Chaofeng Zou - Maplewood MN, US Fong Vang - Forest Lake MN, US Doreen C. Lynch - Afton MN, US William D. Ramsden - Afton MN, US Sharon M. Simpson - Lake Elmo MN, US Kumars Sakizadeh - Woodbury MN, US
International Classification:
G03C 5/00
US Classification:
430330, 430564
Abstract:
Use of a combination of a trisphenol reducing agent (developer) and a substituted olefinic co-developer in photothermographic materials provides a number of improvements including a reduction of sensitivity to high humidity and improved processing latitude.
Photothermographic Materials Containing Developer And Co-Developer
Chaofeng Zou - Maplewood MN, US Fong Vang - Forest Lake MN, US Doreen C. Lynch - Afton MN, US William D. Ramsden - Afton MN, US Sharon M. Simpson - Lake Elmo MN, US Kumars Sakizadeh - Woodbury MN, US
International Classification:
G03C 1/06 G03C 5/26
US Classification:
430440, 430619, 430441, 430435
Abstract:
Use of a combination of a trisphenol reducing agent (developer) and a substituted olefinic co-developer in photothermographic materials reduces their sensitivity to high humidity and improves processing latitude.