US Patent:
20170338133, Nov 23, 2017
Inventors:
- Santa Clara CA, US
Lok Kee Loh - San Francisco CA, US
Dmitry Lubomirsky - Cupertino CA, US
Soonwook Jung - Palo Alto CA, US
Martin Yue Choy - Pacifica CA, US
Soonam Park - Sunnyvale CA, US
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
H01L 21/67
H01J 37/32
H01L 21/3065
Abstract:
Semiconductor systems and methods may include a semiconductor processing chamber having a gas box defining an access to the semiconductor processing chamber. The chamber may include a spacer characterized by a first surface with which the gas box is coupled, and the spacer may define a recessed ledge on an interior portion of the first surface. The chamber may include a support bracket seated on the recessed ledge that extends along a second surface of the spacer. The chamber may also include a gas distribution plate seated on the support bracket.
