Resumes
Resumes
Brittany Hoard
View pageSkills:
Eeo
Brittany Hoard Phones & Addresses
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600 N Pantano Rd APT 529, Tucson, AZ 85710
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Glendale, CA
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Columbus, OH
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Albuquerque, NM
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2516 Little River Rd, Haymarket, VA 20169 (703) 753-0080
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Troy, NY
Skills
Eeo
Publications
Us Patents
Methods To Introduce Sub-Micrometer, Symmetry-Breaking Surface Corrugation To Silicon Substrates To Increase Light Trapping
View pageUS Patent:
20170110602, Apr 20, 2017
Filed:
Dec 23, 2016
Appl. No.:
15/389936
Inventors:
- Albuquerque NM, US
Brittany R. Hoard - Albuquerque NM, US
Sang M. Han - Albuquerque NM, US
Swapnadip Ghosh - Albuquerque NM, US
Brittany R. Hoard - Albuquerque NM, US
Sang M. Han - Albuquerque NM, US
Swapnadip Ghosh - Albuquerque NM, US
Assignee:
STC.UNM - Albuquerque NM
International Classification:
H01L 31/0236
G02B 1/00
H01L 31/20
H01L 31/0747
H01L 31/18
G02B 1/00
H01L 31/20
H01L 31/0747
H01L 31/18
Abstract:
Provided is a method for fabricating a nanopatterned surface. The method includes forming a mask on a substrate, patterning the substrate to include a plurality of symmetry-breaking surface corrugations, and removing the mask. The mask includes a pattern defined by mask material portions that cover first surface portions of the substrate and a plurality of mask space portions that expose second surface portions of the substrate, wherein the plurality of mask space portions are arranged in a lattice arrangement having a row and column, and the row is not oriented parallel to a [110] direction of the substrate. The patterning the substrate includes anisotropically removing portions of the substrate exposed by the plurality of spaces.
Methods To Introduce Sub-Micrometer, Symmetry-Breaking Surface Corrugation To Silicon Substrates To Increase Light Trapping
View pageUS Patent:
20160284886, Sep 29, 2016
Filed:
Oct 17, 2014
Appl. No.:
15/030039
Inventors:
- Albuquerque NM, US
Brittany R. Hoard - Albuquerque NM, US
Sang M. Han - Albuquerque NM, US
Swapnadip Ghosh - Albuquerque NM, US
Brittany R. Hoard - Albuquerque NM, US
Sang M. Han - Albuquerque NM, US
Swapnadip Ghosh - Albuquerque NM, US
International Classification:
H01L 31/0236
H01L 31/20
H01L 31/0747
H01L 31/20
H01L 31/0747
Abstract:
Provided is a method for fabricating a nanopatterned surface. The method includes forming a mask on a substrate, patterning the substrate to include a plurality of symmetry-breaking surface corrugations, and removing the mask. The mask includes a pattern defined by mask material portions that cover first surface portions of the substrate and a plurality of mask space portions that expose second surface portions of the substrate, wherein the plurality of mask space portions are arranged in a lattice arrangement having a row and column, and the row is not oriented parallel to a [110] direction of the substrate. The patterning the substrate includes anisotropically removing portions of the substrate exposed by the plurality of spaces.