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Wei J Liu

from San Francisco, CA
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Related to:
Shun Ning Ruan, 57Becky LiuKathy LiuShao Ju Ruan, 76Jian Song Liu, 50Xiao H Ruan, 61Tie J Liu, 66Lu J Liu, 64Erica X Ruan, 60Jun Liu Tie, 65Jeffrey Z Xiao, 60Lujun Liu, 61
Connected to:
Adela Liu, 73Alec X Liu, 39Alpha T Liu, 46Amon Y Liu, 58Andrea Y Liu, 46Anqi Liu, 39Arden K Liu, 64Ba S Liu, 62Bailu Liu, 35Ban Liu, 48

Wei Liu Phones & Addresses

  • San Francisco, CA

Professional Records

Real Estate Brokers

Wei Liu Photo 1

Wei Liu, St Louia MO

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Specialties:
Buyer's Agent
Listing Agent
Work:
WTrealty
Po Box 8811, St Louis Mo 63124
(314) 662-1698 (Office)

License Records

Wei Liu

License #:
129 - Active
Category:
Dietetics and Nutrition Practice
Issued Date:
May 14, 1996
Renew Date:
Dec 1, 2016
Expiration Date:
Nov 30, 2017
Type:
Nutritionist

Wei Liu

License #:
32378 - Active
Issued Date:
Sep 5, 2014
Renew Date:
Dec 1, 2015
Expiration Date:
Nov 30, 2017
Type:
Certified Public Accountant

Wei Liu

License #:
19003 - Active
Category:
Architect
Issued Date:
Apr 7, 2005
Expiration Date:
Mar 31, 2017
Organization:
Firm Not Published

Wei Liu

License #:
08266 - Expired
Category:
Accountants
Type:
Certified Public Accountant

Wei Liu

License #:
08266 - Active
Category:
Accountants
Issued Date:
Jan 20, 2017
Expiration Date:
Jun 30, 2018
Type:
Certified Public Accountant

Medicine Doctors

Wei Liu Photo 2

Wei Liu

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Specialties:
Neurology, Vascular
Work:
University Of Louisville PhysiciansUniversity Of Louisville Physicians Neurology
401 E Chestnut St UNIT 510, Louisville, KY 40202
(502) 589-0802 (phone), (502) 589-0805 (fax)
Education:
Medical School
Shanghai Med Univ, Shanghai First Med Univ, Shanghai, China
Graduated: 1990
Procedures:
Sleep and EEG Testing
Conditions:
Hemorrhagic stroke
Ischemic Stroke
Acute Myocardial Infarction (AMI)
Acute Renal Failure
Alzheimer's Disease
Languages:
English
Spanish
Description:
Dr. Liu graduated from the Shanghai Med Univ, Shanghai First Med Univ, Shanghai, China in 1990. He works in Louisville, KY and specializes in Neurology, Vascular. Dr. Liu is affiliated with Jewish Hospital and University Of Louisville Hospital.
Wei Liu Photo 3

Wei Liu

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Specialties:
Internal Medicine
Work:
Wei Liu MD
8303 Arlington Blvd STE 203, Fairfax, VA 22031
(703) 208-1998 (phone)
Education:
Medical School
Beijing Med Univ, Beijing City, Beijing, China
Graduated: 1991
Procedures:
Electrocardiogram (EKG or ECG)
Vaccine Administration
Conditions:
Abnormal Vaginal Bleeding
Anemia
Cardiac Arrhythmia
Contact Dermatitis
Esophagitis
Languages:
Chinese
English
Description:
Dr. Liu graduated from the Beijing Med Univ, Beijing City, Beijing, China in 1991. She works in Fairfax, VA and specializes in Internal Medicine.
Wei Liu Photo 4

Wei Liu

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Specialties:
Anesthesiology
Work:
Gulf Anesthesia
5445 Ln Br St, Houston, TX 77004
(713) 528-6800 (phone), (713) 522-4251 (fax)
Education:
Medical School
Shanghai Second Med Univ, Shanghai City, Shanghai, China
Graduated: 1982
Languages:
English
Spanish
Description:
Dr. Liu graduated from the Shanghai Second Med Univ, Shanghai City, Shanghai, China in 1982. He works in Houston, TX and specializes in Anesthesiology. Dr. Liu is affiliated with Houston Hospital For Specialized Surgery.
Wei Liu Photo 5

