James J Wong

6339503, Jan 15, 2002

Nov 2, 1999

09/432892

Matthew W. Derstine - Sunnyvale CA
Suzanne Wakelin - Mountain View CA
James S. Wong - Mountain View CA

Oni Systems Corp. - San Jose CA

G02B 2710

359622, 359619, 359621, 359663

An optical system for imaging an array of light sources includes an array of microlenses disposed to intercept light from respective light sources in the array of light sources to reduce the divergence angles of light emanating from the light sources, a first array of lenses (sometimes referred to as minilenses), a second array of lenses (minilenses), and an additional array of microlenses disposed to intercept and focus light from the second array of lenses. Each lens in the first array is sized to intercept light from a respective sub-plurality of the microlenses, and each lens in the second array intercepts and focuses light from a respective lens in the first array. The first and second arrays of minilenses are preferably configured to define a doubly-telecentric imaging system. Each microlens in the additional array intercepts and focuses light that originated from a respective light source in the array of light sources and passed through a respective microlens in the first-mentioned array of microlenses.

6339506, Jan 15, 2002

Nov 2, 1999

09/432293

Suzanne Wakelin - Mountain View CA
Matthew W. Derstine - Sunnyvale CA
James S. Wong - Mountain View CA

ONI Systems Corp. - San Jose CA

G02B 300

359648, 359626

Optical systems are corrected for a variety of aberrations by a microlens array where an optical property of the individual microlenses varies as a function of position in the array. For example, the microlenses can be configured so that the focal length varies to correct field curvature. Representative environments for the microlens array may be characterized by a pixellated source (array of individual sources) in an object plane or a pixellated detector (array of individual detectors) in an image plane, or both.

6351983, Mar 5, 2002

Apr 12, 1999

09/289755

Jeffrey S. Haas - San Ramon CA
John F. Bushman - Oakley CA
Douglas E. Howard - Livermore CA
James L. Wong - Livermore CA
Joel D. Eckels - Livermore CA

The Regents of the University of California - Oakland CA

G01N 3002

73 2337, 250281

A portable, lightweight (approximately 25 kg) gas chromatograph mass spectrometer, including the entire vacuum system, can perform qualitative and quantitative analyses of all sample types in the field. The GC/MS has a conveniently configured layout of components for ease of serviceability and maintenance. The GC/MS system can be transported under operating or near-operating conditions (i. e. , under vacuum and at elevated temperature) to reduce the downtime before samples can be analyzed on-site.

6989962, Jan 24, 2006

Feb 24, 2003

10/373564

James Wong - Milpitas CA, US
Ron Barr - Mountain View CA, US

Western Digital (Fremont), Inc. - Fremont CA

G11B 5/127

360126

The present invention provides a write element for use in magnetic data recording system such as a computer disk drive. The write head utilizes the advantageous properties of high magnetic moments while overcoming the corrosion problems engendered by such materials. The write element includes a magnetic yoke constructed of first and second magnetic poles joined to one another at a back gap. While the majority of the poles are constructed of a high magnetic moment material a layer of relatively low magnetic moment material is provided on the first pole at the back gap portion of the first pole. The relatively low magnetic moment material prevents corrosion of the first pole during subsequent manufacturing of the write head. An electrically conductive coil passes through the magnetic yoke and is insulated there from. By passing an electrical current through the electrical coil, a magnetic flux is generated in the yoke.

7064337, Jun 20, 2006

Apr 8, 2003

10/410128

Mark S. Rowland - Alamo CA, US
Douglas E. Howard - Livermore CA, US
James L. Wong - Dublin CA, US
James L. Jessup - Tracy CA, US
Greg M. Bianchini - Livermore CA, US
Wayne O. Miller - Livermore CA, US

The Regents of the University of California - Oakland CA

G01T 1/24

25037015, 25037003

A portable gamma ray detection apparatus having a gamma ray detector encapsulated by a compact isolation structure having at least two volumetrically-nested enclosures where at least one is a thermal shield. The enclosures are suspension-mounted to each other to successively encapsulate the detector without structural penetrations through the thermal shields. A low power cooler is also provided capable of cooling the detector to cryogenic temperatures without consuming cryogens, due to the heat load reduction by the isolation structure and the reduction in the power requirements of the cooler. The apparatus also includes a lightweight portable power source for supplying power to the apparatus, including to the cooler and the processing means, and reducing the weight of the apparatus to enable handheld operation or toting on a user's person.

7285784, Oct 23, 2007

Apr 19, 2004

10/828010

Mark S. Rowland - Alamo CA, US
Douglas E. Howard - Livermore CA, US
James L. Wong - Dublin CA, US
James L. Jessup - Tracy CA, US
Greg M. Bianchini - Livermore CA, US
Wayne O. Miller - Livermore CA, US

The Regents of the University of California - Oakland CA

G01T 1/24

25037015, 2503361, 2503581, 376159

A real-time method and computer system for identifying radioactive materials which collects gamma count rates from a HPGe gamma-radiation detector to produce a high-resolution gamma-ray energy spectrum. A library of nuclear material definitions (“library definitions”) is provided, with each uniquely associated with a nuclide or isotope material and each comprising at least one logic condition associated with a spectral parameter of a gamma-ray energy spectrum. The method determines whether the spectral parameters of said high-resolution gamma-ray energy spectrum satisfy all the logic conditions of any one of the library definitions, and subsequently uniquely identifies the material type as that nuclide or isotope material associated with the satisfied library definition. The method is iteratively repeated to update the spectrum and identification in real time.

8180579, May 15, 2012

Mar 27, 2006

11/390728

Mark Rowland - Alamo CA, US
Tom B. Gosnell - Moraga CA, US
Cheryl Ham - Livermore CA, US
Dwight Perkins - Livermore CA, US
James Wong - Dublin CA, US

Lawrence Livermore National Security, LLC - Livermore CA

G01N 31/00

702 27, 702 22

A real time gamma-ray signature/source identification method and system using principal components analysis (PCA) for transforming and substantially reducing one or more comprehensive spectral libraries of nuclear materials types and configurations into a corresponding concise representation/signature(s) representing and indexing each individual predetermined spectrum in principal component (PC) space, wherein an unknown gamma-ray signature may be compared against the representative signature to find a match or at least characterize the unknown signature from among all the entries in the library with a single regression or simple projection into the PC space, so as to substantially reduce processing time and computing resources and enable real-time characterization and/or identification.

55019269, Mar 26, 1996

Jan 31, 1995

8/383553

John C. Cheng - San Jose CA
Timothy M. Reith - Morgan Hill CA
James S. Wong - San Jose CA

International Business Machines Corporation - Armonk NY

G11B 726
G03F 900

430 5

A method of manufacturing a photomask for the production of dual depth features on substrates, and the photomask so manufactured, wherein the method of manufacturing the photomask is comprised of the steps of: (1) coating a substrate which transmits at least two selected wavelengths with: a) an optical filter material which prevents the transmission of at least one of the wavelengths, b) an opaque masking material, and c) a dual tone photoresist; (2) using a single mastering tool to selectively expose areas of the coated substrate to one of the wavelengths; (3) developing the photoresist; (4) etching the exposed masking material and optical filter material; (5) exposing the remaining coated substrate; (6) developing the remaining photoresist; (7) etching the exposed surface; and (8) stripping away the remaining photoresist.