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April Dutta Phones & Addresses

  • 1151 Park Grove Dr, Milpitas, CA 95035 (408) 946-1732
  • Brookline, MA
  • Fremont, CA
  • Chestnut Hill, MA
  • 1151 Park Grove Dr, Milpitas, CA 95035 (408) 691-1990

Work

Company: Essential machines Apr 2020 Position: Convergence engineer

Education

School / High School: Harvard Medical School 2013 to 2013

Skills

R&D • Systems Engineering • Product Development • Engineering • Optics • Medical Devices • Physics • Image Processing • Testing • Matlab • Algorithms • Program Management • Semiconductors • Design of Experiments • Engineering Management • Cross Functional Team Leadership • Biomedical Engineering • C • Simulations • Labview • System Architecture • Electronics • Embedded Systems • Biotechnology • Project Management • Product Management • Start Ups • Software Development • Design Control • Strategy • Integration • Experimentation • Product R&D • Algorithm Development • Data Analysis • Systems Debugging • Individual Contributor

Languages

English • Burmese

Interests

Boating • Exercise • Electronics • Outdoors • Sports

Industries

Medical Devices

Resumes

Resumes

April Dutta Photo 1

Convergence Engineer

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Location:
1151 Park Grove Dr, Milpitas, CA 95035
Industry:
Medical Devices
Work:
Essential Machines
Convergence Engineer

Avocet Engineering Consulting
Co-Founder, Vice President Engineering

Accuray
Manager, Physics R and D , Cyberknife

Triple Ring Technologies
Principal Physicist

Xoft, Inc. Feb 2007 - Jul 2008
Vice President, Engineering
Education:
Harvard Medical School 2013 - 2013
Harvard Medical School 1985 - 1987
Stony Brook University 1979 - 1985
Doctorates, Doctor of Philosophy, Physics
Indian Institute of Technology, Kanpur 1977 - 1979
Master of Science, Masters, Physics
Skills:
R&D
Systems Engineering
Product Development
Engineering
Optics
Medical Devices
Physics
Image Processing
Testing
Matlab
Algorithms
Program Management
Semiconductors
Design of Experiments
Engineering Management
Cross Functional Team Leadership
Biomedical Engineering
C
Simulations
Labview
System Architecture
Electronics
Embedded Systems
Biotechnology
Project Management
Product Management
Start Ups
Software Development
Design Control
Strategy
Integration
Experimentation
Product R&D
Algorithm Development
Data Analysis
Systems Debugging
Individual Contributor
Interests:
Boating
Exercise
Electronics
Outdoors
Sports
Languages:
English
Burmese

Publications

Us Patents

Fast Image Simulation For Photolithography

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US Patent:
6765651, Jul 20, 2004
Filed:
Mar 11, 2003
Appl. No.:
10/385774
Inventors:
Peter J. Fiekowsky - Los Altos CA, 94024
Paul R. Kube - San Diego CA, 92104
April Dutta - Milpitas CA, 95035
International Classification:
G03B 2732
US Classification:
355 77, 382144, 438 16
Abstract:
A fast method simulates photolithography using conventional image processing techniques. Convolution simulates for blurring; erosion and dilation correct for edge diffraction. In one technique, the source image of the photomask is deconvolved to sharpen it and then dilated to remove edge diffraction. The image is eroded, and then convolved according to the resolution of the stepper at the photomask plane. This aerial image can be further eroded to match the effects of resist and developing. Optional thresholding is done to produce a simulated processed wafer image. In a fast technique, the deconvolution step is eliminated. Dilation and erosion are combined into a single erosion. Where a phase shift mask is involved, a complex convolution is used. Source data can come from the photomask electronic design or from a visual image of the actual photomask. Optimizations include: special microprocessor instructions, floating point pixel values, separable convolution and annular illumination simulation.

Cellspot Applications

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US Patent:
20080038755, Feb 14, 2008
Filed:
Jul 12, 2007
Appl. No.:
11/777218
Inventors:
Lawrence KAUVAR - San Francisco CA, US
William Harriman - Alameda CA, US
Ellen Collarini - Oakland CA, US
April Dutta - Milpitas CA, US
International Classification:
C12Q 1/70
C12N 5/04
C40B 20/04
G01N 33/53
C12Q 1/68
US Classification:
435007320, 435377000, 435005000, 435006000, 435007100, 506004000
Abstract:
A multiplicity of applications of the CellSpot™ assay method are described. Among these applications are extension to integral membrane protein probes, extension to secretion from bacterial cells, identification of antibodies with enhanced affinity, identification of clones with increased secretion levels, and use of massively parallel screening to identify rare efficacious antibodies.

