Mao Wang Phones & Addresses
-
Campbell, CA
-
Cupertino, CA
-
18665 Loree Ave, Cupertino, CA 95014
Work
Position:
Professional/Technical
Education
Degree:
Associate degree or higher
Specialities
Employment & Labor
Resumes
Resumes
Ssd Firmware
View pageLocation:
275 south Main St, Longmont, CO 80501
Industry:
Semiconductors
Work:
Sk Hynix Memory Solutions Inc.
Ssd Firmware
Samsung 2002 - 2007
Hdd Firmware
Ssd Firmware
Samsung 2002 - 2007
Hdd Firmware
Education:
National University of Singapore 1992 - 1995
Doctorates, Doctor of Philosophy, Electronics Engineering, Philosophy
Doctorates, Doctor of Philosophy, Electronics Engineering, Philosophy
Skills:
Firmware
Flash Memory
Debugging
Sata
Ssd
Embedded Systems
C
Ftl
Performance Improvement
Arm
Emmc
Flash Mobile Devices
Asic
Computer Architecture
Microprocessors
Verilog
Flash Memory
Debugging
Sata
Ssd
Embedded Systems
C
Ftl
Performance Improvement
Arm
Emmc
Flash Mobile Devices
Asic
Computer Architecture
Microprocessors
Verilog
Mao Wang
View pageIndustry:
Professional Training & Coaching
Work:
Bcmg
Ra
Ra
Mao Wang
View pageIndustry:
Information Services
Work:
Smartdatatech
Project Manager
Project Manager
Mao Wang
View pageBusiness Records
Name / Title
Company / Classification
Phones & Addresses
Principal
I2 Design Studio
Business Services
Business Services
46915 Shale Cmn, Fremont, CA 94539
Publications
Us Patents
Positional Measurement With Normalized Signal Processing
View pageUS Patent:
63172003, Nov 13, 2001
Filed:
Apr 13, 2000
Appl. No.:
9/548918
Inventors:
Mao Wang - Sunnyvale CA
John C. Tsai - Saratoga CA
John C. Tsai - Saratoga CA
Assignee:
Excel Precision Corp. - Santa Clara CA
International Classification:
G01C 308
US Classification:
356 407
Abstract:
A measurement apparatus (10, 110) and methods to perform positional types of measurement with normalization respective to either or both of light beam (16, 116) intensity and measurement target (12, 112) reflectivity. A light source, such as a laser diode (14, 114), produces a light beam (16, 116) which is directed at the measurement target (12, 112). One or more beamsplitters (28, 120, 124) in the path of the light beam (16, 116) direct sample portions into one or more photodetectors (32, 36, 122, 128) to obtain either or both of illumination and reflectivity sample values. A portion of the light beam (16, 116) which is reflected by the measurement target (12, 112) is passed through and restricted by an aperture (26, 132) and then detected by a position sensitive detector (38, 134) to obtain a position value. The position value may then be normalized based on either or both of the illumination and reflectivity sample values.