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Aron Pentek

from San Jose, CA
Age ~56
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Related to:
Katalin Pentek, 57Gary M Kovach, 60Joseph A PeatakJacklyn L Antonelli, 36Robert M Nott, 55Shawn R Testone, 38
Connected to:
Todd D Pentello, 56Kari L Penter, 31Lisa L Penter, 60Melody Penter, 75Tom M Penter, 62Ann S Pentes, 76Nicholas Pentescu, 67Peter Z Pentescu, 39Sarah L Pentescu, 41

Aron Pentek Phones & Addresses

  • 1437 Corte De Rosa, San Jose, CA 95120 (408) 268-2964
  • La Jolla, CA
  • Goleta, CA
  • Palm Springs, CA
  • San Diego, CA
  • Sanger, CA
  • 1437 Corte De Rosa, San Jose, CA 95120

Work

Position: Executive, Administrative, and Managerial Occupations

Education

Degree: Bachelor's degree or higher

Emails

a***[email protected]

Publications

Us Patents

Perpendicular Recording Magnetic Head With A Write Shield Magnetically Coupled To A First Pole Piece

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US Patent:
7031121, Apr 18, 2006
Filed:
Jul 30, 2003
Appl. No.:
10/631642
Inventors:
Gautam Khera - Morgan Hill CA, US
Quang Le - San Jose CA, US
Son Van Nguyen - Los Gatos CA, US
Aron Pentek - San Jose CA, US
Assignee:
Hitachi Global Storage Technologies Netherlands B.V. - Amsterdam
International Classification:
G11B 5/127
G11B 5/11
US Classification:
360317, 360319
Abstract:
A perpendicular recording write head has ferromagnetic first and second pole pieces which are connected at a back gap and an insulation stack with a write coil layer embedded therein is located between the first and second pole pieces and between a head surface of the write head and the back gap. The second pole piece has a pole tip which is located at the head surface and a recessed ferromagnetic write shield layer. A nonmagnetic isolation layer is located between the second pole piece and the write shield layer and at least one ferromagnetic stud is magnetically connected between the first pole piece layer and the write shield layer and is located between the head surface and the insulation stack.

System, Method, And Apparatus For Ion Beam Etching Process Stability Using A Reference For Time Scaling Subsequent Steps

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US Patent:
7075094, Jul 11, 2006
Filed:
Aug 30, 2004
Appl. No.:
10/930277
Inventors:
Michael Feldbaum - San Jose CA, US
Hung-Chin Guthrie - Saratoga CA, US
Wipul Pemsiri Jayasekara - Los Gatos CA, US
Aron Pentek - San Jose CA, US
Assignee:
Hitachi Global Storage Technologies Netherlands B.V. - Amsterdam
International Classification:
H01J 37/305
US Classification:
2504922, 25049221, 2504923, 438473
Abstract:
A system for improving drift compensation for ion mill applications defines a reference step for purposes of time duration. The reference step is controlled by an end point detector and monitored for use with subsequent process steps. The time duration for a subsequent step is adjusted as a percentage of the reference step. A time scaling factor determines the actual duration of the subsequent step. Rather than directly using times of step duration, the system uses a percentage of the reference step for the latter step. The duration of the reference step varies depending on the tool drift. The overall duration is changed in the same proportion as the duration of the reference step, and thereby compensates for the influence of drift on the end product.

Method For Creating Inductive Write Head With Steep Shoulder At Notch

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US Patent:
7083738, Aug 1, 2006
Filed:
Jul 31, 2003
Appl. No.:
10/632631
Inventors:
Edward Hin Pong Lee - San Jose CA, US
Aron Pentek - San Jose CA, US
Wen-Chien David Hsiao - San Jose CA, US
Assignee:
Hitachi Global Storage Technologies Netherlands, B.V. - Amsterdam
International Classification:
B29D 11/00
H01L 21/00
US Classification:
216 24, 438 3
Abstract:
A method for fabricating a magnetic head using a modified P cap process. A first pole is formed. A cap is formed above the first pole. A gap layer is formed above the cap. A second pole is formed above the gap layer. Exposed portions of the gap layer are removed. The cap and first pole are milled for creating a shoulder of the first pole tapered upwardly towards the cap. Another method for fabricating a magnetic head includes forming a first pole, forming a gap layer above the first pole, forming a second pole above the gap layer, forming a layer of photoresist above the second pole, patterning the photoresist such that the photoresist covers areas of the gap layer positioned towards the second pole, removing exposed portions of the gap layer, removing part of exposed portions of the first pole for forming steps in the first pole on opposite sides of the photoresist, removing the photoresist, and milling for creating a shoulder of the first pole tapering upwardly towards the cap.