Wei Liu

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Specialties:
Anatomic Pathology & Clinical Pathology
Work:
Peoria Tazwell Pathology GroupPeoria Tazewell Pathology Group
5409 N Knoxville Ave, Peoria, IL 61614
(866) 759-4528 (phone), (309) 272-0812 (fax)

Peoria Tazwell Pathology Group
221 NE Gln Oak Ave, Peoria, IL 61636
(309) 672-4918 (phone), (309) 672-5919 (fax)

Ameripathpathology
1907 W Sycamore St, Kokomo, IN 46901
(765) 456-5729 (phone), (765) 456-5014 (fax)
Education:
Medical School
Shandong Med Univ, Jinan, Shandong, China (242 46 Prior 1 1 71)
Graduated: 1994
Languages:
English
Description:
Dr. Liu graduated from the Shandong Med Univ, Jinan, Shandong, China (242 46 Prior 1 1 71) in 1994. She works in Peoria, IL and 2 other locations and specializes in Anatomic Pathology & Clinical Pathology. Dr. Liu is affiliated with Community Howard Specialty Hospital, Galesburg Cottage Hospital, Pekin Hospital, Saint Vincent Kokomo, UnityPoint Health Methodist Hospital and Unitypoint
Wei Liu Photo 6

Wei Liu

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Wei Liu Photo 7

Wei Liu

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Specialties:
Internal Medicine
Education:
Beijing School Of Medicine (1990) *
New York University - Mount Sinai (2002) *Internal Medicine

Lawyers & Attorneys

Wei Liu Photo 8

Wei Liu - Lawyer

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Licenses:
New York - Currently registered 2011
Education:
University of Pennsylvania Law School
Wei Liu Photo 9

Wei Liu - Lawyer

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Address:
Freshfields Bruckhaus Deringer LLP, Beijing Representative Office
(381) 174-1906 (Office)
Licenses:
New York - Currently registered 2013
Education:
Peking University Law School

Resumes

Resumes

Wei Liu Photo 10

Wei Liu San Jose, CA

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Work:
Atherton Healthcare

May 2012 to 2000
San Francisco Health Care &Rehab
San Francisco, CA
Feb 2011 to May 2012
Sequoia Hospital, UCSF, Stanford Hospital
San Jose, CA
Mar 2009 to May 2010
Examiner
Sequoia Hospital, UCSF, Stanford Hospital

2008 to 2010
Nursing Student's internship
Kaiser Hospital
San Jose, CA
Dec 2007 to Mar 2009
Examiner
Volunteer
Jun 2006 to Jun 2007
Kaiser Hospital
Santa Clara, CA
Dec 2006 to Jan 2007
Phlebotomy externship-660 draws
Education:
San Francisco State University
May 2010
Bachelor of Science in Nursing
De Anza College
Cupertino, CA
Jun 2006
Associate in Art
Wei Liu Photo 11

Wei Liu

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Work:
wt realty
St. Louis, MO
broker
Wei Liu Photo 12

Wei Liu San Lorenzo

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Work:
Zazzel

May 2012 to 2000
Freelance Soft Good Designer
Living Focus Interior Studio

Mar 2012 to 2000
Freelance Interior Designer
Chao's Construction

2009 to 2010
Internship Interior Designer
Gary D Nelson Associates Inc
Hayward, CA
2004 to Dec 2006
Organizer
CHOI AND NG CAF
Oakland, CA
Aug 2003 to Jul 2005
Cashier
Long Fong
Hong Kong, Hong Kong Island
1999 to 2003
Part-time Interior Designer
Education:
University of Davis
Sacramento, CA
2009 to 2012
BA in Design in Furniture, Interior, and Graphic
Laney College
Oakland, CA
2007 to 2009
A.A. in Interior Architecture

