Han Wang

20230047031, Feb 16, 2023

Oct 31, 2022

17/977019

- Santa Clara CA, US
David W. GROECHEL - Los Altos Hills CA, US
Han WANG - Palo Alto CA, US

C23C 16/56
H01J 37/34
C23C 16/40
H01J 37/32

One example of the disclosure provides a method of fabricating a chamber component with a coating comprising a yttrium containing material with desired film properties. In one example, the method of fabricating a coating material includes providing a base structure comprising an aluminum containing material. The method further includes forming a coating layer that includes a yttrium containing material on the base structure. The method also includes thermal treating the coating layer to form a treated coating layer.

20230023764, Jan 26, 2023

Dec 15, 2020

17/786520

- Santa Clara CA, US
Michael R. RICE - Pleasanton CA, US
Gang Grant PENG - Santa Clara CA, US
Rui CHENG - San Jose CA, US
Zubin HUANG - Santa Clara CA, US
Han WANG - Redwood City CA, US
Karthik JANAKIRAMAN - San Jose CA, US
Diwakar KEDLAYA - Santa Clara CA, US
Paul L. BRILLHART - Pleasanton CA, US
Abdul Aziz KHAJA - San Jose CA, US

H01L 21/285
H01L 21/67

Methods and apparatus for surface profiling and texturing of chamber components for use in a process chamber, such surface-profiled or textured chamber components, and method of use of same are provided herein. In some embodiments, a method includes measuring a parameter of a reference substrate or a heated pedestal using one or more sensors and modifying a surface of a chamber component physically based on the measured parameter.

20210046587, Feb 18, 2021

Nov 4, 2020

17/089531

- Santa Clara CA, US
David W. GROECHEL - Los Altos Hills CA, US
Jenn C. CHOW - San Jose CA, US
Tuochuan HUANG - Saratoga CA, US
Han WANG - Palo Alto CA, US

B23K 26/352
H01J 37/32
B23K 26/12

A system to provide a texture to a surface of a component for use in a semiconductor processing chamber is provided. The system includes an enclosure comprising a processing region, a support disposed in the processing region, a photon light source to generate a stream of photons, an optical module operably coupled to the photon light source, and a lens. The optical module includes a beam modulator to create a beam of photons from the stream of photons generated from the photon light source, and a beam scanner to scan the beam of photons across the surface of the component. The lens is used to receive the beam of photons from the beam scanner and distribute the beam of photons at a wavelength in a range between about 345 nm and about 1100 nm across the surface of the component to form a plurality of features on the component.

20200255946, Aug 13, 2020

Jan 31, 2020

16/778642

- Santa Clara CA, US
David W. GROECHEL - Los Altos Hills CA, US
Han WANG - Palo Alto CA, US

C23C 16/56
H01J 37/32
C23C 16/40
H01J 37/34

One example of the disclosure provides a method of fabricating a chamber component with a coating comprising a yttrium containing material with desired film properties. In one example, the method of fabricating a coating material includes providing a base structure comprising an aluminum containing material. The method further includes forming a coating layer that includes a yttrium containing material on the base structure. The method also includes thermal treating the coating layer to form a treated coating layer.

20190358746, Nov 28, 2019

Aug 5, 2019

16/532011

- Santa Clara CA, US
David W. GROECHEL - Los Altos Hills CA, US
Jenn C. CHOW - San Jose CA, US
Tuochuan HUANG - Saratoga CA, US
Han WANG - Palo Alto CA, US

B23K 26/352
H01J 37/32
B23K 26/12

A system to provide a texture to a surface of a component for use in a semiconductor processing chamber is provided. The system includes an enclosure comprising a processing region, a support disposed in the processing region, a photon light source to generate a stream of photons, an optical module operably coupled to the photon light source, and a lens. The optical module includes a beam modulator to create a beam of photons from the stream of photons generated from the photon light source, and a beam scanner to scan the beam of photons across the surface of the component. The lens is used to receive the beam of photons from the beam scanner and distribute the beam of photons at a wavelength in a range between about 345 nm and about 1100 nm across the surface of the component to form a plurality of features on the component.

20190341276, Nov 7, 2019

May 1, 2019

16/400603

- Santa Clara CA, US
David W. GROECHEL - Los Altos Hills CA, US
Tuochuan HUANG - Saratoga CA, US
Han WANG - Palo Alto CA, US
Li WU - Fremont CA, US
Gang PENG - Fremont CA, US

H01L 21/67
B08B 3/12
B08B 3/02

Embodiments described herein relate to chamber component cleaning systems and methods for cleaning a chamber component. The chamber component cleaning system includes a spray station, at least a first cleaning station, a dry station, a component transfer mechanism, and one or more enclosures that enclose the spray station, at least the first cleaning station, the dry station, and the component transfer mechanism. The spray station has a holder to position a chamber component in a path of a flow of a cleaning spray and a movable nozzle to provide the flow of the cleaning spray at a first pressure in a path of portions of the chamber component. The first cleaning station has a push mechanism to force a cleaning fluid through features and/or holes of the chamber component and at least one movable transducer to provide ultrasonic energy to the portions of the chamber component.

20190130043, May 2, 2019

Oct 30, 2017

15/798179

- Menlo Park CA, US
Matthew William Canton - San Francisco CA, US
Peizhao Zhang - Fremont CA, US
Shihang Wei - Sunnyvale CA, US
Shen Wang - Mountain View CA, US
Peter Vajda - Palo Alto CA, US
Han Wang - Sunnyvale CA, US

G06F 17/30
G06K 9/62
G06K 9/34
G06K 9/78
G06K 7/14

One general aspect includes a method, including: capturing an image of an object having a multi-part identifier displayed thereon, the multi-part identifier including a first portion and a second portion, the first portion including graphical content and the second portion including human-recognizable textual content. The method also includes based on the captured image, identifying a domain associated with the graphical content. The method also includes based on the captured image, identifying a sub-part of the domain associated with the textual content. The method also includes identifying a digital destination based on the identified domain and the identified sub-part. The method also includes performing an action based on the digital destination. Other embodiments of this aspect include corresponding computer systems, apparatus, and computer programs recorded on one or more computer storage devices, each configured to perform the actions of the methods.

20180257172, Sep 13, 2018

Apr 17, 2018

15/955503

- Santa Clara CA, US
David W. GROECHEL - Los Altos Hills CA, US
Jenn C. CHOW - San Jose CA, US
Tuochuan HUANG - Saratoga CA, US
Han WANG - Palo Alto CA, US

B23K 26/00
B23K 26/12
H01J 37/32

A system to provide a texture to a surface of a component for use in a semiconductor processing chamber is provided. The system includes an enclosure comprising a processing region, a support disposed in the processing region, a photon light source to generate a stream of photons, an optical module operably coupled to the photon light source, and a lens. The optical module includes a beam modulator to create a beam of photons from the stream of photons generated from the photon light source, and a beam scanner to scan the beam of photons across the surface of the component. The lens is used to receive the beam of photons from the beam scanner and distribute the beam of photons at a wavelength in a range between about 345 nm and about 1100 nm across the surface of the component to form a plurality of features on the component.