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Han Chen Phones & Addresses

  • Pflugerville, TX
  • Plano, TX
  • Sacramento, CA
  • Davis, CA
  • Santa Clara, CA
  • San Jose, CA
  • 3956 Los Robles Dr, Plano, TX 75074

Professional Records

License Records

Han Chen

License #:
116306 - Expired
Category:
Nursing Support
Issued Date:
Dec 11, 2014
Effective Date:
Dec 5, 2016
Type:
Nurse Aide

Business Records

Name / Title
Company / Classification
Phones & Addresses
Han Ching Chen
President
Cyberdrive, Inc
13200 Pacific Promenade, Los Angeles, CA 90094
951 Springfield Dr, Campbell, CA 95008
Han Ping Chen
President
APOLLO VENTURES CORPORATION
Technical Investments & Research Services
5339 Prospect Rd SUITE 212, San Jose, CA 95129
19925 Stevens Crk Blvd, Cupertino, CA 95014
(408) 725-7196
Han Ping Chen
President
ABOVE LOGIC CORPORATION
5339 Prospect Rd STE 212, San Jose, CA 95129

Publications

Us Patents

Systems And Methods For Determining Concentrations Of Exposure

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US Patent:
7707050, Apr 27, 2010
Filed:
Mar 11, 2004
Appl. No.:
10/797143
Inventors:
Han Chen - San Jose CA, US
Weimin Dong - Palo Alto CA, US
Andrew Coburn - Oakland CA, US
Assignee:
Risk Management Solutions, Inc. - Newark CA
International Classification:
G06Q 40/00
US Classification:
705 4, 705 2, 705 3, 705 39, 707102, 7071041
Abstract:
A system and method are provided for identifying exposure concentrations. The process of determining exposure concentrations may include organizing exposure data, defining parameters, determining elevated exposure concentrations, and providing output results. The exposure data may relate to at least geographical locations, policies, accounts, portfolios, treaties, and other exposure data. The parameters may be defined to include at least an area of analysis, a region of interest, a threshold amount, results parameters, and other parameters. The exposure concentration may include at least defining and locating exposure locations using various techniques. The results may be presented using textual, graphical, or other display schemes. The output may be configured to convey information such as positional accuracy of an identified area, exposure accumulation in a defined area, and other information.

Systems And Methods For Determining Concentrations Of Exposure

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US Patent:
8380545, Feb 19, 2013
Filed:
Apr 20, 2010
Appl. No.:
12/764045
Inventors:
Han Chen - San Jose CA, US
Weimin Dong - Palo Alto CA, US
Andrew Coburn - Oakland CA, US
Assignee:
Risk Management Solutions, Inc. - Newark CA
International Classification:
G06Q 40/00
US Classification:
705 4, 705 39, 707102, 7071041
Abstract:
A system and method are provided for identifying exposure concentrations. The process of determining exposure concentrations may include organizing exposure data, defining parameters, determining elevated exposure concentrations, and providing output results. The exposure data may relate to at least geographical locations, policies, accounts, portfolios, treaties, and other exposure data. The parameters may be defined to include at least an area of analysis, a region of interest, a threshold amount, results parameters, and other parameters. The exposure concentration may include at least defining and locating exposure locations using various techniques. The results may be presented using textual, graphical, or other display schemes. The output may be configured to convey information such as positional accuracy of an identified area, exposure accumulation in a defined area, and other information.

Generation Of Dynamic Design Flows For Integrated Circuits

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US Patent:
20210326500, Oct 21, 2021
Filed:
Jun 28, 2021
Appl. No.:
17/361253
Inventors:
- San Mateo CA, US
Han Chen - Cupertino CA, US
International Classification:
G06F 30/20
G06F 30/30
Abstract:
Systems and methods are disclosed for to generation of dynamic design flows for integrated circuits. For example, a method may include accessing a design flow configuration data structure, wherein the design flow configuration data structure is encoded in a tool control language; based on the design flow configuration data structure, selecting multiple flowmodules from a set of flowmodules, wherein each flowmodule provides an application programming interface, in the tool control language, to a respective electronic design automation tool; based on the design flow configuration data structure, generating a design flow as a directed acyclic graph including the selected flowmodules as vertices; and generating an output integrated circuit design data structure, based on one or more input integrated circuit design data structures, using the design flow to control the respective electronic design automation tools of the selected flowmodules.

Generation Of Dynamic Design Flows For Integrated Circuits

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US Patent:
20200349236, Nov 5, 2020
Filed:
Jul 31, 2019
Appl. No.:
16/527713
Inventors:
- San Mateo CA, US
Han Chen - Cupertino CA, US
International Classification:
G06F 17/50
Abstract:
Systems and methods are disclosed for to generation of dynamic design flows for integrated circuits. For example, a method may include accessing a design flow configuration data structure, wherein the design flow configuration data structure is encoded in a tool control language; based on the design flow configuration data structure, selecting multiple flowmodules from a set of flowmodules, wherein each flowmodule provides an application programming interface, in the tool control language, to a respective electronic design automation tool; based on the design flow configuration data structure, generating a design flow as a directed acyclic graph including the selected flowmodules as vertices; and generating an output integrated circuit design data structure, based on one or more input integrated circuit design data structures, using the design flow to control the respective electronic design automation tools of the selected flowmodules.
Han L Chen from Pflugerville, TX, age ~34 Get Report