Paramagnetic Material Patch

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US Patent:
20130253290, Sep 26, 2013
Filed:
May 20, 2013
Appl. No.:
13/897856
Inventors:
- North Yorkshire, GB
Sophia Elizabeth Berger - Palo Alto CA, US
April Dutta - Milpitas CA, US
International Classification:
A61B 5/055
US Classification:
600309
Abstract:
A microneedle patch for assessing oxygenation at a localized region of interest includes microneedle projections which extend into a region of interest, a layer of material bonded to the microneedles which allows the patch to releasably engage the localized region of interest, and a paramagenetic material dispersed within the patch. An oxygen impermeable layer of material may be disposed over the oxygen permeable layer of material such that environmental oxygen is inhibited from interacting with the paramagnetic material.

Electron Beam Inspection System And Method

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US Patent:
55788211, Nov 26, 1996
Filed:
Jan 11, 1995
Appl. No.:
8/371458
Inventors:
Dan Meisberger - San Jose CA
Alan D. Brodie - Palo Alto CA
Anil A. Desai - San Jose CA
Dennis G. Emge - San Jose CA
Zhong-Wei Chen - Palo Alto CA
Richard Simmons - Los Altos CA
Dave E. A. Smith - San Mateo CA
April Dutta - Milpitas CA
J. Kirkwood H. Rough - San Jose CA
Leslie A. Honfi - Sunnyvale CA
Henry Pearce-Percy - Los Gatos CA
John McMurtry - Menlo Park CA
Eric Munro - London, GB2
Assignee:
KLA Instruments Corporation - San Jose CA
International Classification:
H01J 3700
US Classification:
250310
Abstract:
A method and apparatus for a charged particle scanning system and an automatic inspection system, including wafers and masks used in microcircuit fabrication. A charged particle beam is directed at the surface of a substrate for scanning that substrate and a selection of detectors are included to detect at least one of the secondary charged particles, back-scattered charged particles and transmitted charged particles from the substrate. The substrate is mounted on an x-y stage to provide at least one degree of freedom while the substrate is being scanned by the charged particle beam. The substrate is also subjected to an electric field on it's surface to accelerate the secondary charged particles. The system facilitates inspection at low beam energies on charge sensitive insulating substrates and has the capability to accurately measure the position of the substrate with respect to the charged particle beam. Additionally, there is an optical alignment system for initially aligning the substrate beneath the charged particle beam.

Electron Beam Inspection System And Method

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US Patent:
55023061, Mar 26, 1996
Filed:
Mar 17, 1994
Appl. No.:
8/214377
Inventors:
Dan Meisburger - San Jose CA
Alan D. Brodie - Palo Alto CA
Curt Chadwick - Los Gatos CA
Anil Desai - San Jose CA
Hans Dohse - Pleasanton CA
Dennis Emge - San Jose CA
John Greene - Los Altos CA
Ralph Johnson - Los Gatos CA
John McMurtry - Menlo Park CA
Barry Becker - San Jose CA
Ray Paul - Palo Alto CA
Mike Robinson - San Jose CA
Richard Simmons - Los Altos CA
David E. A. Smith - San Mateo CA
John Taylor - San Jose CA
Lee Veneklasen - Castro Valley CA
Dean Walters - Napierville IL
Paul Wieczorek - San Jose CA
Sam Wong - San Jose CA
April Dutta - Milpitas CA
Surendra Lele - Santa Clara CA
Kirkwood Rough - San Jose CA
Henry Pearce-Percy - Los Gatos CA
Jack Y. Jau - Fremont CA
Chun C. Lin - Cupertino CA
Hoi T. Nguyen - Milpitas CA
Yen-Jen Oyang - Cupertino CA
Timothy L. Hutcheson - Los Gatos CA
David J. Clark - Atherton CA
Chung-Shih Pan - Palo Alto CA
Chetana Bhaskar - San Jose CA
Chris Kirk - Beconsfield Bucks, GB2
Eric Munro - London, GB2
Assignee:
KLA Instruments Corporation - San Jose CA
International Classification:
H01J 3726
US Classification:
250310
Abstract:
There is disclosed numerous embodiments of a method and apparatus for a particle scanning system and an automatic inspection system. In each of these a particle beam is directed at the surface of a substrate for scanning that substrate. Also included are a selection of detectors to detect at least one of the secondary particles, back-scattered particles and transmitted particles from the substrate. The substrate is mounted on an x-y stage to provide it with at least one degree of freedom while the substrate is being scanned by the/particle beam. The substrate is also subjected to an electric field on it's surface to accelerate the secondary particles. The system also has the capability to accurately measure the position of the substrate with respect to the charged particle beam. Additionally, there is an optical alignment means for initially aligning the substrate beneath the,particle beam means. To function most efficiently there is also a vacuum means for evacuating and repressurizing a chamber containing the substrate.
April Dutta from Milpitas, CA, age ~69 Get Report