Method For Forming A Write Head Having Air Bearing Surface (Abs)

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US Patent:
7120988, Oct 17, 2006
Filed:
Sep 26, 2003
Appl. No.:
10/672896
Inventors:
Quang Le - San Jose CA, US
Edward Hin Pong Lee - San Jose CA, US
Jui-Lung Li - San Jose CA, US
Aron Pentek - San Jose CA, US
Assignee:
Hitachi Global Storage Technologies Netherlands B.V.
International Classification:
G11B 5/127
C23C 14/00
US Classification:
2960307, 2960312, 2960314, 2960315, 2960316, 2960318, 2960301, 360317, 20419234
Abstract:
A method and materials to fabricate a trailing shield write pole that resolve the problems of controlling the write gap and preventing damages to the write gap or pole during fabrication of the subsequent structure. This process also introduces a CMP assisted lift-off process to remove re-deposition and fencing (increase yields) and a method to create dishing in the top of the write pole. Moreover, also included in this disclosure are suitable materials that can function as an ion mill transfer layer, CMP layer, and RIEable layer.

Method For Forming A Magnetic Head Having A Flux Shaping Layer

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US Patent:
7185415, Mar 6, 2007
Filed:
Aug 29, 2003
Appl. No.:
10/653046
Inventors:
Gautam Khera - Morgan Hill CA, US
Sanford J. Lewis - Palo Alto CA, US
Galina Moutchaidze - San Jose CA, US
Aron Pentek - San Jose CA, US
Hugo Alberto Emilio Santini - San Jose CA, US
Assignee:
Hitachi Global Storage Technologies Netherlands B.V. - Amsterdam
International Classification:
H04R 31/00
G11B 5/147
US Classification:
2960312, 2960313, 2960314, 2960315, 2960318, 360126
Abstract:
A method for fabricating a magnetic head includes forming a first pole and a flux shaping layer in spaced relation to the first pole. A nonmagnetic layer is formed adjacent the flux shaping layer and positioned on an air bearing surface (ABS) side of the flux shaping layer. A tapered recess is created in the nonmagnetic layer, the taper of the recess increasing (i. e. , becoming deeper) towards the flux forming layer. The recess is filled with a magnetic material. A probe layer is formed such that it is in electrical communication with the magnetic material filling the recess.

Magnetic Write Head With Gap Termination Less Than Half Distance Between Pedestal And Back Gap

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US Patent:
7215511, May 8, 2007
Filed:
Mar 31, 2004
Appl. No.:
10/816062
Inventors:
Hung-Chin Guthrie - Saratoga CA, US
Edward Hin Pong Lee - San Jose CA, US
Aron Pentek - San Jose CA, US
Assignee:
Hitachi Global Storage Technologies Netherlands B.V. - Amsterdam
International Classification:
G11B 5/31
G11B 5/23
G11B 5/235
US Classification:
360126, 360119, 360120
Abstract:
A magnetic write head having a metal, non-magnetic write gap that extends only partially to the magnetic back gap, the remainder of the distance between the pole tip and the back gap being a magnetic material. The elimination of the seed layer reduces the amount of milling required to perform the desired notching needed to form a self aligned pedestal on the first pole and voids electrolytic corrosion of the back gap during plating.

Reactive Ion Milling/Rie Assisted Cmp

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US Patent:
7217666, May 15, 2007
Filed:
Mar 2, 2004
Appl. No.:
10/792330
Inventors:
Hung-Chin Guthrie - Saratoga CA, US
Ming Jiang - San Jose CA, US
Jerry Lo - San Jose CA, US
Aron Pentek - San Jose CA, US
Yi Zheng - San Ramon CA, US
Assignee:
Hitachi Global Storage Technologies Netherlands B.V. - Amsterdam
International Classification:
H01L 21/461
US Classification:
438738, 438 3, 438 64, 438712, 257E21218, 360 9701, 360125, 2960307, 2960316
Abstract:
A method for forming a high aspect ratio magnetic structure in a magnetic write head using a combination of chemical mechanical polishing and reactive ion etching.

Method For Protecting Write Head Coil During Write Pole/Shaping

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US Patent:
7243411, Jul 17, 2007
Filed:
Jan 18, 2005
Appl. No.:
11/037405
Inventors:
David P. Druist - Santa Clara CA, US
Aron Pentek - San Jose CA, US
Assignee:
Hitachi Global Storage Technologies Netherlands B.V. - Amsterdam
International Classification:
G11B 5/127
G11B 5/147
C23C 13/00
US Classification:
2960307, 2960312, 2960323, 2960324, 2960325, 360126, 20419234
Abstract:
A method for protecting a write head coil during write pole notching using ion mill resistant mask formed by reactive ion etching is disclosed. Ion mill shaping of the write pole is performed after depositing an ion mill-resistant material to protect the coil.
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Aron Pentek from San Jose, CA, age ~56 Get Report