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David Cossaboon Phones & Addresses

  • 340 Market St E APT 374, Gaithersburg, MD 20878
  • Mars, PA
  • Manassas, VA
  • West Chester, PA
  • Willow Street, PA
  • Germantown, MD
  • Falls Church, VA
  • Overland Park, KS
  • Allen, TX
  • Exton, PA

Publications

Us Patents

Novel Method To Enhance Microarray Surface Density And Hybridization Efficiency

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US Patent:
20030099930, May 29, 2003
Filed:
Oct 29, 2001
Appl. No.:
10/052972
Inventors:
David Graves - Devon PA, US
David Cossaboon - Germantown MD, US
Richard Su - Arcadia CA, US
Paolo Fortina - Philadelphia PA, US
Saul Surrey - Chadds Ford PA, US
Steve McKenzie - Springfield PA, US
International Classification:
C12Q001/70
C12Q001/68
G01N033/53
G01N033/567
C12M001/34
B05D003/00
US Classification:
435/005000, 435/006000, 435/007200, 427/002110, 435/287200
Abstract:
Disclosed are nucleic acid microarray devices and their method of preparation employing dendrimeric polyamines to bind nucleic acid probes to solid support surfaces thereby enhancing the surface molecule density and hybridization efficiency of nucleic acids in the microarray. Also disclosed are methods of using the resulting microarray device for analyzing test samples containing target molecules.

Porous Device

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US Patent:
20050106583, May 19, 2005
Filed:
May 6, 2004
Appl. No.:
10/839175
Inventors:
David Cossaboon - Germantown MD, US
Eric Eastman - Highland MD, US
Brady Cheek - Walkersville MD, US
Yong-Yi Yu - Germantown MD, US
International Classification:
C12Q001/68
C12M001/34
US Classification:
435006000, 435287200
Abstract:
An improved polymer device for conducting a multiplicity of individual and simultaneous binding reactions or performing other separation techniques is described. The apparatus comprises a polymer substrate on which are located discrete and isolated sites for such reactions or separation phenomena. The apparatus is characterized by discrete and isolated regions that extend through said substrate and terminate on a second surface thereof such that when a test sample is allowed to the substrate, it is capable of penetrating through each such region during the course of a reaction. The use of castable polymer techniques improves the manufacturing flexibility and cost over prior materials and fabrication methods and also provides certain improved properties such as lower specific stiffness and ease of lamination or bonding to other elements of a device.

Compositions And Methods For Polishing Silica, Silicates, And Silicon Nitride

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US Patent:
57696896, Jun 23, 1998
Filed:
Feb 28, 1996
Appl. No.:
8/608287
Inventors:
David Cossaboon - Christiana DE
Lee Melbourne Cook - Steelville PA
Assignee:
Rodel, Inc. - Newark DE
International Classification:
B24B 100
US Classification:
451 41
Abstract:
A composition is provided, which is suitable for polishing SiO. sub. 2, silicates, and silicon nitride, comprising an aquesous slurry of submicron SiO. sub. 2 particles and a soluble inorganic salt or combination of soluble inorganic salts of total solution concentration below the critical coagulation concentration for the slurry, wherein the slurry pH is adjusted to within the range of about 9 to 10 by addition of a soluble amine or mixture of soluble amines. Optionally, the compositions of this invention may also comprise a polyhydric alcohol.
David A Cossaboon from Gaithersburg, MD, age ~55 Get Report