US
Baeddan George Hill - Sunnyvale CA, US
Tsung-Jui Ho - Sunnyvale CA, US
Michiel Koen Callens - Sunnyvale CA, US
Hyesog Lee - Sunnyvale CA, US
Assignee:
DigiLens Inc. - Sunnyvale CA
International Classification:
G02B 6/34
G02B 5/18
G02B 5/32
G03H 1/02
G03H 1/04
H01L 51/52
Abstract:
Improvements to gratings for use in waveguides and methods of producing them are described herein. Deep surface relief gratings (SRGs) may offer many advantages over conventional SRGs, an important one being a higher S-diffraction efficiency. In one embodiment, deep SRGs can be implemented as polymer surface relief gratings or evacuated periodic structures (EPSs). EPSs can be formed by first recording a holographic polymer dispersed liquid crystal (HPDLC) periodic structure. Removing the liquid crystal from the cured periodic structure provides a polymer surface relief grating. Polymer surface relief gratings have many applications including for use in waveguide-based displays.

Evacuated Periotic Structures And Methods Of Manufacturing

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US Patent:
20220283378, Sep 8, 2022
Filed:
May 13, 2022
Appl. No.:
17/663322
Inventors:
- Sunnyvale CA, US
Alastair John Grant - San Jose CA, US
Milan Momcilo Popovich - Leicester, GB
Shibu Abraham - Sunnyvale CA, US
Baeddan George Hill - Sunnyvale CA, US
Tsung-Jui Ho - Sunnyvale CA, US
Michiel Koen Callens - Sunnyvale CA, US
Hyesog Lee - Sunnyvale CA, US
Assignee:
DigiLens Inc. - Sunnyvale CA
International Classification:
G02B 6/34
G03H 1/04
G02B 5/18
G02B 5/32
G03H 1/02
H01L 51/52
Abstract:
Improvements to gratings for use in waveguides and methods of producing them are described herein. Deep surface relief gratings (SRGs) may offer many advantages over conventional SRGs, an important one being a higher S-diffraction efficiency. In one embodiment, deep SRGs can be implemented as polymer surface relief gratings or evacuated periodic structures (EPSs). EPSs can be formed by first recording a holographic polymer dispersed liquid crystal (HPDLC) periodic structure. Removing the liquid crystal from the cured periodic structure provides a polymer surface relief grating. Polymer surface relief gratings have many applications including for use in waveguide-based displays.

Piecewise Rolled Vector Gratings And Methods Of Fabrication

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US Patent:
20230061090, Mar 2, 2023
Filed:
Aug 26, 2022
Appl. No.:
17/822625
Inventors:
- Sunnyvale CA, US
Alastair John Grant - San Jose CA, US
Roger Allen Conley Smith - Sunnyvale CA, US
Hyesog Lee - Sunnyvale CA, US
Michiel Koen Callens - Sunnyvale CA, US
Assignee:
DigiLens Inc. - Sunnyvale CA
International Classification:
G02F 1/1334
G02B 5/32
G03H 1/02
Abstract:
Various embodiments of this disclosure relate to a piecewise varying rolled K-vector grating structure including: a first grating section containing a grating with a first K-vector, a second grating section containing a grating with a second K-vector; and a first boundary region positioned between the first grating section and the second grating section. The first boundary region is a multiplexed grating region including both the first K-vector and the second K-vector. Further disclosed is a method for recording such a grating structure utilizing a holographic recording process. Providing a multiplexed grating in the first boundary region may largely remove line exposure artifacts between adjacent sections of the P-RKV grating.

Waveguides Incorporating Transmissive And Reflective Gratings And Related Methods Of Manufacturing

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US Patent:
20200386947, Dec 10, 2020
Filed:
Jun 8, 2020
Appl. No.:
16/895856
Inventors:
- Sunnyvale CA, US
Alastair John Grant - San Jose CA, US
Hyesog Lee - Sunnyvale CA, US
Gerald Buxton - Sunnyvale CA, US
Milan Momcilo Popovich - Leicester, GB
Assignee:
DigiLens Inc. - Sunnyvale CA
International Classification:
G02B 6/35
F21V 8/00
G02B 6/02
G02B 27/00
Abstract:
Multiplexed reflection and transmission gratings, and methods of their manufacture, are provided that improve uniformity with laser light, that is, reduced banding and other illumination artifacts occurring in waveguides. The mechanism for this can be the multiple reflections between the waveguide reflecting surfaces and the reflection hologram, which promote illumination averaging as beam propagation processes within a waveguide. In some gratings, a beam splitter layer overlapping the multiplexed gratings can be provided for the purposes of reducing banding in a laser-illuminated waveguide. The beam splitter can be provided by one or more dielectric layers. The beamsplitter can have sensitivity to one polarization. The beamsplitter can be sensitive to S-polarization. The beam splitter can be an anti-reflection coating optimized for normal incidence that becomes reflective at high TIR angles when immersed in glass or plastic.
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Hyesog Lee from Pleasanton, CA, age ~47 Get Report