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Ahmad E Madkour

from Midland, MI
Age ~65

Ahmad Madkour Phones & Addresses

  • 3830 E Monroe Rd, Midland, MI 48642 (989) 486-3627
  • 1623 Wood Pointe Ln, Midland, MI 48642 (989) 486-3627
  • Amherst, MA
  • Canton, MI
  • Sunderland, MA
  • East Lansing, MI
  • Leverett, MA
  • Haslett, MI

Work

Company: The dow chemical company - Midland, MI 2010 Position: Associate scientist, organics, polymers, and organometallics

Education

School / High School: Michigan State University 1996 Specialities: Ph.D. in Physical Organic Chemistry

Resumes

Resumes

Ahmad Madkour Photo 1

Ahmad Madkour Midland, MI

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Work:
The Dow Chemical Company
Midland, MI
2010 to 2013
Associate Scientist, Organics, Polymers, and Organometallics

University of Massachusetts

2005 to 2010
Postdoctoral Research Associate

University of Massachusetts
Amherst, MA
2001 to 2010

University of Massachusetts

2001 to 2005
Postdoctoral Research Associate

University of Alexandria

1996 to 2001
Lecturer of Organic Chemistry, Department of Chemistry, Faculty of Science

Michigan State University
East Lansing, MI
1987 to 1996
Graduate Student, Department of Chemistry

Education:
Michigan State University
1996
Ph.D. in Physical Organic Chemistry

University of Alexandria
1987
M.Sc. in Physical Organic Chemistry

University of Alexandria
1981
B.S. in Chemistry

Ahmad Madkour Photo 2

Ahmad Madkour

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Publications

Us Patents

Water-Soluble And Water-Insoluble, Ring Opening Metathesis Polymerization Products, Monomers And Related Methods

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US Patent:
8329927, Dec 11, 2012
Filed:
Sep 19, 2008
Appl. No.:
12/234180
Inventors:
Gregory N. Tew - Amherst MA, US
Ahmad Emad-Eldin Madkour - Amherst MA, US
Sterling Fitzgerald Alfred - Durham NC, US
Paralee Patten King - Princeton MA, US
Semra Colak - Amherst MA, US
Assignee:
University of Massachusetts - Boston MA
International Classification:
C07D 311/00
C07C 69/753
US Classification:
549397, 560120
Abstract:
The invention provides certain novel water-soluble and water-insoluble monomers for ring opening metathesis polymerization and novel polymers, compositions and products, and related methods thereof.

Antimicrobial Polymers

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US Patent:
8445611, May 21, 2013
Filed:
Apr 6, 2012
Appl. No.:
13/441114
Inventors:
Gregory N. Tew - South Deerfield MA, US
Ahmad E. Madkour - Leverett MA, US
Karen Lienkamp - Ware MA, US
Ashlan Marie Musante - Mainz, DE
Assignee:
University of Massachusetts - Boston MA
International Classification:
C08F 28/06
US Classification:
526256, 424 7832, 526270, 526308, 549 29, 549 79
Abstract:
The invention generally relates to novel polymers (SMAMPs) and their syntheses and use. The polymers exhibit promising properties of AMPs. In particularly, for example, a ring-opening metathesis polymerization (ROMP) platform was developed that allows syntheses of SMAMPs that employ a minimum number of norbornene-based building blocks and/or enable easy and independent variation of hydrophobic and hydrophilic groups in the monomer units and/or along the polymeric backbone to finetune and select desirable properties of the polymers.

Antimicrobial Polymers

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US Patent:
20100317870, Dec 16, 2010
Filed:
Jun 8, 2010
Appl. No.:
12/795892
Inventors:
Gregory Tew - South Deerfield MA, US
Ahmad E. Madkour - Leverett MA, US
Karen Lienkamp - Ware MA, US
Ashlan Marie Musante - Mainz, DE
International Classification:
C07D 487/04
C07D 207/40
C07D 207/04
C07D 307/04
US Classification:
548453, 548520, 548542, 549473, 549485
Abstract:
The invention generally relates to novel polymers (SMAMPs) and their syntheses and use. The polymers exhibit promising properties of AMPs. In particularly, for example, a ring-opening metathesis polymerization (ROMP) platform was developed that allows syntheses of SMAMPs that employ a minimum number of norbornene-based building blocks and/or enable easy and independent variation of hydrophobic and hydrophilic groups in the monomer units and/or along the polymeric backbone to finetune and select desirable properties of the polymers.

Photoacid Generators

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US Patent:
20120141939, Jun 7, 2012
Filed:
Nov 30, 2011
Appl. No.:
13/307198
Inventors:
James W. Thackeray - Braintree MA, US
Suzanne M. Coley - Mansfield MA, US
James F. Cameron - Brookline MA, US
Paul J. LaBeaume - Framingham MA, US
Ahmad E. Madkour - Midland MI, US
Vipul Jain - Westborough MA, US
International Classification:
G03F 7/20
C07C 309/06
G03F 7/027
US Classification:
4302851, 4302811, 430311, 562113
Abstract:
A photoacid generator compound has formula (I):wherein G has formula (II):In formula (II), X is S or I, each Ris commonly attached to X and is independently Calkyl; polycyclic or monocyclic Ccycloalkyl; polycyclic or monocyclic Caryl; or a combination comprising at least one of the foregoing groups. G has a molecular weight greater than 263.4 g/mol, or less than 263.4 g/mol. One or more Rgroups are further attached to an adjacent Rgroup, a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 2 or 3. Z in formula (I) comprises the anion of a sulfonic acid, a sulfonimide, or a sulfonamide. A photoresist and coated film also includes the photoacid generator, and a method of forming an electronic device uses the photoresist.

