Jun Liu

6351283, Feb 26, 2002

Nov 27, 1996

08/755576

Jun Liu - Fremont CA

OmniVision Technologies, Inc. - Sunnyvale CA

H04N 5335

348301, 348302

An improved charge amplifier ( ) for use in a MOS imaging array is disclosed. The charge amplifier comprises a reference capacitor (C ), a sense capacitor (C ), an operational amplifier ( ), a first output capacitor (C ) connected to the output of the operational amplifier, a second output capacitor (C ) connected to the output of the operational amplifier, and a differential amplifier ( ) connected to the first output capacitor and said second output capacitor. In operation, the reference capacitor is charged to a reference voltage. Similarly, the sense capacitor is charged to a reference voltage. Both the sense capacitor and the reference capacitor are formed to be identical. However, the reference capacitor is covered from ambient light and the sense capacitor is exposed to ambient light. As ambient light is incident on the sense capacitor, the voltage carried by the sense capacitor diminishes. After a predetermined exposure time, both the voltage stored across the reference capacitor and the sense capacitor is amplified by the operational amplifier.

6622345, Sep 23, 2003

May 29, 2001

09/867067

Jun Liu - Milpitas CA
Jeremy L. Neill - Gay GA
Christopher L. Kight - Jackson GA

Hoshizaki America, Inc. - Peachtree City GA

E05D 710

16357, 16374, 16239, 16242, 3121391, 312325, 312326, 312350

A simple and inexpensive hinge system or mechanism that may apply to the front panel or door so as to obtain an easy access to the inside without making the mechanism much more complicated or expensive. The hinge mechanism for a front panel or door is hingedly connected to an enclosure (or cabinet case) and comprises an axis (or shaft) and an axis supporting member having an opening that supports the axis at a first position for door swinging, at a second position for holding the door in a certain state, and at an intermediate position for the axis moving with or without any turning.

6822628, Nov 23, 2004

Jun 28, 2001

09/895985

James C. Dunphy - San Jose CA
William Cummings - San Francisco CA
Christopher J. Spindt - Menlo Park CA
Ronald L. Hansen - San Jose CA
Jun (Gordon) Liu - Fremont CA
Lee Cressi - Morgan Hill CA
Colin Stanners - San Jose CA

Candescent Intellectual Property Services, Inc. - Los Gatos CA
Candescent Technologies Corporation - Los Gatos CA

G09G 322

345 752, 345207, 3151691

Methods for compensating for brightness variations in a field emission device. In one embodiment, a method and system are described for measuring the relative brightness of rows of a field emission display (FED) device, storing information representing the measured brightness into a correction table and using the correction table to provide uniform row brightness in the display by adjusting row voltages and/or row on-time periods. A special measurement process is described for providing accurate current measurements on the rows. This embodiment compensates for brightness variations of the rows, e. g. , for rows near the spacer walls. In another embodiment, a periodic signal, e. g. , a high frequency noise signal, is added to the row on-time pulse in order to camouflage brightness variations in the rows near the spacer walls. In another embodiment, the area under the row on-time pulse is adjusted to provide row-by-row brightness compensation based on correction values stored in a memory resident correction table. In another embodiment, the brightness of each row is measured and compiled into a data profile for the FED.

6887132, May 3, 2005

Sep 3, 2002

10/234780

Jiro Kajiwara - Saitama-ken, JP
Gerard Moloney - Milpitas CA, US
Jun Liu - Cupertino CA, US
Junsheng Yang - Cupertino CA, US
Ernesto Saldana - San Jose CA, US
Cormac Walsh - Sunnyvale CA, US
Alejandro Reyes - San Jose CA, US

Multi Planar Technologies Incorporated - San Jose CA

B24B001/00

451 41, 451 56, 451 60, 451287, 451444

A polishing apparatus () is provided for polishing a substrate () that has slurry distributor () which improves planarization uniformity. Generally, the apparatus () includes: (i) a platen () with a polishing surface (); (ii) a head () adapted to hold the substrate () against the polishing surface; (iii) a mechanism to rotate the platen () during polishing; (iv) a dispenser () having nozzles () to dispense slurry on the surface (); and (v) a distributor () between the nozzles () and the head (). In one embodiment, the apparatus () further includes a wiper () between the head () and the distributor () to remove used slurry and polishing byproducts from the surface (), thereby reducing agglomerations or deposits that can damage the substrate () and improving yield. Optionally, the apparatus () further includes a dispenser () for dispensing a cleaning fluid before and/or after the wiper () to substantially eliminate buildup of deposits.

7027677, Apr 11, 2006

May 19, 2004

10/848924

Ruolin Li - Santa Clara CA, US
Ut Tran - San Jose CA, US
Xuejun Ying - San Jose CA, US
Jun Liu - San Ramon CA, US
Yi Ding - Milpitas CA, US
Hiroaki Fukuto - Los Altos CA, US

Intel Corporation - Santa Clara CA

G02B 6/12

385 14, 385130

Optical components may be integrated into planar light circuits. For example, thin film filters may be integrated through trenches in planar light circuits to achieve demultiplexing of at least two multiplexed optical wavelengths. An optical waveguide may be interfaced with a laser or a light detector through a mode converter formed as a trench in the planar light circuit. The mode converter may have a curved surface to achieve mode conversion.

7065239, Jun 20, 2006

Oct 24, 2001

09/682850

Kais Jameel Maayah - Sunnyvale CA, US
Lakshman Srinivasan - Cupertino CA, US
Richard Barnard - Fremont CA, US
Jun Liu - Pleasanton CA, US

Applied Materials, Inc. - Santa Clara CA

G06K 9/00

382145, 382149, 382168, 3562374, 25055922

A method and system for defect inspection of microfabricated structures such as semiconductor wafers, masks or reticles for micro-fabrication, flat panel displays, micro-electro-mechanical (MEMs) having repetitive array regions such as memories or pixels. In one embodiment a method of inspection of microfabricated structures includes the steps of acquiring contrast data or images from the microfabricated structures, analyzing automatically the contrast data or images to find repetitive regions of the contrast data and comparing the repetitive regions of the contrast data with reference data to detect defects in the microfabricated structures. In the analyzing step, a cell-metric such as the range, or mean or other statistical or mathematical measure of the contrast data is used to find the repetitive regions. Image or contrast data acquisition can be performed with an optical, e-beam or other microscope suited for microfabricated structures.

7125326, Oct 24, 2006

Jun 13, 2005

11/160197

Cormac Walsh - Sunnyvale CA, US
Jun Liu - Cupertino CA, US
Gerard Moloney - Milpitas CA, US
A. Ernesto Saldana - San Jose CA, US

Ebara Technologies Incorporated - Sacramento CA

B24D 11/00

451442, 451526, 451539, 451538

The invention provides a pad removal apparatus and method that enables improved pad removal from a platen.

7326103, Feb 5, 2008

Nov 4, 2003

10/700984

Kunihiko Sakurai - San Jose CA, US
Gerard Moloney - Milpitas CA, US
Huey-Ming Wang - Fremont CA, US
Jun Liu - Cupertino CA, US
Peter Lao - San Jose CA, US

Ebara Technologies Incorporated - Sacramento CA

B24B 49/00

451 10, 451 11, 451 21, 451 41, 451288, 451398, 15634513, 15634514

The invention provides a vertically adjustable chemical mechanical polishing head having a pivot mechanism and method for use thereof.