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Wai Chung Lee

from South San Francisco, CA
Age ~78
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Also known as:
Wai C Lee, Waichung Lee, Wai C Mak, Whichung C Lee, Whi C Lee
Related to:
Kathleen K Mak, 48So K Lee, 68Lam P LeelamMei Mak Shao, 79Michael Mak, 42Wai Mak Siu, 74Ling Mak Siu, 72Victoria Lee, 37Brian A Lee, 36Giu Wai MakHenry Mak, 37Siu Ming Mak, 80Willie E LeeCalvin K Lee, 42
Connected to:
A Lee, 45Abi A Lee, 31Abigail LeeAbu B Lee, 66Adela C Lee, 64Adelyn S Lee, 39Adrian J Lee, 36Adriane C Lee, 57Aen H Lee, 44Aeren Lee, 33

Wai Lee Phones & Addresses

  • South San Francisco, CA
  • Pacifica, CA
  • Daly City, CA
  • San Francisco, CA
  • Modesto, CA

Professional Records

Lawyers & Attorneys

Wai Lee Photo 1

Wai Lee - Lawyer

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Office:
Chiu, Szeto & Cheng
Specialties:
Civil Litigation
Arbitration
Mediation
ISLN:
919742220
Admitted:
1998
Wai Lee Photo 2

Wai Lee - Lawyer

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Office:
Eddie Lee & Co.
ISLN:
919751413
Admitted:
2000
Wai Lee Photo 3

Wai Lee - Lawyer

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Office:
Cham & Co.
Specialties:
Conveyancing
ISLN:
919732023
Admitted:
1988

Medicine Doctors

Wai Lee Photo 4

Dr. Wai K Lee, Oakland CA - MD (Doctor of Medicine)

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Specialties:
Family Medicine
Address:
KAISER PERMANENTE
280 W Macarthur Blvd, Oakland, CA 94611
(925) 682-2400 (Phone)
Certifications:
Family Practice, 2011
Awards:
Healthgrades Honor Roll
Languages:
English
Education:
Medical School
Drexel University College of Medicine
Graduated: 2007
Wai Lee Photo 5

Wai Ping P Lee, San Francisco CA - MSW (Master of Social Work)

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Specialties:
Social Work
Clinical Social Work
Address:
3626 Balboa St, San Francisco, CA 94121
(415) 668-5955 (Phone)
Languages:
English
Wai Lee Photo 6

Wai L. Lee

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Specialties:
Rheumatology
Work:
Providence Medical GroupProvidence Medical Group Arthritis Center
5050 NE Hoyt St STE 155, Portland, OR 97213
(503) 215-6819 (phone), (503) 215-6492 (fax)
Education:
Medical School
Washington University School of Medicine
Graduated: 1995
Procedures:
Arthrocentesis
Conditions:
Ankylosing Spondylitis (AS)
Osteoarthritis
Rotator Cuff Syndrome and Allied Disorders
Systemic Lupus Erythematosus
Allergic Rhinitis
Languages:
English
Spanish
Description:
Dr. Lee graduated from the Washington University School of Medicine in 1995. He works in Portland, OR and specializes in Rheumatology. Dr. Lee is affiliated with Providence Portland Medical Center.
Wai Lee Photo 7

Wai Lee

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Specialties:
Colon & Rectal Surgery
Work:
ALSA Medical Group
205 E Riv Park Cir STE 460, Fresno, CA 93720
(559) 260-4500 (phone), (559) 260-4501 (fax)
Education:
Medical School
University of Virginia School of Medicine
Graduated: 1979
Procedures:
Colonoscopy
Destruction of Lesions on the Anus
Hemorrhoid Procedures
Proctosigmoidoscopy
Sigmoidoscopy
Conditions:
Anal Fissure
Anal or Rectal Abscess
Benign Polyps of the Colon
Celiac Disease
Cholelethiasis or Cholecystitis
Languages:
English
Spanish
Description:
Dr. Lee graduated from the University of Virginia School of Medicine in 1979. He works in Fresno, CA and specializes in Colon & Rectal Surgery. Dr. Lee is affiliated with Fresno Heart & Surgical Hospital.
Wai Lee Photo 8

Wai H. Lee

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Specialties:
Cardiovascular Disease
Work:
Beacon Medical GroupElkhart Cardiology
303 S Nappanee St STE B, Elkhart, IN 46514
(574) 296-3466 (phone), (574) 296-3332 (fax)
Education:
Medical School
University of Rochester School of Medicine and Dentistry
Graduated: 1979
Procedures:
Cardiac Stress Test
Cardioversion
Echocardiogram
Angioplasty
Cardiac Catheterization
Continuous EKG
Electrocardiogram (EKG or ECG)
Pacemaker and Defibrillator Procedures
Conditions:
Angina Pectoris
Aortic Valvular Disease
Cardiomyopathy
Acute Myocardial Infarction (AMI)
Atrial Fibrillation and Atrial Flutter
Languages:
English
Description:
Dr. Lee graduated from the University of Rochester School of Medicine and Dentistry in 1979. He works in Elkhart, IN and specializes in Cardiovascular Disease. Dr. Lee is affiliated with Memorial Hospital Of South Bend.
Wai Lee Photo 9

