US Patent:
20020155265, Oct 24, 2002
Inventors:
HYUNG-CHUL CHOI - LEXINGTON MA, US
ROBERT L. JONES - ANDOVER MA, US
PRADNYA V NAGARKAR - NEWTON MA, US
WILLIAM K SMYTH - SUDBURY MA, US
XIAOJIA Z WANG - ACTON MA, US
YEE HO CHIA - TROY MI, US
International Classification:
B32B031/26
Abstract:
An antireflection coating comprises one or more inorganic antireflection layers (typically metal oxide or silica layers) and a polymer layer cured in situ, the polymer layer having a refractive index not greater than about 1.53 over the wavelength range of 400 to 700 nm and a thickness of from about 20 to about 200 nm. The polymer layer provides good scratch and fingerprint protection, and also enables the thicknesses of the inorganic antireflection layers to be reduced, thereby reducing the cost of the coating.