Inventors:
Jack L. Glenn - Kokomo IN, US
Troy D. Clear - Kokomo IN, US
Mark W. Gose - Kokomo IN, US
Doublas B. Osborn - Kokomo IN, US
Nicholas T. Campanile - Kokomo IN, US
Assignee:
Delphi Technologies, Inc. - Troy MI
International Classification:
H01L 29/06
US Classification:
257335, 257338, 257E29027
Abstract:
An integrated circuit (IC) with negative potential protection includes at least one double-diffused metal-oxide semiconductor (DMOS) cell formed in a first-type epitaxial pocket, which is formed in a second-type substrate. The IC also includes a second-type+ isolation ring formed in the substrate to isolate the first-type epitaxial pocket and a first-type+ ring formed through the first-type epitaxial pocket between the second-type+ isolation ring and the DMOS cell.