Wai Kwan I. Lee

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Specialties:
Obstetrics & Gynecology
Work:
Lutherans Brooklyn Chinese Family Health Center
5008 7 Ave FL 1, Brooklyn, NY 11220
(718) 210-1030 (phone), (718) 871-0969 (fax)
Education:
Medical School
Albert Einstein College of Medicine at Yeshiva University
Graduated: 1985
Procedures:
Cesarean Section (C-Section)
D & C Dilation and Curettage
Hysterectomy
Nutrition Therapy
Tubal Surgery
Vaccine Administration
Vaginal Delivery
Conditions:
Abnormal Vaginal Bleeding
Complicating Pregnancy or Childbirth
Conditions of Pregnancy and Delivery
Breast Disorders
Diabetes Mellitus Complicating Pregnancy or Birth
Languages:
Chinese
English
Description:
Dr. Lee graduated from the Albert Einstein College of Medicine at Yeshiva University in 1985. She works in Brooklyn, NY and specializes in Obstetrics & Gynecology. Dr. Lee is affiliated with Lutheran Medical Center.
Wai Lee Photo 10

Wai Kin R. Lee

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Specialties:
Nephrology
Work:
Kaiser Permanente Medical GroupKaiser Permanente South San Francisco Medical Center
1200 El Camino Real, South San Francisco, CA 94080
(650) 742-2000 (phone), (650) 742-2606 (fax)
Education:
Medical School
Univ of Hong Kong, Fac of Med, Hong Kong
Graduated: 1986
Procedures:
Dialysis Procedures
Conditions:
Acute Renal Failure
Bronchial Asthma
Chronic Renal Disease
Diabetes Mellitus (DM)
Septicemia
Languages:
English
Description:
Dr. Lee graduated from the Univ of Hong Kong, Fac of Med, Hong Kong in 1986. He works in South San Francisco, CA and specializes in Nephrology. Dr. Lee is affiliated with Kaiser Permanente Medical Center and UCSF Medical Center Parnassus.
Wai Lee Photo 11

Wai Nang P. Lee

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Specialties:
Endocrinology, Diabetes & Metabolism, Pediatrics
Work:
Harbor UCLA Medical Center Endocrinology
1000 W Carson St STE 446, Torrance, CA 90502
(310) 222-1861 (phone), (310) 533-0627 (fax)
Education:
Medical School
Stanford University School of Medicine
Graduated: 1971
Languages:
English
Spanish
Description:
Dr. Lee graduated from the Stanford University School of Medicine in 1971. He works in Torrance, CA and specializes in Endocrinology, Diabetes & Metabolism and Pediatrics. Dr. Lee is affiliated with Harbor UCLA Medical Center.

Business Records

Name / Title
Company / Classification
Phones & Addresses
Wai Ming Lee
Secretary
T E J Auto (1995)
P A C Auto Shop Ltd
Automobile Repairing & Service
1832 Powell St, Vancouver, BC V5L 1H9
(604) 254-6011
Wai C. Lee
President
Victoria Clothing California Inc
Ret Women's Clothing
126 Hawthorne St, San Francisco, CA 94107
PO Box 3533, Cherry Hill, NJ 08034
(415) 543-3518
Wai M. Lee
Vice-President
Ming Shu Investment Limited
Nonresidential Building Operator Dwelling Operator Apartment Building Operator
1718 Clay St, San Francisco, CA 94109
(415) 441-6800
Wai Lee
Vice-President
CollabRx
Information Technology and Services · Mfg Integrated Circuit Fabrication Equipment
44 Montgomery St SUITE 800, San Francisco, CA 94104
140 2 St, Petaluma, CA 94952
Wai Lee
Principal
Venstar Properties
Nonresidential Building Operator
32720 Belami Loop, Union City, CA 94587
Wai Lee
Principal
Endless Targets
Mfg Sporting/Athletic Goods
2966 Groom Dr, Richmond, CA 94806
Wai Ming Lee
Secretary
T E J Auto (1995)
Automobile Repairing & Service
(604) 254-6011
Wai Lee
MAIN MOON OH INC

Publications

Us Patents

Ethylenediaminetetraacetic Acid Or Its Ammonium Salt Semiconductor Process Residue Removal Process