Polymerizable Photoacid Generators

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US Patent:
20120171616, Jul 5, 2012
Filed:
Dec 29, 2011
Appl. No.:
13/339948
Inventors:
James W. Thackeray - Braintree MA, US
Suzanne M. Coley - Mansfield MA, US
Vipul Jain - Westborough MA, US
James F. Cameron - Brookline MA, US
Paul J. LaBeaume - Framingham MA, US
Ahmad E. Madkour - Midland MI, US
International Classification:
G03F 7/20
C07C 69/593
G03F 7/004
C07C 69/54
C08F 228/06
C08G 63/688
US Classification:
4302851, 526243, 528354, 430311, 430296, 560221, 560222, 560195
Abstract:
A compound has formula (I):wherein Q is a halogenated or non-halogenated, Colefin-containing group, A is a fluorine-substituted Calkylene group, a fluorine-substituted Ccycloalkylene group, a fluorine-substituted Carylene group, or a fluorine-substituted Calkylene-arylene group, Z is an anionic group comprising sulfonate, sulfonamide, or sulfonamide, and G has formula (II):wherein X is S or I, each Ris halogenated or non-halogenated and is independently Calkyl group; a polycyclic or monocyclic Ccycloalkyl group; a polycyclic or monocyclic Caryl group; or a combination of these, wherein when X is S, one of the Rgroups is optionally attached to one adjacent Rgroup by a single bond, and a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 3. A copolymer, a photoresist, a coated substrate and method of patterning are disclosed.

Alkyd Dispersion, And A Process For Producing The Same

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US Patent:
20120244288, Sep 27, 2012
Filed:
Nov 1, 2010
Appl. No.:
13/498264
Inventors:
Timothy J. Young - Bay City MI, US
Gary E. Spilman - Midland MI, US
Suresh Subramonian - Cary NC, US
Ray E. Drumright - Midland MI, US
David D. Mall - Apex NC, US
Rosemarie Lauer - Chalfont PA, US
Andrea Greyson - Blue Bell PA, US
Robert Sandoval - Midland MI, US
Ahmad Madkour - Midland MI, US
International Classification:
C09D 191/00
C08K 5/42
C08K 5/13
B05D 7/24
C08K 5/06
US Classification:
4273855, 524601, 524378, 524375, 524156
Abstract:
The instant invention provides a high-solid, solvent-free alkyd dispersion, and a continuous process for producing the same. The aqueous alkyd dispersion, according to the present invention comprises (a) from 40 to 70 percent by weight of one or more alkyds based on the total weight of the dispersion, wherein each one or more alkyds has an acid value of less than 20 and a molecular weight (Mn) in the range of greater than 1000 Dalton; (b) from less than 10 percent by weight of one or more surfactants, based on the total weight of the dispersion; and (c) from 30 to 55 percent by weight of water, based on the total weight of the dispersion; and the dispersion has an average particle size diameter in the range of 0.05 to 5 μm.

Water-Soluble And Water-Insoluble, Ring Opening Metathesis Polymerization Products, Monomers And Related Methods

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US Patent:
20130072650, Mar 21, 2013
Filed:
Nov 11, 2012
Appl. No.:
13/674040
Inventors:
University of Massachusetts - Boston MA, US
Ahmad Emad-Eldin Madkour - Amherst MA, US
Sterling Fizgerald Alfred - Sunderland MA, US
Paralee Patten King - Princeton MA, US
Semra Colak - Amherst MA, US
Assignee:
University of Massachuetts - Boston MA
International Classification:
C08F 232/08
C08F 232/04
C08F 234/02
US Classification:
526259, 526268, 526281
Abstract:
The invention provides certain novel water-soluble and water-insoluble monomers for ring opening metathesis polymerization and novel polymers, compositions and products, and related methods thereof.

Inorganic Polymer Ceramic-Like Coatings And Methods For Their Preparation

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US Patent:
20210246315, Aug 12, 2021
Filed:
Feb 10, 2020
Appl. No.:
16/786313
Inventors:
MARYAM KAZEMZADEH DEHDASHTI - YPSILANTI MI, US
AHMAD MADKOUR - CANTON MI, US
JULIEN MARCHAL - ANN ARBOR MI, US
REED SHICK - MIDLAND MI, US
International Classification:
C09D 1/02
C09D 7/61
C09D 7/40
Abstract:
An inorganic polymer coating. Low cost thermal barrier coatings thermal barrier coating and a process that starts with an aqueous suspension which may be sprayed, dipped, rolled or painted on a surface and cured. The cured thermal barrier coating has high thermal performance, low emissivity, high adhesion to multiple substrates, thermal cycle and thermal shock stability, high hardness, high elasticity and toughness.
Ahmad E Madkour from Midland, MI, age ~65 Get Report