Business Records

Name / Title
Company / Classification
Phones & Addresses
Wei Liu
President
Qiao Ji Mandarin
2567 22 Ave, San Francisco, CA 94116
Wei Liu
President
CHINAMERICA RESTAURANT GROUP CORPORATION
640 Jackson St, San Francisco, CA 94133
870 Market St, San Francisco, CA 94102
Wei Hong Liu
President
H & B, INC
4115 Judah St, San Francisco, CA 94122
Wei Liu
President
N.E. STONE CORP
225 Raymond Ave, San Francisco, CA 94134
Wei Liu
Director Information Technology
Sf Coordinating Center
Architectural Services
185 Berry St, San Francisco, CA 94107
Wei Liu
ASCENDING REAL ESTATE, LLC
Wei Liu
President
HUMAN AND ENVIRONMENT LINKAGE PROGRAMME (HELP)
Nonclassifiable Establishments
34935 Nova Ter, Fremont, CA 94555
PO Box 1365, Okemos, MI 48805
Wei Feng Liu
Kings United Group, LC
Scientific Research and Trading
833 Washington St, San Francisco, CA 94108
1566 Deluca Dr, San Jose, CA 95131

Publications

Isbn (Books And Publications)

TCP/IP Tutorial and Technical Overview

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Author

Wei Liu

ISBN #

0738494682

Zhonghua Wen Ming Chuan Zhen: Chinese Civilization in a New Light

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Author

Wei Liu

ISBN #

7532608522

Zhuan Gui Zhong De Jing Ji Zeng Zhang Yu Jing Ji Jie Gou: Economic Growth and Structure in Transitive Economy

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Author

Wei Liu

ISBN #

7800877884

Us Patents

Monitoring Substrate Processing By Detecting Reflectively Diffracted Light

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US Patent:
6849151, Feb 1, 2005
Filed:
Aug 7, 2002
Appl. No.:
10/215065
Inventors:
Michael S. Barnes - San Ramon CA, US
John P. Holland - San Jose CA, US
David S. L. Mui - Fremont CA, US
Wei Liu - San Jose CA, US
International Classification:
H05H 100
C23C 1600
H01L 2100
US Classification:
15634524, 118712, 438 7
Abstract:
A substrate is placed in a process zone and an energized process gas is maintained in the process zone to process the substrate. A light beam is reflectively diffracted from a pattern of features of the substrate being processed, the reflected beam is monitored, and a signal is generated in relation to the monitored beam. During processing, a width of the features of the substrate can change. The generated signal is evaluated to detect the occurrence of a change in the width of the features.

Methodology For Repeatable Post Etch Cd In A Production Tool

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US Patent:
6858361, Feb 22, 2005
Filed:
Sep 9, 2002
Appl. No.:
10/238453
Inventors:
David S. L. Mui - Fremont CA, US
Hiroki Sasano - Sunnyvale CA, US
Wei Liu - San Jose CA, US
International Classification:
G01B011/14
US Classification:
430 30, 430313, 438 7, 438 8, 438 16, 356625, 356636, 15634524, 355 40, 355 55
Abstract:
A method and apparatus for processing a semiconductor wafer is provided for reducing dimensional variation by feeding forward information relating to photoresist mask CD and profile to adjust the next process the inspected wafer will undergo (e. g. , a photoresist trim process). After the processing step, dimensions of a structure formed by the process, such as the CD of a gate formed by the process, are measured, and this information is fed back to the process tool to adjust the process for the next wafer to further reduce dimensional variation. By taking into account photoresist CD and profile variation when choosing a resist trim recipe, post-etch CD is decoupled from pre-etch CD and profile. With automatic compensation for pre-etch CD, a very tight distribution of post-etch CD is achieved. In certain embodiments, the CD and profile measurements, trim, etch processing and post-etch cleaning are performed at a single module in a controlled environment.

Method And Apparatus For Growing Semiconductor Crystals With A Rigid Support With Carbon Doping And Resistivity Control And Thermal Gradient Control

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US Patent:
6896729, May 24, 2005
Filed:
Jul 3, 2002
Appl. No.:
10/190001
Inventors:
Xiao Gordon Liu - Fremont CA, US
Wei Guo Liu - Sunnyvale CA, US
Assignee:
AXT, Inc. - Fremont CA
International Classification:
C30B011/06
US Classification:
117 81, 117 82, 117 83, 117223
Abstract:
Group III-V, II-VI and related monocrystalline compounds are grown with a rigid support of a sealed ampoule, carbon doping and resistivity control, and thermal gradient control in a crystal growth furnace. A support cylinder provides structural support for the combined sealed ampoule crucible assembly, while low-density insulating material inside the support cylinder deters convection and conduction heating. Radiation channels penetrating the low-density material provide pathways for radiation heating into and out of the seed well and transition regions of the crystal growth crucible. A hollow core in the insulation material directly beneath the seed well provides cooling in the center of the growing crystal, which enables uniform, level growth of the crystal ingot and a flat crystal-melt interface which results in crystal wafers with uniform electrical properties.