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US Patent:
6367486, Apr 9, 2002
Filed:
Aug 10, 2000
Appl. No.:
09/635650
Inventors:
Wai Mun Lee - Fremont CA
Zhefei Jessie Chen - Fremont CA
Assignee:
EKC Technology, Inc. - Hayward CA
International Classification:
B08B 304
US Classification:
134 13, 510175, 510176, 510245, 510255, 510264, 510266, 510499, 134 39, 134 40
Abstract:
An ethylenediaminetetraacetic acid or a mono-, di-, tri- or tetraammonium salt thereof residue cleaning composition removes photoresist and other residue from integrated circuit substrates. The balance of the composition is desirably made up of water, preferably high purity deionized water, or another suitable polar solvent. A process for removing photoresist or other residue from a substrate, such as an integrated circuit semiconductor wafer including titanium metallurgy, comprises contacting the substrate with the composition for a time and at a temperature sufficient to remove the photoresist or other residue from the substrate. Use of the ethylenediaminetetraacetic acid or a mono-, di-, tri- or tetraammonium salt thereof in the composition and process provides superior residue removal without attacking titanium or other metallurgy, oxide or nitride layers on the substrate.

Alkanolamine Semiconductor Process Residue Removal Process

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US Patent:
6399551, Jun 4, 2002
Filed:
Nov 22, 1999
Appl. No.:
09/444548
Inventors:
Wai Mun Lee - Fremont CA
Assignee:
EKC Technology, Inc. - Hayward CA
International Classification:
C11D 732
US Classification:
510175, 510176, 510178, 510245, 510255, 510264, 510271, 510499, 510477, 510488, 134 12, 134 13, 134 39
Abstract:
A two carbon atom linkage alkanolamine compound composition comprises the two carbon atom linkage alkanolamine compound, gallic acid or catechol, and optionally, an aqueous hydroxylamine solution. The balance of the composition is made up of water, preferably high purity deionized water, or another suitable polar solvent. A process for removing photoresist or other residue from a substrate, such as an integrated circuit semiconductor wafer including titanium metallurgy, comprises contacting the substrate with the composition for a time and at a temperature sufficient to remove the photoresist or other residue from the substrate. Use of the two carbon atom linkage alkanolamine compound in the composition and process provides superior residue removal without attacking titanium or other metallurgy, oxide or nitride layers on the substrate.

Post Etch Cleaning Composition And Process For Dual Damascene System

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US Patent:
6417112, Jul 9, 2002
Filed:
Jun 30, 1999
Appl. No.:
09/343532
Inventors:
Catherine M. Peyne - Hayward CA
David J. Maloney - Livermore CA
Shihying Lee - Fremont CA
Wai Mun Lee - Fremont CA
Leslie W. Arkless - Glasgow, GB
Assignee:
EKC Technology, Inc. - Hayward CA
International Classification:
H01L 21302
US Classification:
438754, 438963, 134 1
Abstract:
A new cleaning chemistry based on a choline compound, such as choline hydroxide, is provided in order to address the problem of dual damascene fabrication. An etch stop inorganic layer at the bottom of a dual damascene structure protects the underlying interconnect of copper and allows a better cleaning. A two step etch process utilizing the etch stop layer is used to achieve the requirements of UISI manufacturing in a dual damascene structure.

Ethyenediaminetetraacetic Acid Or Its Ammonium Salt Semiconductor Process Residue Removal Composition And Process

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US Patent:
6492311, Dec 10, 2002
Filed:
Apr 4, 1997
Appl. No.:
08/833382
Inventors:
Wai Mun Lee - Fremont CA
Zhefei Jessie Chen - Fremont CA
Assignee:
EKC Technology, Inc. - Hayward CA
International Classification:
C11D 732
US Classification:
510176, 510175, 510245, 510255, 510477, 510488, 510499
Abstract:
An ethylenediaminetetraacetic acid or a mono- di- tri- or tetraammonium salt thereof residue cleaning composition removes photoresist and other residue from integrated circuit substrates. The balance of the composition is desirably made up of water, preferably high purity deionized water, or another suitable polar solvent. A process for removing photoresist or other residue from a substrate, such as an integrated circuit semiconductor wafer including titanium metallurgy, comprises contacting the substrate with the composition for a time and at a temperature sufficient to remove the photoresist or other residue from the substrate. Use of the ethylenediaminetetraacetic acid or a mono- di- tri- or tetraammonium salt thereof in the composition and process provides superior residue removal without attacking titanium or other metallurgy, oxide or nitride layers on the substrate.

