Search

Christopher L Aardahl

from Richland, WA
Age ~56

Christopher Aardahl Phones & Addresses

  • 325 Sell Ln, Richland, WA 99352 (509) 628-8135
  • 2756 Willowbrook Ave, Richland, WA 99352 (509) 628-8135
  • 102 Kelsey Ct, Sequim, WA 98382 (509) 628-8135 (360) 681-3266
  • Irving, TX
  • Bothell, WA
  • Seattle, WA
  • Sacramento, CA

Publications

Us Patents

Carbon Nanotube-Containing Structures, Methods Of Making, And Processes Using Same

View page
US Patent:
6824689, Nov 30, 2004
Filed:
Dec 24, 2001
Appl. No.:
10/036332
Inventors:
Yong Wang - Richland WA
Ya-Huei Chin - Richland WA
Yufei Gao - Blue Bell PA
Christopher L. Aardahl - Richland WA
Terri L. Stewart - Richland WA
Assignee:
Battelle Memorial Institute - Richland WA
International Classification:
B01D 1500
US Classification:
210660, 210664, 210679, 4234473, 428408
Abstract:
Carbon nanotube structures are disclosed in which nanotubes are disposed over a porous support such as a foam, felt, mesh, or membrane. Techniques of making these structures are also disclosed. In some of these techniques, a support is pretreated with a templated surfactant composition to assist with the formation of a nanotube layer.

Processes And Apparatuses For Treating Halogen-Containing Gases

View page
US Patent:
6962679, Nov 8, 2005
Filed:
Jul 11, 2001
Appl. No.:
09/905654
Inventors:
Gary B. Josephson - Richland WA, US
Delbert L. Lessor - Richland WA, US
Amit K. Sharma - Burlington NJ, US
Christopher Lyle Aardahl - Richland WA, US
Kenneth G. Rappe - Richland WA, US
Assignee:
Battelle Memorial Institute - Richland WA
International Classification:
A62D003/00
US Classification:
423241, 423240 R
Abstract:
There are disclosed various processes, apparatuses and systems for treating a halogen-containing gas such as Fthat involve generating a plasma in order to reduce chemically the halogen-containing gas into products that are more environmentally manageable. According to a particular embodiment, a reducing agent is mixed with the halogen-containing gas to produce a feed gas mixture and a non-thermal plasma is generated in the feed gas mixture in the presence of liquid water.

Carbon Nanotube-Containing Structures, Methods Of Making, And Processes Using Same

View page
US Patent:
7011760, Mar 14, 2006
Filed:
Sep 30, 2004
Appl. No.:
10/956306
Inventors:
Yong Wang - Richland WA, US
Ya-Huei Chin - Richland WA, US
Yufei Gao - Blue Bell PA, US
Christopher L. Aardahl - Richland WA, US
Terri L. Stewart - Richland WA, US
Assignee:
Battelle Memorial Institute - Richland WA
International Classification:
B01D 15/00
US Classification:
210660, 210664, 210679, 2105021, 210506, 4234473, 428408
Abstract:
Carbon nanotube structures are disclosed in which nanotubes are disposed over a porous support such as a foam, felt, mesh, or membrane. Techniques of making these structures are also disclosed. In some of these techniques, a support is pretreated with a templated surfactant composition to assist with the formation of a nanotube layer.

Method And System For The Combination Of Non-Thermal Plasma And Metal/Metal Oxide Doped Γ-Alumina Catalysts For Diesel Engine Exhaust Aftertreatment System

View page
US Patent:
7081231, Jul 25, 2006
Filed:
Nov 8, 2000
Appl. No.:
09/708863
Inventors:
Christopher L. Aardahl - Richland WA, US
Ashok Chanda - Peoria IL, US
Craig F. Habeger - West Richland WA, US
Kent A. Koshkarian - Peoria IL, US
Paul W. Park - Peoria IL, US
Assignee:
Caterpillar Inc. - Peoria IL
Battelle Memorial Institute - Richland WA
International Classification:
B01D 50/00
F01N 3/10
US Classification:
422169, 422171, 422172, 422174, 423212, 4232132, 4232137, 60272, 60273, 60274, 60275, 60282, 60299
Abstract:
The present disclosure pertains to a system and method for treatment of oxygen rich exhaust and more specifically to a method and system that combines non-thermal plasma with a metal doped γ-alumina catalyst. Current catalyst systems for the treatment of oxygen rich exhaust are capable of achieving only approximately 7 to 12% NOreduction as a passive system and only 25–40% reduction when a supplemental hydrocarbon reductant is injected into the exhaust stream. It has been found that treatment of an oxygen rich exhaust initially with a non-thermal plasma and followed by subsequent treatment with a metal doped γ-alumina prepared by the sol gel method is capable of increasing the NOreduction to a level of approximately 90% in the absence of SOand 80% in the presence of 20 ppm of SO. Especially useful metals have been found to be indium, gallium, and tin.

