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Edward Lamby Phones & Addresses

  • 38 Witbeck Dr, Scotia, NY 12302 (518) 399-5723 (518) 547-8751 (518) 399-0816
  • Glenville, NY
  • Gull Bay Rd, Putnam Station, NY 12861 (518) 547-8751
  • Weston, FL
  • 38 Witbeck Dr, Scotia, NY 12302 (518) 399-5723

Work

Position: Professional/Technical

Emails

e***y@hotmail.com

Resumes

Resumes

Edward Lamby Photo 1

Edward Lamby

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Location:
United States

Publications

Us Patents

Water Soluble Resols And Method For Producing Them

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US Patent:
44993110, Feb 12, 1985
Filed:
Dec 2, 1982
Appl. No.:
6/446134
Inventors:
Clifford L. Spiro - Schenectady NY
Edward J. Lamby - Scotia NY
Assignee:
General Electric Company - Schenectady NY
International Classification:
C07C 4101
US Classification:
568660
Abstract:
The effluent stream from a process for producing phenolic compounds is reacted with an aldehyde in the presence of a base to form a water soluble resol which is useful in enhanced oil recovery.

Process For Preparing A Photo-Mask For Imaging Three-Dimensional Objects

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US Patent:
51530848, Oct 6, 1992
Filed:
Sep 10, 1990
Appl. No.:
7/580064
Inventors:
Donald Franklin Foust - Scotia NY
Bradley R. Karas - Amsterdam NY
Edward J. Lamby - Scotia NY
William V. Dumas - Essex Junction VT
Assignee:
General Electric Company - Schenectady NY
International Classification:
G03F 100
US Classification:
430 5
Abstract:
A method for the preparation a photo-mask used for photo-imaging selected areas on the surfaces of a three-dimensional printed circuit board substrate. The photo-mask comprises a membrane transparent and degradation resistant to UV light, having at least one side with a contoured shape conforming, and flexible enough to comply with surface irregularities on the surfaces of the three-dimensional substrate being photo-imaged. A pattern of tracks opaque to UV light is positioned along the contoured shape of the membrane. The pattern of tracks on the photo-mask is in accordance with a desired conductive metal trace pattern on the surfaces of the three-dimensional printed circuit board substrate. The photo-mask is prepared by dispensing a track material in a boustrophedenous manner on the surfaces of the substrate being photo-imaged. A membrane material is then poured upon the surfaces containing the dispensed tracks.

Method For Treating A Polyimide Surface To Improve The Adhesion Of Metal Deposited Thereon, And Articles Produced Thereby

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US Patent:
48429465, Jun 27, 1989
Filed:
Sep 28, 1987
Appl. No.:
7/103618
Inventors:
Donald F. Foust - Scotia NY
William V. Dumas - Delanson NY
Edward J. Lamby - Scotia NY
Bradley R. Karas - Amsterdam NY
Assignee:
General Electric Company - Schenectady NY
International Classification:
C23C 1820
C25D 556
US Classification:
428458
Abstract:
A method for treating a polyimide surface is disclosed, in which an adhesion-promoting compound such as thiourea contacts the surface prior to the electroless plating of metal thereon. Articles formed by such a method are also disclosed.

Method For Preparing Polymer Surfaces For Subsequent Plating Thereon, And Improved Metal-Plated Plastic Articles Made Therefrom

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US Patent:
48731366, Oct 10, 1989
Filed:
Jun 16, 1988
Appl. No.:
7/207462
Inventors:
Donald F. Foust - Scotia NY
Edward J. Lamby - Scotia NY
Bradley R. Karas - Amsterdam NY
William V. Dumas - Delanson NY
Elihu C. Jerabek - Glenmont NY
Assignee:
General Electric Company - Schenectady NY
International Classification:
B32B 300
B32B 700
B44C 122
H05K 100
US Classification:
428209
Abstract:
An improved method for pretreating a polyimide surface in preparation for an adhesion promotion treatment and subsequent metallization is disclosed, wherein the pretreatment comprises mild etching of the surface, contact of the surface with a basic solution, and contact of the surface with a cationic surfactant which is capable of removing a residual film formed on the surface after the mild etching step. This invention further includes articles such as printed circuit boards, which comprise a polyimide substrate pretreated as described above and then treated with an adhesion promoter, wherein an electrolessly-applied metal layer is disposed on the substrate, and an electrolytically-applied metal layer free of chemical additives is disposed on the electrolessly-applied layer. The article may include an additional electrolytically-applied layer containing chemical additives and disposed on top of the first electrolytic layer.

Method For Producing Water Soluble Resols And Use Therefor

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US Patent:
45652481, Jan 21, 1986
Filed:
Jul 24, 1984
Appl. No.:
6/633750
Inventors:
Clifford L. Spiro - Schenectady NY
Edward J. Lamby - Scotia NY
Assignee:
General Electric Company - Schenectady NY
International Classification:
E21B 4322
E21B 4340
US Classification:
166267
Abstract:
The effluent stream from a process for producing phenolic compounds is reacted with an aldehyde in the presence of a base to form a water soluble resol which is useful in enhanced oil recovery.
Edward J Lamby from Scotia, NY, age ~82 Get Report