Method And System For Realtime Cd Microloading Control

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US Patent:
6924088, Aug 2, 2005
Filed:
Jun 18, 2003
Appl. No.:
10/464479
Inventors:
David S. L. Mui - Fremont CA, US
Wei Liu - San Jose CA, US
Shashank C. Deshmukh - San Jose CA, US
Hiroki Sasano - Sunnyvale CA, US
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
G01B011/02
H01L021/66
US Classification:
430313, 430 30, 15634524, 356635, 356636, 118696, 438 7, 438 16
Abstract:
A method and apparatus for processing a semiconductor wafer is provided for reducing CD microloading variation. OCD metrology is used to inspect a wafer to determine pre-etch CD microloading, by measuring the CD of dense and isolated photoresist lines. Other parameters can also be measured or otherwise determined, such as sidewall profile, photoresist layer thickness, underlying layer thickness, photoresist pattern density, open area, etc. The inspection results are fed forward to the etcher to determine process parameters, such as resist trim time and/or etch conditions, thereby achieving the desired post-etch CD microloading. In certain embodiments, the CD and profile measurements, trim, etch processing and post-etch cleaning are performed at a single module in a controlled environment. All of the transfer and processing steps performed by the module are performed in a clean environment, thereby increasing yield by avoiding exposing the wafer to the atmosphere and possible contamination between steps.

Method And Apparatus For Controlling Etch Processes During Fabrication Of Semiconductor Devices

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US Patent:
6960416, Nov 1, 2005
Filed:
May 1, 2003
Appl. No.:
10/428145
Inventors:
David S L Mui - Fremont CA, US
Wei Liu - San Jose CA, US
Hiroki Sasano - Sunnyvale CA, US
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
G01B011/02
US Classification:
430 30, 430313, 438 7, 438 16, 438707, 356635, 356625, 15634524, 118696, 118719
Abstract:
A method for controlling etch processes during fabrication of semiconductor devices comprises tests and measurements performed on non-product and product substrates to define an N-parameter CD control graph that is used to calculate a process time for trimming a patterned mask to a pre-determined width. An apparatus for performing such a method.

Method For Controlling Accuracy And Repeatability Of An Etch Process

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US Patent:
7094613, Aug 22, 2006
Filed:
Oct 21, 2003
Appl. No.:
10/690318
Inventors:
David Mui - Fremont CA, US
Wei Liu - San Jose CA, US
Hiroki Sasano - Sunnyvale CA, US
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
H01L 21/00
US Classification:
438 9, 438 16, 438714, 438719, 438725, 216 60, 216 67, 216 79
Abstract:
Embodiments of the invention generally relate to a method for etching in a processing platform (e. g. a cluster tool) wherein robust pre-etch and post-etch data may be obtained in-situ. The method includes the steps of obtaining pre-etched critical dimension (CD) measurements of a feature on a substrate, etching the feature; treating the etched substrate to reduce and/or remove sidewall polymers deposited on the feature during etching, and obtaining post-etched CD measurements. The CD measurements may be utilized to adjust the etch process to improved the accuracy and repeatability of device fabrication.

Method And Apparatus For Etching Material Layers With High Uniformity Of A Lateral Etch Rate Across A Substrate

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US Patent:
7250373, Jul 31, 2007
Filed:
Aug 27, 2004
Appl. No.:
10/927807
Inventors:
David Mui - Fremont CA, US
Wei Liu - San Jose CA, US
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
H01L 21/302
US Classification:
438714, 438710, 438711, 438712
Abstract:
A method and apparatus for etching material layers with high uniformity of a lateral etch rate across a substrate using a gas mixture that includes a passivation gas. The passivation gas is provided to a peripheral region of the substrate to passivate sidewalls of the structures being etched.

