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Bryan J Puch

from Kalispell, MT
Age ~58
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Related to:
Karen C Proctor, 81Andrea Proctor, 76May W PuchMarnie M Proctor, 55Sandra M Moore, 80Judith A Puch, 84Carl J Puch, 58Erwin F Puch, 84Terry L Puch, 55Dale G Puch, 53Tony H Moore, 86
Connected to:
Alan R Puch, 60Janet Puch, 33Justin Puch, 48Nicole M Puch, 42Pedro F Puch, 91Vanessa Puch, 51Anupama Pucha, 50Gabriela Pucha, 38Heidi B Puchacz, 44Carmen R Puchades, 53

Bryan Puch Phones & Addresses

  • 626 Weaver Farm Rd, Kalispell, MT 59901 (406) 871-0734
  • 5760 Round Lake Rd, Apopka, FL 32712 (407) 884-7916
  • 5706 Round Lake Rd, Apopka, FL 32712
  • Orlando, FL
  • Mount Dora, FL
  • Boulder, CO
  • Longmont, CO
  • 5760 Round Lake Rd, Apopka, FL 32712

Work

Position: Mechanical engineer

Resumes

Resumes

Bryan Puch Photo 1

Mechanical Engineer

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Location:
626 Weaver Farm Rd, Kalispell, MT 59901
Work:

Mechanical Engineer

Publications

Us Patents

Photoresist Removing Processor And Methods

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US Patent:
20110217848, Sep 8, 2011
Filed:
Mar 3, 2010
Appl. No.:
12/717079
Inventors:
Eric J. Bergman - Kalispell MT, US
Jerry Dustin Leonhard - Kalispell MT, US
Bryan Puch - Kalispell MT, US
Jason Rye - Kalispell MT, US
International Classification:
H01L 21/306
US Classification:
438746, 15634521, 257E21219
Abstract:
A processing chamber successfully removes hardened photoresist via direct infrared radiation onto the wafer, in the presence of an acid such as sulfuric acid, optionally along with an oxidizer such as hydrogen peroxide. The processing chamber includes a fixture for holding and optionally rotating the wafer. An infrared irradiating assembly has infrared lamps outside of the processing chamber positioned to radiate infrared light into the processing chamber. The infrared lamps may be arranged to irradiate substantially the entire surface of a wafer on the rotor. A cooling assembly can be associated with the infrared radiating assembly to provide a quick cool down and avoid over-processing. Photoresist is removed using small amounts of chemical solutions.

Workpiece Wetting And Cleaning

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US Patent:
20120052204, Mar 1, 2012
Filed:
Aug 31, 2010
Appl. No.:
12/873002
Inventors:
Bryan Puch - Kalispell MT, US
Kyle M. Hanson - Kalispell MT, US
Marvin Bernt - Kalispell MT, US
Paul R. McHugh - Kalispell MT, US
Gregory J. Wilson - Kalispell MT, US
Assignee:
Applied Materials, Inc. - Kalispell MT
International Classification:
C23C 16/56
US Classification:
42725523
Abstract:
In a workpiece processor, a head is moveable onto a bowl to form a process chamber. A workpiece can be cleaned in the processor by immersing the workpiece into a liquid bath in the bowl and then boiling the liquid. Vacuum may be applied to the chamber to reduce the pressure within the chamber, thereby reducing the boiling temperature of the liquid and allowing processing at lower temperatures. In a separate method for prewetting a workpiece, a humid gas is provided into the process chamber and condenses on the workpiece. In another separate method for wetting a workpiece, liquid water is provided into the bowl, with the workpiece above the liquid water. Water vapor is created in the process chamber by applying vacuum to the process chamber. The vapor wets the workpiece. The workpiece is then further wetted by submerging the workpiece into the liquid water.

Processing Apparatus With Vertical Liquid Agitation

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US Patent:
20120199475, Aug 9, 2012
Filed:
Feb 8, 2011
Appl. No.:
13/023317
Inventors:
Paul R. McHugh - Kalispell MT, US
Gregory J. Wilson - Kalispell MT, US
Bryan Puch - Kalispell MT, US
International Classification:
C25D 19/00
B01F 13/00
US Classification:
204273, 366343
Abstract:
A substrate or semiconductor wafer processing apparatus has an agitator plate adjacent to an upper end of a process vessel. A workpiece holder holds a workpiece in the vessel at a processing position above the agitator plate. A vertical actuator assembly supporting the agitator plate oscillates the agitator plate vertically. The agitator plate may also rotate while oscillating vertically. In one design, the agitator plate has a spiral vane and a spiral slot. In a related metal plating apparatus, electrodes and a dielectric field shaping unit are in the vessel, below the agitator plate, and a shield ring is adjacent to the upper end of the vessel, above the agitator plate.

Electrochemical Processor Alignment System

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US Patent:
20130086787, Apr 11, 2013
Filed:
Oct 6, 2011
Appl. No.:
13/267693
Inventors:
Bryan Puch - Kalispell MT, US
Assignee:
APPLIED MATERIALS, INC. - Kalispell MT
International Classification:
C25C 7/06
B23Q 17/00
C25B 9/00
US Classification:
2940709, 2042751, 204248
Abstract:
A substrate plating processor has a vessel on a support structure and a head support fixed in place relative to the support structure. A head having a rotor is attached to the head support. A lifter associated with the head support moves the head into and out of engagement with the vessel. An alignment assembly attachable to the rotor has at least one sensor adapted to detect a position of an inside surface of the vessel when the head is engaged with the vessel. The sensor may be a physical contact sensor positioned to contact the inside surface of the vessel.