Alkanolamine Semiconductor Process Residue Removal Composition And Process

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US Patent:
6564812, May 20, 2003
Filed:
Jun 4, 2002
Appl. No.:
10/160035
Inventors:
Wai Mun Lee - Fremont CA
Assignee:
EKC Technology, Inc. - Hayward CA
International Classification:
B08B 304
US Classification:
134 13, 134 39, 510175, 510176, 510178, 510245, 510255, 510264, 510271, 510499, 510477, 510488
Abstract:
A two carbon atom linkage alkanolamine compound composition comprises the two carbon atom linkage alkanolamine compound, gallic acid or catechol, and optionally, an aqueous hydroxylamine solution. The balance of the composition is made up of water, preferably high purity deionized water, or another suitable polar solvent. A process for removing photoresist or other residue from a substrate, such as an integrated circuit semiconductor wafer including titanium metallurgy, comprises contacting the substrate with the composition for a time and at a temperature sufficient to remove the photoresist or other residue from the substrate. Use of the two carbon atom linkage alkanolamine compound in the composition and process provides superior residue removal without attacking titanium or other metallurgy, oxide or nitride layers on the substrate.

Method Of And Apparatus For Substrate Pre-Treatment

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US Patent:
6696363, Feb 24, 2004
Filed:
Jun 6, 2001
Appl. No.:
09/874330
Inventors:
Wai M. Lee - Fremont CA
David J. Maloney - Pleasanton CA
Paul J. Roman - Pleasanton CA
Michael A. Fury - San Francisco CA
Ross H. Hill - Coquitlam, CA
Clifford Henderson - Conyers GA
Sean Barstow - Atlanta GA
Assignee:
EKC Technology, Inc. - Hayward CA
International Classification:
H01L 2144
US Classification:
438681, 430312, 427100
Abstract:
The present invention relates generally to a method and apparatus for converting a precursor material, preferably organometallic, to a film, preferably metal-containing, that is adherent to at least a portion of a substrate. Both method and apparatus include a pre-conversion step or section, and a step or section for substantial conversion of a portion of material from the pre-conversion step or section into the form of a predetermined pattern, wherein this substantial conversion results in a metal-containing patterned layer on the substrate.

Semiconductor Process Residue Removal Composition And Process

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US Patent:
6825156, Nov 30, 2004
Filed:
Jun 6, 2002
Appl. No.:
10/162679
Inventors:
Wai Mun Lee - Fremont CA
Katy Ip - Oakland CA
Xuan-Dung Dinh - San Jose CA
David John Maloney - Pleasanton CA
Assignee:
EKC Technology, Inc. - Hayward CA
International Classification:
C11D 726
US Classification:
510176, 510175, 510245, 510255, 134 13, 134 2, 134 38, 134 40
Abstract:
A residue remover for removing polymeric material and etch residue includes 2-(2-aminoethylamino)-ethanol and optionally another two-carbon atom linkage alkanolamine compound, gallic acid or catechol, water, a polar organic solvent, and hydroxylamine. A process for removing photoresist or other residue from a substrate, such as an integrated circuit semiconductor wafer including titanium metallurgy, includes the steps of contacting the substrate with the above composition for a time and at a temperature sufficient to remove the photoresist or other residue from the substrate. Use of 2-(2-aminoethylamino)-ethanol in the composition and process provides superior residue removal without attacking titanium or other metallurgy on the substrate. The composition preferably has a flash point greater than about 130Â C.

Cleaning Solutions Including Nucleophilic Amine Compound Having Reduction And Oxidation Potentials

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US Patent:
7051742, May 30, 2006
Filed:
Apr 19, 2004
Appl. No.:
10/826286
Inventors:
Wai Mun Lee - Fremont CA, US
Robert J. Small - Satsuma AL, US
Assignee:
EKC Technology, Inc. - Hayward CA
International Classification:
B08B 3/04
C11D 3/20
C11D 3/30
C11D 3/43
US Classification:
134 12, 510175, 510176, 510178, 510245, 510255, 510264, 510271, 510477, 510499, 134 13, 134 39
Abstract:
A composition for removing resists and etching residue from substrates containing at least one nucleophilic amine compound having oxidation and reduction potentials, at least one organic solvent, water and, optionally, a chelating agent is described. The chelating agent is preferred to be included since it provides added stability and activity to the cleaning composition so that the composition has long term effectiveness. If a chelating agent is not present, the composition, while providing for adequate stripping and cleaning upon initial use of the composition following mixing, has only short term stability. In this latter instance, the nucleophilic amine compound and organic solvent components of the composition preferably are maintained separate from each other until it is desired to use the composition. Thereafter, the components are combined. Following use of the composition, the non-used portion of the composition can be disposed of or be reactivated by the addition of a chelating agent.
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Wai Chung Lee from South San Francisco, CA, age ~78 Get Report