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David Tysiac Phones & Addresses

  • 119 Hamlin Dr, Canandaigua, NY 14424 (585) 393-9471
  • 247 Gibson St, Canandaigua, NY 14424 (585) 393-9471
  • Farmington, NY
  • 168 Crosby Ln, Rochester, NY 14612 (585) 227-9954
  • Windsor, CA
  • Carrollton, TX

Work

Company: Thomas electronics - Clyde, NY Jun 2014 Position: Process engineer

Education

School / High School: Rochester Institute of Technology- Rochester, NY 2003 Specialities: Masters of Science in Material Science and Engineering

Skills

Chemistry • Manufacturing • Product Development • Continuous Improvement • Coatings • Materials Science • Process Engineering • Process Improvement • Lean Manufacturing • Iso 9000 • Quality System • Root Cause Analysis • Process Optimization • Materials • Iso • Engineering • Characterization • Polymers • Spc • Cross Functional Team Leadership • Design of Experiments • Formulation • Screen Printing • Quality Improvement • Microsoft Office • Semiconductor Process • Clean Rooms • Research and Development • Statistical Process Control • Six Sigma

Industries

Electrical/Electronic Manufacturing

Resumes

Resumes

David Tysiac Photo 1

Process Development Engineer

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Location:
Canandaigua, NY
Industry:
Electrical/Electronic Manufacturing
Work:
Zotos International (Subsidiary of Shiseido Usa)
Process Development Engineer

Thomas Electronics Jun 2014 - Dec 2014
Chemical Process Engineer

Ferro Corporation Sep 2007 - Jun 2014
Research and Development Process Engineering Technician Iv

Ferro Corporation Aug 2006 - Sep 2007
Chemical Mechanical Polishing Technician Iv

Ferro Corporation Jun 2004 - Aug 2006
Manufacturing Engineer
Education:
Rochester Institute of Technology 2000 - 2003
Master of Science, Masters, Materials Science, Engineering
Rochester Institute of Technology 1997 - 2000
Bachelors, Bachelor of Science, Chemistry
State University of New York at Fredonia 1989 - 1993
Bachelors, Teaching, Elementary Education
Skills:
Chemistry
Manufacturing
Product Development
Continuous Improvement
Coatings
Materials Science
Process Engineering
Process Improvement
Lean Manufacturing
Iso 9000
Quality System
Root Cause Analysis
Process Optimization
Materials
Iso
Engineering
Characterization
Polymers
Spc
Cross Functional Team Leadership
Design of Experiments
Formulation
Screen Printing
Quality Improvement
Microsoft Office
Semiconductor Process
Clean Rooms
Research and Development
Statistical Process Control
Six Sigma
David Tysiac Photo 2

David Tysiac Canandaigua, NY

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Work:
Thomas Electronics
Clyde, NY
Jun 2014 to Dec 2014
Process Engineer

Ferro Electronic Materials
Penn Yan, NY
Sep 2007 to Jun 2014
Engineering Technician IV

Chemical Mechanical Planarization Research & Development Lab

Aug 2006 to Sep 2007
Chemical Mechanical Polishing Technician IV

Solids of Cerium Slurry

Jun 2004 to Aug 2006
Manufacturing Engineer

Chemical Mechanical Planarization Research & Development Lab

Jan 2004 to Jun 2004
Research Scientist II

Chemical Mechanical Planarization Research & Development Lab

Jul 2000 to Jan 2004
Chemical Mechanical Polishing Technician IV

Eastman Kodak Company
Rochester, NY
Aug 1998 to Jul 2000

Education:
Rochester Institute of Technology
Rochester, NY
2003
Masters of Science in Material Science and Engineering

Rochester Institute of Technology
Rochester, NY
2000
Bachelor of Science in Chemistry

SUNY Fredonia
Fredonia, NY
1993
Bachelor of Science in Elementary Education

Conductivity & Polymerization of Poly

Publications

Us Patents

Methods And Products For Replenishing A Polishing Slurry In A Polishing Apparatus

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US Patent:
20100243670, Sep 30, 2010
Filed:
Mar 24, 2009
Appl. No.:
12/410221
Inventors:
David P. Tysiac - Canandaigua NY, US
Assignee:
FERRO CORPORATION - Cleveland OH
International Classification:
G01F 11/00
B65D 35/00
US Classification:
222 1, 222107
Abstract:
Methods and products for replenishing a polishing slurry in a chemical-mechanical polishing apparatus. A preformulated polishing slurry is packaged within a container having flexible walls. When it is time to replenish the polishing slurry in a polishing apparatus, an operator manipulates the sealed container by hand, which causes deformation of the container walls. The deformation of the container walls leads to the rapid and substantially complete resuspension of the abrasive particles into the polishing slurry. Once the abrasive particles have been sufficiently resuspended, the container having flexible walls is unsealed and the polishing slurry is poured into a slurry tank associated with the polishing apparatus.
David P Tysiac from Canandaigua, NY, age ~53 Get Report