Treatment Of Effluent From A Substrate Processing Chamber

View page
US Patent:
7160521, Jan 9, 2007
Filed:
Jan 13, 2003
Appl. No.:
10/342121
Inventors:
Peter Porshnev - San Jose CA, US
Sebastien Raoux - Cupertino CA, US
Mike Woolston - San Jose CA, US
Christopher L. Aardahl - Richland WA, US
Rick J. Orth - Kennewick WA, US
Kenneth G. Rappe - Richland WA, US
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
B01J 19/08
US Classification:
42218604
Abstract:
A substrate processing apparatus has a process chamber and an effluent treatment reactor. The process chamber has a substrate support, a process gas supply, a gas energizer, and an exhaust conduit. The effluent treatment reactor has an effluent inlet to receive effluent from the exhaust conduit of the process chamber, a plasma cell having one or more electrodes electrically connected to a voltage source adapted to electrically bias the electrodes to couple energy to effluent received in the plasma cell, a scrubbing cell coaxially exterior to the plasma cell, the scrubbing cell having a scrubbing fluid inlet to introduce scrubbing fluid into effluent in the scrubbing cell and a scrubbing fluid outlet, and an effluent outlet to release the treated effluent.

Processes For Treating Halogen-Containing Gases

View page
US Patent:
7220396, May 22, 2007
Filed:
Jan 13, 2003
Appl. No.:
10/341783
Inventors:
Christopher L. Aardahl - Sequim WA, US
Rick J. Orth - Kennewick WA, US
Kenneth G. Rappé - Richland WA, US
Delbert L. Lessor - Richland WA, US
Gary B. Josephson - Richland WA, US
Assignee:
Battelle Memorial Institute - Richland WA
International Classification:
B01D 53/50
US Classification:
423240R, 588311, 588312, 588406
Abstract:
There are disclosed various processes, apparatuses and systems for treating a halogen-containing gas such as Fthat involve generating a plasma in order to reduce chemically the halogen-containing gas into products that are more environmentally manageable. According to a particular embodiment, a reducing agent is mixed with the halogen-containing gas to produce a feed gas mixture and a non-thermal plasma is generated in the feed gas mixture in the presence of liquid water. According to another embodiment, a vaporized portion of a liquid reducing agent is mixed with the halogen-containing gas to produce a reaction mixture and a non-thermal plasma is generated in the reaction gas mixture to reduce the halogen-containing gas.

Processes And Apparatuses For Treating Halogen-Containing Gases

View page
US Patent:
7407635, Aug 5, 2008
Filed:
Dec 16, 2003
Appl. No.:
10/738686
Inventors:
Gary B. Josephson - Richland WA, US
Delbert L. Lessor - Richland WA, US
Amit K. Sharma - Burlington NJ, US
Christopher Lyle Aardahl - Richland WA, US
Kenneth G. Rappe - Richland WA, US
Assignee:
Battelle Memorial Institute - Richland WA
International Classification:
B01J 19/08
US Classification:
42218604, 204252
Abstract:
There are disclosed various processes, apparatuses and systems for treating a halogen-containing gas such as Fthat involve generating a plasma in order to reduce chemically the halogen-containing gas into products that are more environmentally manageable. According to a particular embodiment, a reducing agent is mixed with the halogen-containing gas to produce a feed gas mixture and a non-thermal plasma is generated in the feed gas mixture in the presence of liquid water.

Backfilled, Self-Assembled Monolayers And Methods Of Making Same

View page
US Patent:
7553547, Jun 30, 2009
Filed:
Dec 21, 2005
Appl. No.:
11/315646
Inventors:
Glen E. Fryxell - Kennewick WA, US
Thomas S. Zemanian - Richland WA, US
R. Shane Addleman - Benton City WA, US
Christopher L. Aardahl - Sequim WA, US
Feng Zheng - Richland WA, US
Brad Busche - Raleigh NC, US
Oleg B. Egorov - West Richland WA, US
Assignee:
Battelle Memorial Institute - Richland WA
International Classification:
B32B 25/20
US Classification:
428447, 528 38, 4273977
Abstract:
Backfilled, self-assembled monolayers and methods of making the same are disclosed. The self-assembled monolayer comprises at least one functional organosilane species and a substantially random dispersion of at least one backfilling organosilane species among the functional organosilane species, wherein the functional and backfilling organosilane species have been sequentially deposited on a substrate. The method comprises depositing sequentially a first organosilane species followed by a backfilling organosilane species, and employing a relaxation agent before or during deposition of the backfilling organosilane species, wherein the first and backfilling organosilane species are substantially randomly dispersed on a substrate.
Christopher L Aardahl from Richland, WA, age ~56 Get Report