Expression In Filamentous Fungi Of Protease Inhibitors And Variants Thereof

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US Patent:
7279564, Oct 9, 2007
Filed:
Oct 22, 2004
Appl. No.:
10/971596
Inventors:
Hans De Nobel - Almere, NL
David A. Estell - San Mateo CA, US
Wei Liu - Palo Alto CA, US
Scott D. Power - San Bruno CA, US
Brian Schmidt - Half Moon Bay CA, US
Huaming Wang - Fremont CA, US
Assignee:
Genencor International, Inc. - Palo Alto CA
International Classification:
C07H 21/02
C12N 15/00
C12N 1/15
US Classification:
536 231, 4353201, 43525411, 435 711
Abstract:
Described herein are protease inhibitors, variants thereof and methods for their production.

Amazon

Simultaneous Inference in Regression (Chapman & Hall/CRC Monographs on Statistics & Applied Probability)

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Simultaneous confidence bands enable more intuitive and detailed inference of regression analysis than the standard inferential methods of parameter estimation and hypothesis testing. Simultaneous Inference in Regression provides a thorough overview of the construction methods and applications of si...
Author

Wei Liu

Binding

Hardcover

Pages

292

Publisher

CRC Press

ISBN #

1439828091

EAN Code

9781439828090

ISBN #

16

Wideband Beamforming: Concepts and Techniques

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This book provides an excellent reference for all professionals working in the area of array signal processing and its applications in wireless communications. Wideband beamforming has advanced with the increasing bandwidth in wireless communications and the development of ultra wideband (UWB) tec...
Author

Wei Liu, Stephan Weiss

Binding

Hardcover

Pages

302

Publisher

Wiley

ISBN #

0470713925

EAN Code

9780470713921

ISBN #

15

Harvard Girl-Liu Yiting-Documentary on Quality Training (Chinese Edition)

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Starting from the inspiration to the interests of kids and gradually implementing beneficial measure on the precondition of willing acceptation of the kids is really the effective way to improve the quality of kids. The methods of forcible execution and over-anxiously helping kids to grow will affec...
Author

liu wei hua zhang xin wu

Binding

Paperback

Pages

299

Publisher

Writers Publishing House

ISBN #

750631942X

EAN Code

9787506319423

ISBN #

13

Transradial Approach for Percutaneous Interventions

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This book outlines the state of the art in transradial intervention and illustrates case-based learning for the transradial access (TR access) technique, especially in complex lesions. Offering a practical guide, it includes essential tips and tricks on how to overcome anatomical complexities, how t...
Binding

Hardcover

Pages

279

Publisher

Springer

ISBN #

9401773491

EAN Code

9789401773492

ISBN #

12

A New Reading of Records of the Grand Historian (Volume II) (Chinese Edition)

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his book is not only a magnum opus of the science of history, but also a landmark in the history of literature. It creates a plethorea of characters with larger-than-life personalities based on various styles of art and a wealth of historical materials. Sima Qian goes to great lengths to integrate h...
Author

Liu Wei Zheng Lin

Binding

Kindle Edition

Pages

327

Publisher

YBWXX

ISBN #

17

Stochastic Partial Differential Equations: An Introduction (Universitext)

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This book provides an introduction to the theory of stochastic partial differential equations (SPDEs) of evolutionary type. SPDEs are one of the main research directions in probability theory with several wide ranging applications. Many types of dynamics with stochastic influence in nature or man-ma...
Author

Wei Liu, Michael Röckner

Binding

Paperback

Pages

266

Publisher

Springer

ISBN #

3319223534

EAN Code

9783319223537

ISBN #

14

Johann's Awakening

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At the dawning of the Age of Aquarius, young Jonathan Livingston Seagull caught the world’s notice as he sought to break beyond the pitiful life of those average mortals populating the earth. Conquering all, entering into the eternal bliss, Jonathan left us, as did this magical spiritual age of enli...
Author

Arthur Telling

Binding

Kindle Edition

Pages

58

ISBN #

11

Liu Wei: Trilogy

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Considered one of China's foremost artists, Liu Wei (born 1972) uses performance, sculpture, photography, video and installation to explore themes of late capitalist excess and the anxieties of cultural identity. This latest monograph is the catalogue for the artist's most ambitious exhibition to da...
Author

Guo Xiaoyan, Gunnar Kvaran

Binding

Hardcover

Pages

128

Publisher

Charta / Long March Space

ISBN #

8881588293

EAN Code

9788881588299

ISBN #

3

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Wei J Liu from San Francisco, CA Get Report