Orthopaedic Shoulder Brace Having Adjustable Pelvic, Scapulary, And Arm Supports

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US Patent:
55384994, Jul 23, 1996
Filed:
May 27, 1994
Appl. No.:
8/250299
Inventors:
Shannon R. Schwenn - Orlando FL
Bryan J. Puch - Boulder CO
Mark Glover - Troy MI
Assignee:
Orthomerica Products, Inc. - Newport Beach CA
International Classification:
A61F 500
US Classification:
602 20
Abstract:
An orthopaedic shoulder brace that is adapted to evenly distribute weight onto a patient's waist and hip is disclosed. The shoulder brace includes a first anatomically-conforming shell having an upper curved portion for comfortably fitting around a right side of the waist of a user, and having a lower curved portion for comfortably fitting onto the right hip of the user. A second anatomically-conforming shell is also included which has an upper curved portion for comfortably fitting around a left side of the waist of the user, and which has a lower curved portion for comfortably fitting onto the left hip of the user. A strap connects the front portions of the first anatomically-conforming shell and the second anatomically-conforming shell, and a joining shell connects the back portions of the two shells. The joining shell is rotatably connected to the first anatomically-conforming shell at a first joint and rotatably connected to the second anatomically-conforming shell at a second joint. These two joints allow the first and second anatomically-conforming shells to rotate to accommodate the varying hip sizes of different users.

Orthopedic Hip And Leg Abductor

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US Patent:
58140018, Sep 29, 1998
Filed:
Jul 25, 1997
Appl. No.:
8/900202
Inventors:
Shannon R. Schwenn - Orland FL
Bryan J. Puch - Apopka FL
Assignee:
Orthomerica Products, Inc. - Newport Beach CA
International Classification:
A61F 500
US Classification:
602 24
Abstract:
An orthopedic leg abductor for resisting muscular contraction of a user comprises a pair of adjustable sleeves which secure about a patient's thighs. The adjustable sleeves are each connected to a separate rigid member, which in turn is connected to a belt which is fastened about the patient's waist. The rigid members preferably comprise a pair of pivoting bars which are lockable in a predetermined angular relationship according to the needs and requirements of the individual patient. The rigid bars give the abductor structure and also serve to prevent the patient from retracting into a fetal position. The sleeves are also separated by mechanical means such as a collapsible hinge which is adjustable to keep the patient's legs apart, thereby reducing the patient's disposition to contract into an undesirable position and provide extension of the muscles in the hip region. The mechanical means fixes the distance between the two sleeves and can be easily locked into position. The apparatus includes covers for each rigid member and mechanical means, and all elements whose surfaces are designed to contact the user are machine washable.

Orthopedic Hip Support With Multi-Positional Joints

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US Patent:
58301682, Nov 3, 1998
Filed:
Feb 18, 1997
Appl. No.:
8/801491
Inventors:
Steven J. Finnell - Orlando FL
Bryan J. Puch - Apopka FL
Assignee:
Orthomerica Products, Inc. - Newport Beach CA
International Classification:
A61F 500
US Classification:
602 24
Abstract:
An orthopedic hip support with multi-position joints for greater flexibility and comfort is disclosed. The hip support comprises left and right hip plates formed to mate with the hip region of the pelvis, a tightening belt and connecting front panel for adjusting the fit of the unit while supporting the abdomen, and a rear panel which connects the left and right hip plates therein forming the apparatus. Each hip plate is connected to the rear panel using a pin which permits relative rotation at the joint, and a preferred embodiment includes an elongated slot from which the pin can be positioned to expand or contract the apparatus. At mating surfaces of the rear panel and hip plates have abrasive, gritted surfaces which increase the friction between the two mating surfaces. When a compressive force is applied to the mating surfaces, such as a fastener with a wide head, the two surfaces can be securely positioned and the friction between the surfaces due to the abrasive surfaces resists slipping of the hip plates, allowing the hip plates to be positioned in a desired orientation and locked into position to provide a tailored, comfortable fit.

Wafer Processing System With Chuck Assembly Maintenance Module

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US Patent:
20160225656, Aug 4, 2016
Filed:
Feb 3, 2015
Appl. No.:
14/613081
Inventors:
- Santa Clara CA, US
Mario David Silvetti - Morgan Hill CA, US
Randy A. Harris - Kalispell MT, US
Bryan Puch - Kalispell MT, US
Vincent Steffan Francischetti - Columbia Falls MT, US
Satish Sundar - San Jose CA, US
International Classification:
H01L 21/687
H01L 21/677
B08B 3/10
Abstract:
A wafer processing system has a ring maintenance module for loading wafers into a chuck assembly, and for cleaning and inspecting the chuck assembly used in electroplating processors of the system. A shaft is attached to a rotor plate. A rotation motor rotates the shaft and a rotor plate on the shaft. A chuck clamp on an upper end of the shaft holds the chuck assembly onto the rotor plate. A lift motor raises and lowers the rotor plate and the shaft, to move open the chuck assembly for wafer loading and unloading, and to move the chuck assembly into different process positions. A swing arm having spray nozzles may be provided for cleaning the chuck assembly.
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Bryan J Puch from Kalispell, MT, age ~58 Get Report