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Goji Wakamatsu

from San Jose, CA
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Related to:
Noriko Wakamatsu
Connected to:
Shalaka S Wakankar, 56Yuki Wakano, 50Setsuko Wakao, 50Naomi N Wakatake, 63Lisa N Wakatani, 59Karen S Wakayama, 57Tiffany Y Wakayama, 38Wayne K Wakayama, 65Caroline M Wake, 81Evan T Wake, 42

Goji Wakamatsu Phones & Addresses

  • San Jose, CA

Publications

Us Patents

Cleaning Method Of Immersion Liquid, Immersion Liquid Cleaning Composition, And Substrate

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US Patent:
20130220930, Aug 29, 2013
Filed:
Apr 4, 2013
Appl. No.:
13/856442
Inventors:
JSR Corporation - , US
Goji WAKAMATSU - Sunnyvale CA, US
Assignee:
JSR Corporation - Tokyo
International Classification:
B01D 15/00
C08K 5/07
C08K 5/103
US Classification:
210660, 524317, 2105021
Abstract:
A cleaning method of an immersion liquid includes supplying an immersion liquid on a surface of a cleaning substrate. The immersion liquid is to be used in a liquid immersion lithography apparatus. The cleaning substrate has a substrate and an organic film laminated on a top face side of the substrate. The immersion liquid is allowed to move on the substrate to remove contaminants from the immersion liquid.

Cleaning Method Of Immersion Liquid, Immersion Liquid Cleaning Composition, And Substrate

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US Patent:
20130213894, Aug 22, 2013
Filed:
Feb 17, 2012
Appl. No.:
13/398847
Inventors:
Kentaro HARADA - Sunnyvale CA, US
Goji Wakamatsu - Sunnyvale CA, US
Assignee:
JSR Corporation - Tokyo
International Classification:
B01J 20/26
B01D 15/00
US Classification:
210660, 502402
Abstract:
A cleaning method of an immersion liquid includes supplying an immersion liquid on a surface of a cleaning substrate. The immersion liquid is to be used in a liquid immersion lithography apparatus. The cleaning substrate has a substrate and an organic film laminated on a top face side of the substrate. The immersion liquid is allowed to move on the substrate to remove contaminants from the immersion liquid.

Cleaning Method Of Immersion Liquid, Immersion Liquid Cleaning Composition, And Substrate

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US Patent:
20170176878, Jun 22, 2017
Filed:
Mar 6, 2017
Appl. No.:
15/450577
Inventors:
- Tokyo, JP
Goji Wakamatsu - Sunnyvale CA, US
Assignee:
JSR Corporation - Tokyo
International Classification:
G03F 7/20
B01J 20/26
B01D 15/00
Abstract:
A cleaning method of an immersion liquid includes supplying an immersion liquid on a surface of a cleaning substrate. The immersion liquid is to be used in a liquid immersion lithography apparatus. The cleaning substrate has a substrate and an organic film laminated on a top face side of the substrate. The immersion liquid is allowed to move on the substrate to remove contaminants from the immersion liquid.
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Goji Wakamatsu from San Jose, CA Get Report