Gary M Ho

20110318992, Dec 29, 2011

Apr 20, 2011

13/090954

Jeffrey Drue David - San Jose CA, US
Harry Q. Lee - Los Altos CA, US
Thian Choi Lim - Singapore, SG
Gary Ka Ho Lam - Santa Clara CA, US

B24B 49/04
B24B 49/12

451 5, 451 6, 451 8

A method of controlling polishing includes polishing a substrate having a second layer overlying a first layer, detecting exposure of the first layer with an in-situ monitoring system, receiving an identification of a selected spectral feature and a characteristic of the selected spectral feature to monitor during polishing, measuring a sequence of spectra of light from the substrate while the substrate is being polished, determining a first value for the characteristic of the feature at the time that the first in-situ monitoring technique detects exposure of the first layer, adding an offset to the first value to generate a second value, and monitoring the characteristic of the feature and halting polishing when the characteristic of the feature is determined to reach the second value.

20140004626, Jan 2, 2014

Jun 30, 2012

13/539344

KUN XU - Fremont CA, US
Jimin Zhang - San Jose CA, US
David H. Mai - Palo Alto CA, US
Stephen Jew - San Jose CA, US
Shih-Haur Walters Shen - Hsin-Chu, TW
Zhihong Wang - Santa Clara CA, US
Thomas H. Osterheld - Mountain View CA, US
Wen-Chiang Tu - Mountain View CA, US
Gary Ka Ho Lam - Santa Clara CA, US
Tomohiko Kitajima - Santa Clara CA, US

Applied Materials, Inc. - Santa Clara CA

H01L 21/66

438 5, 257E21528

Methods for chemical mechanical polishing (CMP) of semiconductor substrates, and more particularly to temperature control during such chemical mechanical polishing are provided. In one aspect, the method comprises polishing the substrate with a polishing surface during a polishing process to remove a portion of the conductive material, repeatedly monitoring a temperature of the polishing surface during the polishing process, and exposing the polishing surface to a rate quench process in response to the monitored temperature so as to achieve a target value for the monitored temperature during the polishing process.

45772746, Mar 18, 1986

Jul 11, 1983

6/512379

Gary S. Ho - San Jose CA
Ralph W. Peterson - Naperville IL

AT&T Bell Laboratories - Murray Hill NJ

G06F 1212
G06F 1210
G06F 1206
G06F 1300

364200

Disclosed is a demand paging scheme for a shared memory processing system that uses paged virtual memory addressing and includes a plurality of address translation buffers (ATBs). Page frames of main memory that hold pages being considered for swapping from memory are sequestered and flags, one corresponding to each ATB in the system, are cleared. Each time an ATB is flushed, its associated flag is set. Setting of all the flags indicates that the address translation information of pages held by selected sequestered page frames does not appear in any ATB and that the selected pages may be swapped from main memory.

20230013401, Jan 19, 2023

Jul 14, 2021

17/375961

- Santa Clara CA, US
Gary Ka Ho LAM - Santa Clara CA, US

B24B 37/34
A46B 13/02
A46B 13/00

Embodiments provided herein include a system and method for cleaning a first surface of a substrate using a brush carousel assembly. In one embodiment, the brush carousel assembly includes one or more rotatable brush mounting assemblies coupled to a rotatable carriage, having a carriage support structure configured to rotate about a carriage axis. The brush carousel assembly further includes a second brush mounting assembly disposed a second radial distance from the carriage axis, and coupled to the support structure of the carriage that includes the one or more rotatable support members.

20140366711, Dec 18, 2014

Jun 17, 2013

13/919501

Perry Woo - Oakland CA, US
Gary K. Ho - Sacramento CA, US

F41H 5/04
F41H 13/00
F41H 7/02

89 3602

A mechanically-operated vehicle that has an upright body-length bullet-resistant shield comprising bullet resistant glass that allows full-enclosure of an operator on all sides and top, at least two wheels, a single hand-controlled apparatus that controls the vehicle, and the vehicle can fit through a standard size door and a 2500-lb passenger or 4000-lb service elevator.

20140366712, Dec 18, 2014

Jun 17, 2013

13/919531

Perry Woo - Oakland CA, US
Gary K. Ho - Sacramento CA, US

F41H 7/02
F41H 13/00
F41H 5/04

89 3602

A mechanically-operated vehicle that has a bullet-resistant shield comprising of bullet resistant glass panels and ballistic panels that allow full-enclosure of an operator on all sides and top, at least three wheels, a single hand-controlled apparatus that controls the vehicle, and the vehicle can fit through ADA compliant double size doors and 4000-lb service/freight elevators.

20140366714, Dec 18, 2014

Jun 17, 2013

13/919578

Perry Woo - Oakland CA, US
Gary K. Ho - Sacramento CA, US

F41H 7/02
F41H 5/26
F41H 5/20

89 3608

A mechanically-operated vehicle that has a bullet-resistant shield comprising bullet resistant glass panels that allows full-enclosure of an operator and passengers on all sides and top, at least four wheels, a steering wheel that controls the vehicle, and the vehicle can fit through ADA compliant double doors and freight or service elevators.

20140366715, Dec 18, 2014

Jun 17, 2013

13/919426

Perry Woo - Oakland CA, US
Gary K. Ho - Sacramento CA, US

F41H 7/02

89 3609

A mechanically-operated vehicle that has an upright body-length bullet-resistant shield comprising bullet resistant glass that allows for enclosure of an operator on three sides and top, at least two wheels, a single hand-controlled apparatus that controls the vehicle, and the vehicle can fit through ADA compliant standard size single door and it can fit in a 3000-lb service elevator.